Computer-aided engineering system for design of sequence arrays and lithographic masks

• US 5,571,639 A
• Filed: 05/24/1994
• Issued: 11/05/1996
• Est. Priority Date: 05/24/1994
• Status: Expired due to Term

• Current Assignee: Affymetrix, Inc. (Thermo Fisher Scientific Incorporated)
• Original Assignee: Affymax Incorporated
• Inventors: Hubbell, Earl A., Winkler, James L., Morris, MacDonald S.
• Primary Examiner(s): Fleisher, Mindy
• Assistant Examiner(s): MCKELVEY, TERRY ALAN
• Application Number:
  US08/249,188
• Time in Patent Office: 896 Days
• Field of Search: 430/5, 250/492.1, 250/492.22, 435/6, 378/34, 378/35
• US Class Current: 430/5
• CPC Class Codes: B01J 19/0046 Sequential or parallel reactions, e.g. for the synthesis of polypeptides or polynucleotides; Apparatus and devices for combinatorial chemistry or for making molecular arrays synthesis methods per se C40B50/00
• CPC Class Codes: B01J 2219/00432 Photolithographic masks
• CPC Class Codes: B01J 2219/00529 DNA chips
• CPC Class Codes: B01J 2219/00585 Parallel processes
• CPC Class Codes: B01J 2219/0059 Sequential processes
• CPC Class Codes: B01J 2219/00596 Solid-phase processes
• CPC Class Codes: B01J 2219/00608 DNA chips
• CPC Class Codes: B01J 2219/00612 the surface being inorganic
• CPC Class Codes: B01J 2219/00626 Covalent
• CPC Class Codes: B01J 2219/00637 by coating it with another layer
• CPC Class Codes: B01J 2219/00659 Two-dimensional arrays
• CPC Class Codes: B01J 2219/00689 using computers
• CPC Class Codes: B01J 2219/00693 Means for quality control
• CPC Class Codes: B01J 2219/00695 Synthesis control routines, e.g. using computer programs
• CPC Class Codes: B01J 2219/00711 Light-directed synthesis
• CPC Class Codes: B01J 2219/00722 Nucleotides
• CPC Class Codes: B82Y 30/00 Nanotechnology for materials or surface science, e.g. nanocomposites
• CPC Class Codes: C07K 1/04 on carriers C07K1/003, C07K1/006 take precedence
• CPC Class Codes: C07K 1/045 using devices to improve synthesis, e.g. reactors, special vessels
• CPC Class Codes: C40B 40/06 Libraries containing nucleotides or polynucleotides, or derivatives thereof
• CPC Class Codes: C40B 60/14 : for creating libraries

Abstract

An improved set of computer tools for forming arrays. According to one aspect of the invention, a computer system (100) is used to select probes and design the layout of an array of DNA or other polymers with certain beneficial characteristics. According to another aspect of the invention, a computer system uses chip design files (104) to design and/or generate lithographic masks (110).

Claims

1. A method of forming a lithographic mask comprising the steps of:

in a computer system, generating a lithographic mask design file by the steps comprising;

(a)(i) inputting sequence information into said computer system, said sequence information defining monomer addition steps in a molecular synthesis wherein each monomer addition step is associated with at least one opening location in a mask design of said lithographic mask;

(a)(ii) identifying open locations in said mask design of said lithographic mask and joining said open locations in said mask design of said lithographic mask to form a joined location, said open locations defining flash locations for forming said lithographic mask, said joined location defining a larger flash location for forming said lithographic mask;

(a)(iii) outputting said mask design file, said mask design file defining locations for openings in said lithographic mask, wherein at least one flash location in said mask design file corresponds to a joined location; and

(b) with a computer-controlled system, forming said lithographic mask according to said mask design file, whereby at least some flash locations on said lithographic mask are connected.

5. The method as recited in claim 1 wherein said mask design file is outputted as a pattern generator file.

6. The method as recited in claim 1 wherein steps (a)(ii)-(a)(iii) are repeated for additional reticles on a single mask.

7. The method as recited in claim 1 wherein said mask design file comprises mask reticle opening location information and reticle identification.

9. The method as recited in claim 1 wherein step (a)(i) further comprises the step of inputting a switch matrix.

2. A method of forming a lithographic mask comprising the steps of:

in a computer system, generating a lithographic mask design file by the steps comprising;

(a)(i) inputting sequence information into said computer system, said sequence information defining monomer addition steps in a molecular synthesis wherein each monomer addition step is associated with at least one opening location in a mask design of said lithographic mask;

(a)(ii) identifying a first rectangular flash location as an open location in said mask design of said lithographic mask;

(a)(iii) evaluating an adjacent rectangular location to determine if said adjacent location is an open location and, if said adjacent location is an open location, connecting it with said first rectangular flash location to form a joined rectangular flash opening;

(a)(iv) outputting said mask design file, said mask design file defining locations for openings in said lithographic mask, wherein a flash location in said mask design file corresponds to said joined rectangular flash opening; and

(b) with a computer-controlled system, forming said lithographic mask according to said mask design file, whereby at least one flash location on said lithographic mask is connected.

3. The method as recited in claim 2 further comprising, before step (a)(iii), identifying an adjacent location by repetitively scanning said mask design of said lithographic mask from left to right and bottom to top to identify open locations.

4. The method as recited in claim 3 wherein said first rectangular flash location is located at a bottom left hand corner of said joined rectangular flash opening.

8. A method of forming a molecule with a lithographic mask comprising the steps of:

in a computer system, generating a lithographic mask design file by the steps comprising;

(a)(i) inputting sequence information into said computer system, said sequence information defining monomer addition steps in a molecular synthesis wherein each monomer addition step is associated with at least one opening location in a mask design of said lithographic mask;

(a)(ii) identifying open locations in said mask design of said lithographic mask and joining said open locations in said mask design of said lithographic mask to form a joined location, said open locations defining flash locations for forming said lithographic mask, said joined location defining a larger flash location for forming said lithographic mask;

(a)(iii) outputting said mask design file, said mask design file defining locations for openings in said

lithographic mask, wherein at least one flash location in said mask design file corresponds to a joined location; and

(b) with a computer-controlled system, forming said lithographic mask according to said mask design file, whereby at least some flash locations on said lithographic mask are connected;

(c) exposing a substrate to light through said lithographic mask, said substrate comprising photoremovable protecting groups thereon; and

(d) coupling monomeric molecules to said substrate wherein said photoremovable protecting groups are removed by step (c) to form a desired biological molecule on said substrate.

10. The method as recited in claim 8 wherein said monomeric molecules are nucleotides.