Semiconductor sensor anodic-bonding process, wherein bonding of corrugation is prevented

• US 5,545,594 A
• Filed: 10/26/1993
• Issued: 08/13/1996
• Est. Priority Date: 10/26/1993
• Status: Expired due to Fees

• Current Assignee: Yazaki Meter Company Limited (Yazaki Corporation)
• Original Assignee: Yazaki Meter Company Limited (Yazaki Corporation)
• Inventors: Cahill, Sean S.
• Primary Examiner(s): Kunemund, Robert
• Assistant Examiner(s): WHIPPLE, MATTHEW LAVERNE
• Application Number:
  US08/141,054
• Time in Patent Office: 1,022 Days
• Field of Search: 73/721, 73/724, 73/718, 361/283, 156/630.1, 156/633.1, 437/228, 437/901, 437/927
• US Class Current: 438/51
• CPC Class Codes: G01L 9/0042 Constructional details associated with semiconductive diaphragm sensors, e.g. etching, or constructional details of non-semiconductive diaphragms details about the integration or bonding of piezoresistor in or on the diaphragm G01L9/0052 and G01L9/0057 respectively
• CPC Class Codes: G01L 9/0073 using a semiconductive diaphragm

Abstract

A method for bonding a silicon substrate and a glass substrate through an anodic-bonding process, including steps of: forming at least two holes in the glass substrate; forming a recess on the glass substrate, the recess confronting an undesired bonding portion defined in the silicon substrate; depositing a metal layer on the glass substrate with a predetermined pattern; depositing a dielectric layer on the metal layer, the insulating layer covering substantially the entire surface of the metal layer; and bonding the glass substrate and the semiconductor material.

Claims

1. A method for bonding a silicon substrate (1) and a glass substrate (101) through an anodic-bonding process, the method comprising steps of:

forming a hole (102) in the glass substrate;

forming a recess (103) in a surface of the glass substrate;

depositing a metal layer (104) on the surface of the glass substrate;

depositing a dielectric layer (105) on the metal layer; and

anodic-bonding the glass substrate and the silicon substrate so as to form a gap (7) therebetween, wherein the silicon substrate includes a corrugation (3) which flexibly supports a diaphragm (2), and wherein

in said step of forming the recess, the recess is formed so as to confront the corrugation to prevent the corrugation from bonding with the glass substrate, the recess extending over only a portion of the surface of the glass substrate substantially confronting the corrugation.

2. A method as recited in claim 1, wherein the corrugation surrounds the diaphragm, and wherein, in said step of forming the recess, the recess is formed so as to circumscribe the diaphragm, the recess confronting the corrugation over all of the corrugation so that no portions of the corrugation are bonded with the glass substrate in said anodic bonding step.