Process for treatment of thin films based upon metallic oxide or nitride
First Claim
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1. A process for increasing the chemical or physical durability of a film deposited on a transparent substrate by a reactive cathodic sputtering technique comprising:
- subjecting the film after the deposition to an ion beam wherein the energy of the ions at impact on the film is 200 eV or less, and obtaining a film having a root mean square rugosity of 1.4 nm or less,wherein the deposition of the film is carried out in sequential steps and at least one of the sequential deposition steps is followed by at least one step of treatment with said ion beam, andwherein said film comprises a member selected from the group consisting of titanium oxide, titanium nitride, tantalum oxide, tin oxide, zinc oxide, silicon oxide and silicon nitride.
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Abstract
A treatment process for the purpose of improving the chemical and/or physical durability of film containing one or more metallic oxides, nitrides, oxynitrides or oxycarbides deposited on a transparent substrate by a cathodic sputtering technique, notably assisted by a magnetic field and preferably reactive in the presence of oxygen. Said process consists of subjecting the film to a low energy ion beam.
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12 Claims
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1. A process for increasing the chemical or physical durability of a film deposited on a transparent substrate by a reactive cathodic sputtering technique comprising:
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subjecting the film after the deposition to an ion beam wherein the energy of the ions at impact on the film is 200 eV or less, and obtaining a film having a root mean square rugosity of 1.4 nm or less, wherein the deposition of the film is carried out in sequential steps and at least one of the sequential deposition steps is followed by at least one step of treatment with said ion beam, and wherein said film comprises a member selected from the group consisting of titanium oxide, titanium nitride, tantalum oxide, tin oxide, zinc oxide, silicon oxide and silicon nitride. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 11)
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10. A process for the production of panes containing at least one treated film comprising:
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forming a film comprising a member selected from the group consisting of titanium oxide, titanium nitride, tantalum oxide, tin oxide, zinc oxide, silicon oxide and silicon nitride on a pane, followed by; subjecting the film to an ion beam, wherein the energy of the ion beam at impact on the film is 200 eV or less and obtaining panes having a root mean square rugosity of 1.4 nm or less; wherein the deposition of the film is carried out in sequential steps and at least one of the sequential deposition steps is followed by at least one step of treatment with said ion beam.
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12. A process comprising:
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forming a film on a transparent substrate by reactive cathodic sputtering, followed by subjecting the film to an ion beam, thereby forming a film with a root mean square rugosity of 1.4 nm or less, wherein the energy of the ions at impact on the film is 200 eV or less, and the film comprises a material selected from the group consisting of titanium oxide, titanium nitride, tantalum oxide, tin oxide, zinc oxide, silicon oxide and silicon nitride, and the deposition of the film is carried out in sequential steps and at least one of the sequential deposition steps is followed by at least one step of treatment with said ion beam.
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Specification