Chelating reagent containing photoresist stripper composition

• US 5,561,105 A
• Filed: 05/08/1995
• Issued: 10/01/1996
• Est. Priority Date: 05/08/1995
• Status: Expired due to Fees

• Current Assignee: OLIN Microelectronic Chemicals Incorporated
• Original Assignee: OCG Microelectronic Materials Incorporated
• Inventors: Honda, Kenji
• Primary Examiner(s): Lieberman, Paul
• Assistant Examiner(s): Delcotto, Gregory R.
• Application Number:
  US08/436,550
• Time in Patent Office: 512 Days
• Field of Search: 252/153, 252/162, 252/171, 252/174.23, 252/544, 252/548, 252/DIG. 8, 134/2, 134/38, 430/360, 430/329, 430/331
• US Class Current: 510/178
• CPC Class Codes: C11D 7/3218 Alkanolamines or alkanolimines
• CPC Class Codes: C11D 7/3245 Aminoacids
• CPC Class Codes: C11D 7/36 containing phosphorus
• CPC Class Codes: C11D 7/5013 containing nitrogen
• CPC Class Codes: G03F 7/425 containing mineral alkaline compounds; containing organic basic compounds, e.g. quaternary ammonium compounds; containing heterocyclic basic compounds containing nitrogen

Abstract

A non-corrosive photoresist composition containing:

(a) 20-70% by weight of an organic polar solvent having a dipole moment of more than 3.5;

(b) 70-20% by weight of selected amine compounds;

(c) an effective amount of a chelating reagent comprising a mono- or poly-valent acid type of ligand covalently attached to a polymeric or oligomeric backbone; and

(d) optionally 0-10% by weight of selected amino acid having a hydroxyl group.

Claims

1. A resist stripper composition comprising:

(a) from about 20 to about 70% by weight of an organic polar solvent having a dipole moment of more than 3.5;

(b) from about 70 to about 20% by weight of an amine compound selected from the group consisting of compounds having the formula (I);

##STR6## wherein n and m are each independently an integer ranging from 0-5, inclusive;

X is hydrogen, alkyl, or alkoxy group;

Y is either --O-- or --NH--; and

Z is hydrogen, --OH, or --NH₂ ;

(c) an effective amount of a chelating reagent comprising a mono- or poly-valent acid ligand covalently attached to a polymeric or oligomeric backbone wherein said polymeric or oligomeric backbone is selected from the group consisting of a phenolic resin having a weight average molecular weight of about 200 to about 5000 and a polyether having a weight molecular weight of 200 to about 5000; and

(d) optionally from about 0 to about 10% by weight of an amino acid selected from the group consisting of compounds having the formula (II);

##STR7## wherein n is an integer ranging from 1-3;

R¹ and R² are each independently selected from the group consisting of hydrogen and compounds having the formula (III);

##STR8## wherein R⁵, R⁶, and R⁷ are each independently selected from hydrogen, --OH, --CH₂ OH, alkyl, alkoxy, phenyl, and mono-, di- or tri-hydroxy-substituted phenyl groups; and

R³ and R⁴ are each independently selected from the group consisting of hydroxy and compounds having the formula (IV);

##STR9## wherein X'"'"', Y'"'"', and Z'"'"' are each independently selected from hydrogen, --OH, --CH₂ OH, --CH₂ CH₂ OH, --CH₂ COOH, alkyl, or alkoxy group, and at least one of them is --OH, --CH₂ CH₂ OH, or --CH₂ OH, all percents based on the weight of the stripper composition.

2. The stripper composition of claim 1 wherein said solvent (a) is a cyclic amide.

3. The stripper composition of claim 2 wherein said cyclic amide is selected from the group consisting of N-alkyl-2-pyrrolidone, N-hydroxyalkyl-2-pyrrolidone, and 1,3-dialkyl-2-imidazolidinone.

4. The stripper composition of claim 1 wherein said amine (b) is an alkanolamine having at least one hydroxyl group per one molecule.

5. The stripper composition of claim 4 wherein said alkanolamine is selected from the group consisting of monoethanolamine, 2-(2-aminoethoxy)ethanol and 2-(2-aminoethylamino)ethanol, diethanolamine, and triethanolamine.

6. The stripper composition of claim 1 wherein said ligand is selected from the group consisting of N-dihydroxyethylglycine, iminodiacetic acid, nitrilotriacetic acid, N-hydroxylethyliminodiacetic acid, ethylenediaminetetraacetic acid, N,N'"'"'-ethylenediaminediacetic acid, N-hydroxyethylethylenediaminetriacetic acid, diethylenetriaminepentaacetic acid, 1,2-cyclohexanediaminetetraacetic acid, trimethylenediaminetetraacetic acid, ethyleneglycol diethyl ether diaminetetraacetic acid, ethylenediaminetetrapropionic acid, ethylenediaminedipropionic diacetic acid, betaaminoethylphosphonic N,N-diacetic acid, and aminoethylphosphonic N,N-diacetic acid.

7. The stripper composition of claim 1 wherein said phenolic resin is a novolak resin which is made by addition-condensation reaction of phenolic monomers with aldehydes in the presence of acid catalyst.

8. The stripper composition of claim 1 wherein said phenolic resin is a homopolymer or co-polymers of hydroxystyrenes which is made by radical polymerization, cationic polymerization, anionic polymerization, plasma-induced polymerization, X-ray-induced polymerization, thermal polymerization, or other conventional polymerization methods applicable to common vinyl monomers.

9. The stripper composition of claim 1 wherein said amino acid (d) is present and is selected from the group consisting of:

tricine, bicine, DL-homoserine, D-homoserine, L-homoserine, DL-threonine, D-allo-threonine, L-allo-threonine, D-threonine, L-threonine, DL-3-hydroxynorvaline, DL-metathroxine, DL-tyrosine, D-tyrosine, L-tyrosine, 3-(3,4-dihydroxyphenyl)-DL-alanine, 3-(3,4-dihydroxyphenyl)-L-amine, 3-(2,4,5-trihydroxyphenyl)-DL-aline, DL-alphamethyltyrosine, L-alphamethytyrosine, (-)-3-(3,4-dihydroxyphenyl)-2-methyl-L-alamine, DL-threo-3-phenylserine, and DL-threo-3,4-dihydroxyphenylserine.

10. The stripper composition of claim 9 wherein said amino acid is selected from the group consisting of tricine, bicine, 3-(2,4,5-trihydroxyphenyl)-DL-alanine, and DL-threo-3,4-dihydroxyphenylserine.