Scanning light exposure apparatus
First Claim
1. A scanning light exposure apparatus comprising:
- a plurality of illumination optical systems for irradiating light beams to a corresponding plurality of sub-areas in a pattern area of a mask;
a plurality of projection optical systems arranged along a predetermined direction for projecting erected images of unity magnification of the sub-areas by respective light beams transmitted through the mask onto a photo-sensitive substrate;
each illumination optical system having a diaphragm member arranged at a substantially conjugate position to the photo-sensitive substrate in said illumination optical system for limiting a projection area of the sub-area to the photo-sensitive substrate;
scanning means for synchronously scanning said mask and said photo-sensitive substrate substantially transversely to the predetermined direction relative to said projection optical system; and
diaphragm control means for changing a width of an aperture of each diaphragm member along a direction transverse to the predetermined direction.
1 Assignment
0 Petitions
Accused Products
Abstract
A scanning light exposure apparatus comprises illumination optical systems for radiating light beams to a plurality of sub-areas in a pattern area of a mask, a plurality of projection optical systems arranged along a predetermined direction for projecting erected images of unity magnification of the sub-areas by the light beams transmitted through the mask onto a photo-sensitive substrate, a diaphragm member arranged at a substantially conjugate position to the photo-sensitive substrate in each illumination optical system for limiting a projection area of the sub-area to the photo-sensitive substrate, scanning means for synchronously scanning said mask and said photo-sensitive substrate substantially transversely to the predetermined direction relative to said projection optical systems and diaphragm control means for changing a width of an aperture of each diaphragm member along a direction transverse to the predetermined direction.
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Citations
4 Claims
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1. A scanning light exposure apparatus comprising:
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a plurality of illumination optical systems for irradiating light beams to a corresponding plurality of sub-areas in a pattern area of a mask; a plurality of projection optical systems arranged along a predetermined direction for projecting erected images of unity magnification of the sub-areas by respective light beams transmitted through the mask onto a photo-sensitive substrate; each illumination optical system having a diaphragm member arranged at a substantially conjugate position to the photo-sensitive substrate in said illumination optical system for limiting a projection area of the sub-area to the photo-sensitive substrate; scanning means for synchronously scanning said mask and said photo-sensitive substrate substantially transversely to the predetermined direction relative to said projection optical system; and diaphragm control means for changing a width of an aperture of each diaphragm member along a direction transverse to the predetermined direction. - View Dependent Claims (2, 3, 4)
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Specification