Rapid prototype three dimensional stereolithography

• US 5,545,367 A
• Filed: 05/27/1993
• Issued: 08/13/1996
• Est. Priority Date: 04/15/1992
• Status: Expired due to Fees

• Current Assignee: Optische Werke G Rodenstock KG (Optische Werke G Rodenstock GmbH & Company KG)
• Original Assignee: Soane Technologies Incorporated
• Inventors: Bae, Young C., Crocker, Charles, Soane, David S.
• Primary Examiner(s): HEITBRINK, JILL LYNNE
• Application Number:
  US08/068,692
• Time in Patent Office: 1,174 Days
• Field of Search: 264/22, 264/23, 264/25, 264/255, 264/308, 264/401, 427/595, 118/423, 118/429, 118/620, 156/273.5, 156/275.5, 250/432 R, 250/492.1, 430/270, 425/174, 425/174.4
• US Class Current: 264/401
• CPC Class Codes: B29C 64/135 the energy source being concentrated, e.g. scanning lasers or focused light sources
• CPC Class Codes: B29C 70/62 the filler being oriented during moulding for short fibres B29C70/14
• CPC Class Codes: B33Y 30/00 Apparatus for additive manufacturing; Details thereof or accessories therefor
• CPC Class Codes: B33Y 50/02 for controlling or regulating additive manufacturing processes

Abstract

Methods and apparatus are disclosed for the production of high precision large scale, micro and mini structures using three dimensional stereolithography. The objects formed using these methods have minimal stress between layers and low curl distortion. The objects also have low warpage because no post-cure treatment is necessary. The methods include the use of elevated pressure, elevated temperature, or sequential polymerization of polymer precursor fluid, or a combination of these, in the three dimensional stereolithographic process.

Claims

1. In the method for producing a three-dimensional project stereolithographically in a vat from a polymer precursor fluid capable of solidification in a desired pattern on exposure to a polymerization initiating source, the improvement which comprises exposing the polymer precursor fluid to the polymerization initiating source in a sequential manner,

further comprising effectively closing the vat to the outside environment,

imposing an elevated pressure above ambient pressure in the vat, and

imposing an elevated temperature above ambient temperature in the vat,

wherein the sequential polymerization is carried out with a sequentially moving slit system.

2. The improvement of claim 1, wherein the sequential polymerization is carried out using an iris diaphragm.

3. The improvement of claim 1, wherein the imposed pressure ranges between 5,000 and 8,000 psi.

4. The improvement of claim 1, wherein the polymerization initiating source is passed sequentially past a photomask prior to contacting the polymer precursor fluid.

5. The improvement of claim 1, wherein the polymerization initiating source is passed sequentially past a dot-matrix programmable mask.

6. The improvement of claim 1, wherein the photomask is achieved by pixel reflectors actuated by piezoelecticity.

7. The improvement of claim 1, wherein the photomask is achieved by microbubble technology.