Non-corrosive photoresist stripper composition

• US 5,545,353 A
• Filed: 05/08/1995
• Issued: 08/13/1996
• Est. Priority Date: 05/08/1995
• Status: Expired due to Fees

• Current Assignee: OLIN Microelectronic Chemicals Incorporated
• Original Assignee: OCG Microelectronic Materials Incorporated
• Inventors: Honda, Kenji, Maw, Taishih
• Primary Examiner(s): THERKORN, LINDA SKALING
• Application Number:
  US08/436,548
• Time in Patent Office: 463 Days
• Field of Search: 252/153, 252/158, 252/542, 252/544, 252/545, 252/546, 252/548, 252/171, 252/391, 252/394, 252/395, 430/256, 430/329, 430/331
• US Class Current: 510/176
• CPC Class Codes: C11D 7/32 containing nitrogen
• CPC Class Codes: C11D 7/3209 Amines or imines with one to four nitrogen atoms; Quaternized amines
• CPC Class Codes: C11D 7/3218 Alkanolamines or alkanolimines
• CPC Class Codes: C11D 7/3227 Ethers thereof
• CPC Class Codes: C11D 7/34 containing sulfur
• CPC Class Codes: C11D 7/5009 containing phosphorus, sulfur or silicon, e.g. dimethylsulfoxide
• CPC Class Codes: G03F 7/422 using liquids only G03F7/421 takes precedence
• CPC Class Codes: G03F 7/425 containing mineral alkaline compounds; containing organic basic compounds, e.g. quaternary ammonium compounds; containing heterocyclic basic compounds containing nitrogen

Abstract

A non-corrosive photoresist composition containing:

(a) 20-70% by weight of an organic polar solvent having a dipole moment of more than 3.5;

(b) 70-20% by weight of selected amine compounds;

(c) 0.1-10% by weight of (2-benzothiozolylthio)succinic acid.

Claims

1. A photoresist stripper composition comprising:

(a) from about 20 to about 70% by weight of an organic polar solvent having a dipole moment of more than 3.5;

(b) from about 70 to about 20% by weight of an amine compound selected from the group consisting of an alkanolamine compound within the formula (I);

##STR3## wherein n and m are each independently an integer ranging from 0-5, inclusive;

X is hydrogen, alkyl, or alkoxy group;

Y is either --O-- or --NH--; and

Z is hydrogen, --OH, or --NH₂ ;

(c) from about 0.1 to about 10% by weight of (2-benzothiozolylthio)succinic acid;

all percents based on the weight of the stripper composition.

2. The stripper composition of claim 1 wherein said solvent (a) is a cyclic amide.

3. The stripper composition of claim 2 wherein said cyclic amide is selected from the group consisting of N-alkyl-2-pyrrolidone, N-hydroxyalkyl-2-pyrrolidone, and 1,3-dialkyl-2-imidazolidinone.

4. The stripper composition of claim 1 wherein said alkanolamine is selected from the group consisting of monoethanolamine, 2-(2-aminoethoxy)ethanol and 2-(2-aminoethylamino)ethanol, diethanolamine, and triethanolamine.

5. The stripper composition of claim 2 wherein said alkanolamine is selected from the group consisting of monoethanolamine, 2-(2-aminoethoxy) ethanol, diethanolamine, and triethanolamine.

6. The stripper composition of claim 3 wherein said alkanolamine is selected from the group consisting of monoethanolamine, 2-(2-aminoethoxy) ethanol, diethanolamine and triethanolamine.

7. The stripper composition of claim 3 wherein said N-alkyl-2-pyrrolidone is N-methyl-2-pyrrolidone.