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Electron beam inspection system and method

  • US 5,578,821 A
  • Filed: 01/11/1995
  • Issued: 11/26/1996
  • Est. Priority Date: 05/27/1992
  • Status: Expired due to Term
First Claim
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1. An automatic system for the automatic inspection of a substantially non-conductive substrate comprising:

  • a field emission electron source to provide an electron beam;

    a charged particle beam column to deliver and scan said electron beam from said field emission electron source on a surface of said substantially non-conductive substrate;

    at least one charged particle detector to detect at least one of three types of charged particles emanating from the top and bottom surfaces of said substantially non-conductive substrate, namely, secondary charged particles, back-scattered charged particles and transmitted charged particles;

    a continuously moving x-y stage disposed to receive said substantially non-conductive substrate and to provide at least one degree of motion to said substantially non-conductive substrate while the substantially non-conductive substrate is being scanned by the charged particle beam; and

    a multi-processor image defect computer coupled to said at least one charged particle detector to identify defects on said substrate.

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