×

Method and arrangement for determining the layer-thickness and the substrate temperature during coating

  • US 5,564,830 A
  • Filed: 01/18/1994
  • Issued: 10/15/1996
  • Est. Priority Date: 06/03/1993
  • Status: Expired due to Term
First Claim
Patent Images

1. A method for determining a thickness of a layer and a temperature of a substrate during deposition or coating of the substrate in arrangements for the manufacture of semi-conductors or in deposition-devices by use of a detected temperature radiation from the substrate when being coated, characterized in that:

  • (a) the emissivity (ε

    ) of the substrate being coated is determined according to equation;

    
    
    space="preserve" listing-type="equation">ε

    =1-Rin which;

    ε

    represents the determined emissivity Of the substrate being coated, and R represents the reflectivity determined by measuring the reflected radiation of the substrate being coated by reflectometry;

    (b) the temperature (T) of the substrate is determined according to equation;

    ##EQU8## in which;

    T represents the determined temperature of the substrate being coated,T0 represents the initial temperature of the substrate measured by pyrometry at the beginning of the deposition or coating,P0 represents the initial thermal radiation of the substrate measured by pyrometry at the beginning of the deposition or coating,P represents the thermal radiation of the substrate being coated measured by pyrometry,R0 represents the initial reflectivity of the substrate before being coated measured by reflectometry,L0 represents the initial intensity of the reflected radiation of the substrate measured by reflectometry at the beginning of the deposition or coating,L represents the intensity of the reflected radiation of the substrate being coated measured by reflectometry,c1 and c2 each independently represent constants,λ

    represents the wavelength of incident radiation comprising mono-chromatic light on the substrate being coated from a light source, andfPlanck

    , T0) represents Planck'"'"'s radiation formula as a function of wavelength and initial measured temperature of the substrate; and

    ,(c) the thickness (d) of the layer deposited or coated on the substrate is determined by comparing a measured reflectivity, determined by measuring the reflected radiation of the substrate by reflectometry, with a given reflectivity vs. layer-thickness dependence (R=f(d)).

View all claims
  • 2 Assignments
Timeline View
Assignment View
    ×
    ×