Electro-micro-mechanical shutters on transparent substrates

• US 5,552,925 A
• Filed: 09/07/1993
• Issued: 09/03/1996
• Est. Priority Date: 09/07/1993
• Status: Expired due to Fees

• Current Assignee: John M. Baker, Zenith Electronics Corporation (LG Corporation)
• Original Assignee: John M. Baker
• Inventors: Worley, Eugene R.
• Primary Examiner(s): Phan, James
• Application Number:
  US08/117,532
• Time in Patent Office: 1,092 Days
• Field of Search: 359/290, 359/230, 359/227, 359/234, 359/236
• US Class Current: 359/230
• CPC Class Codes: B82Y 15/00 Nanotechnology for interacting, sensing or actuating, e.g. quantum dots as markers in protein assays or molecular motors
• CPC Class Codes: G02B 26/02 for controlling the intensity of light G02B26/004 takes precedence
• CPC Class Codes: G09G 2300/08 Active matrix structure, i.e. with use of active elements, inclusive of non-linear two terminal elements, in the pixels together with light emitting or modulating elements
• CPC Class Codes: G09G 3/3433 using light modulating elements actuated by an electric field and being other than liquid crystal devices and electrochromic devices using liquid crystal devices G09G3/36; using electrochromic devices G09G3/38
• CPC Class Codes: H02N 1/004 in which a body is moved along a path due to interaction with an electric field travelling along the path

Abstract

A micro-mechanical shutter array using micro-mechanical technology and silicon-on-transparent-substrate technology. The micro-mechanical shutter array is operated by using electro-static forces. Two basic types of shutter movements are described, viz. an electric force/electric counter-force and an electric force/mechanical (spring) counter-force.

Claims

1. Control apparatus for selectively blocking radiation comprising,

substrate means which is transparent to a radiation signal,

shutter means movably mounted on said substrate means,

said shutter means fabricated of a material which is electrically conductive and non-transparent to said radiation signal,

electrode means mounted on said substrate means adjacent to said shutter means,

said electrode means fabricated of a material which is electrically conductive,

gating means mounted on said substrate means and electrically connected to at least one of said shutter means and said electrode means, and

signal supplying means mounted on said substrate means for supplying electric signals to said electrode means and to said shutter means via said gating means to selectively apply an electric force to said shutter means in order to move said shutter means relative to said substrate means.

2. The control apparatus recited in claim 1 including,

mask means disposed substantially parallel to said substrate means and aligned with said shutter means.

3. The control apparatus recited in claim 2 wherein,

said mask means and said shutter means include a plurality of mask units and a plurality of shutter units thereby providing a scanning array.

4. The control apparatus recited in claim 1 wherein,

said substrate means is comprised of one of the materials in the class comprising silicon-on-sapphire, silicon-on-quartz and polysilicon-on-glass.

5. The control apparatus recited in claim 1 wherein,

said gating means comprises MOS-type transistors.

6. The control apparatus recited in claim 5 wherein,

said transistors selectively operate to produce analog voltage signals.

7. The control apparatus recited in claim 1 wherein,

said signal supplying means includes control signal means for selectively applying control signals to said shutter means.

8. The control apparatus recited in claim 1 wherein,

said signal supplying means includes capacitance means to retain a prescribed signal level thereat after the application of a control signal.

9. The control apparatus recited in claim 1 including,

mechanical force applying means connected to said shutter means for supplying a mechanical counter-force to said shutter means which mechanical counter-force is in opposition to said electric force.

10. The control apparatus recited in claim 9 wherein,

said mechanical force applying means comprises a resilient spring.

11. The control apparatus recited in claim 10 wherein,

said resilient spring is a helical spring.

12. The control apparatus recited in claim 10 wherein,

said resilient spring is an elongated, accordion spring.

13. The control apparatus recited in claim 1 including,

calibration circuit means connected to said substrate means.

14. The control apparatus recited in claim 13 wherein,

said calibration circuit means provides an automatic linearity calibration circuit.

15. The control apparatus recited in claim 14 wherein,

said calibration circuit includes at least one calibration cell adjacent to said shutter means on said substrate means,

signal means for activating each calibration cell,

calibration signal means for supplying a calibration signal representative of radiation passing through said shutter means, and

controller means for receiving said calibration signal to calculate weighting coefficients required to produce a linear output signal.

16. The control apparatus recited in claim 1 including,

radiation source means for irradiating said mask means, and

projection surface means for receiving radiation which passes through said mask means and said shutter means.

17. The control apparatus recited in claim 1 wherein,

said shutter means comprises a monolithic micro-mechanical shutter.

18. The control apparatus recited in claim 17 wherein,

said signal supplying means is fabricated using conventional integrated circuit techniques.

19. The control apparatus recited in claim 1 wherein,

said shutter means provides a rotary motion relative to said substrate means.

20. The control apparatus recited in claim 1 wherein,

said shutter means provides a sliding motion relative to said substrate means.

21. The control apparatus recited in claim 1 wherein,

said shutter means provides a bending motion relative to said substrate means.

22. The control apparatus recited in claim 1 wherein,

said shutter means provides a cantilevered motion relative to said substrate means.

23. The control apparatus recited in claim 1 wherein,

said electrode means comprise tapered electrodes.

24. The control apparatus recited in claim 1 wherein,

said electrode means surround said shutter means.

25. The control apparatus recited in claim 24 wherein,

said electrode means include a plurality of electrodes which are arranged to alternate in polarity relative to the electric signal supplied thereto.

26. The control apparatus recited in claim 1 wherein,

said signal supplying means comprises row and column conductors connected to said shutter means whereby said shutter means can be selected for operation.

27. The apparatus recited in claim 1 wherein,

said signal supplying means selectively and alternatively supplies signals to said electrode means and to said shutter means via said gating means to apply an electric counterforce to said shutter means to move said shutter means relative to said substrate means in the opposite direction relative to said electric force.

28. The control apparatus recited in claim 27 wherein,

said shutter means is selectively moved to an equilibrium position determined by said electric force and said electric counter-force.