Method of fabricating a flip chip semiconductor device having an inductor
First Claim
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1. A method of fabricating a semiconductor device having at least one inductor and at least one flip chip bump, the method comprising the steps of:
- providing a semiconductor substrate having the semiconductor device;
sputtering titanium tungsten over the semiconductor substrate;
sputtering copper to provide sputtered copper over the titanium tungsten;
covering a first region of the sputtered copper with a first photoresist pattern defining the at least one inductor and the at least one flip chip bump;
electroplating copper to provide electroplated copper over the splattered copper not covered by the first photoresist pattern forming the at least one inductor and a first portion of the at least one flip chip bump;
stripping the first photoresist pattern off of the sputtered copper;
etching away the sputtered copper not covered by the electroplated copper;
covering the at least one inductor and the titanium tungsten with a second photoresist pattern to define a second portion of the at least one flip chip bump over the first portion of the at least one flip chip bump;
electroplating copper over the first portion of the at least one flip chip bump to form the second portion of the at least one flip chip bump;
plating lead over the second portion of the at least one flip chip bump to form a third portion of the at least one flip chip bump;
plating tin over the lead to form a fourth portion of the at least one flip chip bump;
stripping the second photoresist pattern off of the at least one inductor and the titanium tungsten; and
etching away the titanium tungsten not covered by the electroplated copper.
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Abstract
Flip chip bumps (24, 26, and 27) and an inductor (17) are simultaneously fabricated on a semiconductor substrate (10). The fabrication process includes two electroplating steps. The first step electroplates copper (18) onto a seed layer (13) to form the inductor (17) and a first portion (16) of the flip chip bumps (24, 26, and 27). The second step electroplates copper (21) onto the previously electroplated copper (18) to form a second portion (21) of the flip chip bumps (24, 26, and 27).
113 Citations
17 Claims
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1. A method of fabricating a semiconductor device having at least one inductor and at least one flip chip bump, the method comprising the steps of:
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providing a semiconductor substrate having the semiconductor device; sputtering titanium tungsten over the semiconductor substrate; sputtering copper to provide sputtered copper over the titanium tungsten; covering a first region of the sputtered copper with a first photoresist pattern defining the at least one inductor and the at least one flip chip bump; electroplating copper to provide electroplated copper over the splattered copper not covered by the first photoresist pattern forming the at least one inductor and a first portion of the at least one flip chip bump; stripping the first photoresist pattern off of the sputtered copper; etching away the sputtered copper not covered by the electroplated copper; covering the at least one inductor and the titanium tungsten with a second photoresist pattern to define a second portion of the at least one flip chip bump over the first portion of the at least one flip chip bump; electroplating copper over the first portion of the at least one flip chip bump to form the second portion of the at least one flip chip bump; plating lead over the second portion of the at least one flip chip bump to form a third portion of the at least one flip chip bump; plating tin over the lead to form a fourth portion of the at least one flip chip bump; stripping the second photoresist pattern off of the at least one inductor and the titanium tungsten; and etching away the titanium tungsten not covered by the electroplated copper. - View Dependent Claims (2, 3, 4, 5)
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6. A method of making an electronic device, the method comprising:
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providing a substrate; forming a seed layer over the substrate; outlining an inductor and a flip chip bump over the seed layer by masking a first region of the seed layer with a first material; providing a first conductive layer over the seed layer not masked by the first material to form the inductor and a first portion of the flip chip bump; outlining a second portion of the flip chip bump over the first portion of the flip chip bump by masking the inductor with a second material; and providing a second conductive layer over the first portion of the flip chip bump to form the second portion of the flip chip bump. - View Dependent Claims (7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17)
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Specification