Chelating reagent containing photoresist stripper composition
First Claim
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1. A resist stripper composition comprising:
- (a) from about 20 to about 70% by weight of an organic polar solvent having a dipole moment of more than 3.5;
(b) from about 70 to about 20% by weight of an amine compound selected from the group consisting of compounds having the formula (I);
##STR6## wherein n and m are each independently an integer ranging from 0-5, inclusive;
X is hydrogen, alkyl, or alkoxy group;
Y is either --O-- or --NH--; and
Z is hydrogen, --OH, or --NH2 ;
(c) an effective amount of a chelating reagent comprising a mono- or poly-valent acid ligand covalently attached to a polymeric or oligomeric backbone wherein said polymeric or oligomeric backbone is selected from the group consisting of a phenolic resin having a weight average molecular weight of about 200 to about 5000 and a polyether having a weight molecular weight of 200 to about 5000; and
(d) optionally from about 0 to about 10% by weight of an amino acid selected from the group consisting of compounds having the formula (II);
##STR7## wherein n is an integer ranging from 1-3;
R1 and R2 are each independently selected from the group consisting of hydrogen and compounds having the formula (III);
##STR8## wherein R5, R6, and R7 are each independently selected from hydrogen, --OH, --CH2 OH, alkyl, alkoxy, phenyl, and mono-, di- or tri-hydroxy-substituted phenyl groups; and
R3 and R4 are each independently selected from the group consisting of hydroxy and compounds having the formula (IV);
##STR9## wherein X'"'"', Y'"'"', and Z'"'"' are each independently selected from hydrogen, --OH, --CH2 OH, --CH2 CH2 OH, --CH2 COOH, alkyl, or alkoxy group, and at least one of them is --OH, --CH2 CH2 OH, or --CH2 OH, all percents based on the weight of the stripper composition.
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Abstract
A non-corrosive photoresist composition containing:
(a) 20-70% by weight of an organic polar solvent having a dipole moment of more than 3.5;
(b) 70-20% by weight of selected amine compounds;
(c) an effective amount of a chelating reagent comprising a mono- or poly-valent acid type of ligand covalently attached to a polymeric or oligomeric backbone; and
(d) optionally 0-10% by weight of selected amino acid having a hydroxyl group.
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Citations
10 Claims
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1. A resist stripper composition comprising:
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(a) from about 20 to about 70% by weight of an organic polar solvent having a dipole moment of more than 3.5; (b) from about 70 to about 20% by weight of an amine compound selected from the group consisting of compounds having the formula (I);
##STR6## wherein n and m are each independently an integer ranging from 0-5, inclusive;
X is hydrogen, alkyl, or alkoxy group;
Y is either --O-- or --NH--; and
Z is hydrogen, --OH, or --NH2 ;(c) an effective amount of a chelating reagent comprising a mono- or poly-valent acid ligand covalently attached to a polymeric or oligomeric backbone wherein said polymeric or oligomeric backbone is selected from the group consisting of a phenolic resin having a weight average molecular weight of about 200 to about 5000 and a polyether having a weight molecular weight of 200 to about 5000; and (d) optionally from about 0 to about 10% by weight of an amino acid selected from the group consisting of compounds having the formula (II);
##STR7## wherein n is an integer ranging from 1-3;
R1 and R2 are each independently selected from the group consisting of hydrogen and compounds having the formula (III);
##STR8## wherein R5, R6, and R7 are each independently selected from hydrogen, --OH, --CH2 OH, alkyl, alkoxy, phenyl, and mono-, di- or tri-hydroxy-substituted phenyl groups; and
R3 and R4 are each independently selected from the group consisting of hydroxy and compounds having the formula (IV);
##STR9## wherein X'"'"', Y'"'"', and Z'"'"' are each independently selected from hydrogen, --OH, --CH2 OH, --CH2 CH2 OH, --CH2 COOH, alkyl, or alkoxy group, and at least one of them is --OH, --CH2 CH2 OH, or --CH2 OH, all percents based on the weight of the stripper composition. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10)
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Specification