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Vacuum deposition and curing of liquid monomers apparatus

  • US 5,547,508 A
  • Filed: 11/17/1994
  • Issued: 08/20/1996
  • Est. Priority Date: 08/21/1992
  • Status: Expired due to Term
First Claim
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1. An apparatus for depositing a liquid monomer as a layer, comprising:

  • (a) a moving substrate,(b) a vacuum chamber placed about said moving substrate,(c) means for degassing the liquid monomer, and(d) means for depositing a first layer including a nozzle for flowing the degassed liquid monomer onto said moving substrate within the vacuum chamber.

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