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Photolithographic technique and illuminator using real-time addressable phase shift light shift

  • US 5,539,567 A
  • Filed: 06/16/1994
  • Issued: 07/23/1996
  • Est. Priority Date: 06/16/1994
  • Status: Expired due to Term
First Claim
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1. An optical lithography system for projecting an image onto a target, said lithography system comprising:

  • a light source for projecting a beam of light along a light path;

    a phase modulator disposed along said light path for imparting a phase modulation pattern transverse said beam of light, Wherein said phase modulation pattern is determined by at least one electrical control signal;

    a lithography mask disposed along said light path for spatially modulating said beam of light to produce said image, said lithography mask comprised of at least two regions, a first region for preventing incident light from continuing along said light path, and a second region for allowing incident light to continue along said light path, wherein portions of said beam of light are diffracted by a boundary between said first region and said second region; and

    wherein said phase modulation pattern maximizes a destructive interference among said diffracted portions of said beam of light.

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