×

Electrostatic chuck

  • US 5,535,090 A
  • Filed: 03/03/1994
  • Issued: 07/09/1996
  • Est. Priority Date: 03/03/1994
  • Status: Expired due to Fees
First Claim
Patent Images

1. An electrostatic chuck for holding an electrically conductive workpiece in a low pressure reactor, the chuck, comprising:

  • a thermally-conductive base plate;

    a plurality of electrostatic structures disposed over the base plate, each electrostatic structure including;

    a first dielectric,an electrically conductive electrode forming a first capacitor plate in contact with the first dielectric, anda second dielectric in contact with the electrode, anda dielectric separator between the first and the second dielectrics and surrounding the electrode, wherein the electrically conductive workpiece forms a second capacitor plate and can be held against the first dielectric of at least one of the electrostatic structures under application of an electrical potential across the first and second capacitor plates.

View all claims
  • 0 Assignments
Timeline View
Assignment View
    ×
    ×