×

Fabrication of a surface micromachined capacitive microphone using a dry-etch process

  • US 5,573,679 A
  • Filed: 06/19/1995
  • Issued: 11/12/1996
  • Est. Priority Date: 06/19/1995
  • Status: Expired due to Term
First Claim
Patent Images

1. A method of fabricating a capacitive microphone, said method comprising the steps of:

  • A. providing a silicon layer;

    B. positioning a diaphragm and a backplate on opposite sides of the silicon layer;

    C. forming holes in the backplate; and

    D. introducing a dry etchant through the holes to form a cavity between the backplate and diaphragm by removing part of the silicon layer.

View all claims
  • 1 Assignment
Timeline View
Assignment View
    ×
    ×