In-situ monitoring of the change in thickness of films
First Claim
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1. A method of in-situ monitoring of the change in thickness of a conductive film on an underlying body comprising the steps of:
- (a) inducing an eddy current in the film by producing an alternating electromagnetic field with a sensor proximate the film, the sensor including a coil, a capacitor electrically connected to the coil, and a ferrite pot core for shaping the electromagnetic field; and
(b) detecting a change in the current due to the change in thickness of the film.
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Abstract
The change in thickness of a film on an underlying body such as a semiconductor substrate is monitored in situ by inducing a current in the film, and as the thickness of the film changes (either increase or decrease), the changes in the current are detected. With a conductive film, eddy currents are induced in the film by a generating an alternating electromagnetic field with a sensor which includes a capacitor and an inductor.
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Citations
19 Claims
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1. A method of in-situ monitoring of the change in thickness of a conductive film on an underlying body comprising the steps of:
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(a) inducing an eddy current in the film by producing an alternating electromagnetic field with a sensor proximate the film, the sensor including a coil, a capacitor electrically connected to the coil, and a ferrite pot core for shaping the electromagnetic field; and (b) detecting a change in the current due to the change in thickness of the film. - View Dependent Claims (2, 3)
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4. A method of in-situ monitoring of the change in thickness of a conductive film on an underlying body comprising the steps of:
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(a) inducing an eddy current in the film by producing an alternating electromagnetic field with a sensor proximate the conductive film, the alternating electromagnetic field produced by electrically exciting the sensor from a sweep output from a spectrum analyzer through an impedance means; and (b) detecting a change in the current due to the change in thickness of the film.
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5. A method of in-situ monitoring of the change in thickness of a conductive film on an underlying body comprising the steps of:
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(a) inducing an eddy current in the film by producing an alternating electromagnetic field with a sensor proximate the conductive film, the alternating electromagnetic field produced by electrically exciting the sensor from a swept output from a function generator through an impedance means; and (b) detecting a change in the current due to the change in thickness of the film.
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6. A method of in-situ monitoring of the change in thickness of a conductive film on a semiconductor substrate having a front side with the conductive film formed thereon, and a back side, comprising the steps of:
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(a) inducing an eddy current in the film; and (b) detecting a change in the current due to the change in thickness of the film. - View Dependent Claims (7, 8, 9, 10, 11, 12)
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13. A method of in-situ monitoring of the change in thickness of a conductive film on an underlying body, the film being removed by etching comprising the steps of:
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(a) inducing an eddy current in the film by producing an alternating electromagnetic field with a sensor proximate the film; and (b) detecting a change in the current due to the change in thickness of the film.
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14. A method of in-situ monitoring of the change in thickness of a conductive film on an underlying body, the film being removed by chemical-mechanical polishing, comprising the steps of:
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(a) inducing an eddy current in the film by producing an alternating electromagnetic field with a sensor proximate the film; and b) detecting a change in the current due to the change in thickness of the film. - View Dependent Claims (15, 16, 17, 18, 19)
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Specification