Antireflection coating for a temperature sensitive substrate
First Claim
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1. A coated article comprising:
- a temperature-sensitive substrate having a melting point lower than glass;
an anti-reflection coating including a plurality of layers substantially transparent to visible light, at least one of said layers being a DC reactively sputtered material having a refractive index higher than said substrate and selected from the group consisting of tin oxide, indium oxide, zinc oxide, tin-doped indium oxide, antimony-doped tin oxide, tin-bismuth oxide, and tin-zinc oxide, and at least one other layer having a refractive index lower than said substrate.
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Abstract
A multilayer antireflection coating for a temperature sensitive substrate such as plastic. One layer is a DC reactively sputtered metal oxide which may be deposited quickly and without imparting a large amount of heat to the substrate. Another layer has a refractive index lower than the substrate.
109 Citations
10 Claims
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1. A coated article comprising:
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a temperature-sensitive substrate having a melting point lower than glass; an anti-reflection coating including a plurality of layers substantially transparent to visible light, at least one of said layers being a DC reactively sputtered material having a refractive index higher than said substrate and selected from the group consisting of tin oxide, indium oxide, zinc oxide, tin-doped indium oxide, antimony-doped tin oxide, tin-bismuth oxide, and tin-zinc oxide, and at least one other layer having a refractive index lower than said substrate. - View Dependent Claims (2, 3, 4, 5, 6, 7)
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8. A process for making a coated article, comprising the steps of:
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providing a temperature-sensitive surface having a melting point lower than glass; and disposing an anti-reflection coating including a plurality of layers substantially transparent to visible light on said surface, said disposing step including the steps of DC reactively sputtering a material selected from the group consisting of tin oxide, indium oxide, zinc oxide, tin-doped indium oxide, antimony-doped tin oxide, tin-bismuth oxide, and tin-zinc oxide, and depositing at least one other layer having a refractive index different from said DC reactively sputtered material.
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9. An anti-reflection coating for a substrate, comprising:
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four layers substantially transparent to visible light and designated the first, second, third, and fourth layers in consecutive numerical order beginning with the layer farthest from the substrate; said first layer substantially composed of silicon dioxide having a refractive index lower than said substrate, an optical thickness of about one-quarter wavelength at a wavelength between 480 and 560 nanometers, and a physical thickness of about 94.2 nanometers; said second layer substantially composed of DC reactively sputtered tin oxide having a refractive index higher than said substrate, an optical thickness between about one-quarter and one-third of a wavelength at a wavelength between 480 and 560 nanometers, and a physical thickness of about 76.4 nanometers; said third layer substantially composed of silicon dioxide having a refractive index lower than said second layer and a physical thickness of about 31.9 nanometers; said fourth layer substantially composed of DC reactively sputtered tin oxide having a refractive index greater than said third layer and a physical thickness of about 20.3 nanometers; and said third and fourth layers having a total optical thickness less than one-quarter wavelength at a wavelength between 480 and 560 nanometers.
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10. An anti-reflection coating for a substrate, comprising:
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four layers substantially transparent to visible light and designated the first, second, third, and fourth layers in consecutive numerical order beginning with the layer farthest from the substrate; said first layer substantially composed of silicon dioxide having a refractive index lower than said substrate, an optical thickness of about one-quarter wavelength at a wavelength between 480 and 560 nanometers, and a physical thickness of about 92.2 nanometers; said second layer substantially composed of DC reactively sputtered tin oxide having a refractive index higher than said substrate, an optical thickness between about one-quarter and one-third of a wavelength at a wavelength between 480 and 560 nanometers, and a physical thickness of about 78.1 nanometers; said third layer substantially composed of silicon dioxide having a refractive index lower than said second layer and a physical thickness of about 32.2 nanometers; said fourth layer substantially composed of DC reactively sputtered tin oxide having a refractive index greater than said third layer and a physical thickness of about 18.6 nanometers; and said third and fourth layers having a total optical thickness less than one-quarter wavelength at a wavelength between 480 and 560 nanometers.
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Specification