Single substrate vacuum processing apparatus having improved exhaust system

• US 5,582,866 A
• Filed: 04/14/1994
• Issued: 12/10/1996
• Est. Priority Date: 01/28/1993
• Status: Expired due to Term

• Current Assignee: Applied Materials Incorporated
• Original Assignee: Applied Materials Incorporated
• Inventors: White, John M.
• Primary Examiner(s): LEWIS, CHERYL RENEA
• Application Number:
  US08/277,865
• Time in Patent Office: 971 Days
• Field of Search: 118/715, 118/725, 118/728, 156/345, 427/248.1
• US Class Current: 427/248.1
• CPC Class Codes: C23C 16/4407 Cleaning of reactor or reactor parts by using wet or mechanical methods
• CPC Class Codes: C23C 16/4412 Details relating to the exhausts, e.g. pumps, filters, scrubbers, particle traps

Abstract

In a single substrate vacuum processing chamber for processing large glass substrates, a novel vacuum exhaust system is built into the lid of the chamber. A plenum chamber which is connected to a continuous vacuum pump is mounted around a gas dispersion plate, also built into the lid, and has continuous access to the reaction region of the chamber by means of a restricted access passage. The plenum chamber is large with respect to the access passage which provides uniform and continuous evacuation of process gases and particulates from the full periphery of the processing region. This design minimizes the deposition of particulates onto the large area substrate and onto the port by which the substrate enters and leaves the chamber and, by the same design, creates a chamber which has a small volume in relation to the size of the substrate is can process. The close proximity of the plenum chamber and the access passage to the plasma region facilitates the use of a periodic dry etch-clean plasma to help keep these exhaust regions clean between periodic manual cleanings. A further advantage of this design is that when the chamber is to be manually cleaned periodically, the lid is easily swung open, giving ready access to the plenum chamber in which particulates have accumulated, and without disturbing gas delivery and exhaust lines which are all built into the lid.

Claims

1. A vacuum processing chamber comprising

a) a lid portion having a gas dispersion plate and a vacuum exhaust system therein;

b) a chamber body comprising a support for a substrate to be processed; and

c) a processing region formed between said gas dispersion plate and said support when said lid portion is closed against said chamber body.

2. A vacuum processing chamber according to claim 1 wherein said vacuum exhaust system comprises a plenum chamber surrounding said gas dispersion plate, and a restricted passage between said processing region and said plenum chamber.

3. A vacuum processing chamber according to claim 2 wherein the restricted passage is formed by a close fitting between a portion of said lid portion and a portion of said chamber body to form an opening around a periphery of said support, said opening being narrow compared to the width of said plenum chamber.

4. A vacuum processing chamber according to claim 3 wherein the restricted passage is formed by a plurality of openings around the periphery of said support.

5. A vacuum processing chamber according to claim 3 wherein said restricted passage comprises an annular opening surrounding the periphery of said support.

6. A vacuum processing chamber according to claim 2 wherein said restricted passage is variably sized around the periphery of said support so that an exhaust flow of products of said processing gas is substantially uniform around a periphery of said processing region to thereby negate the net effect of vacuum pumping along only one side of said plenum chamber.

7. A vacuum processing chamber according to claim 2 wherein a passageway formed between walls of said chamber body and said lid portion tapers inwardly from a periphery of said processing region to said restricted passage.

8. A vacuum processing chamber according to claim 2 wherein said chamber body includes a vacuum exhaust channel communicating through a port with said plenum chamber when said lid portion and said chamber body are closed together.

9. A vacuum processing chamber according to claim 1 wherein said chamber body further comprises a closable port disposed on a side of said processing region away from said lid portion for ingress and egress of said substrate.

10. A vacuum processing chamber according to claim 1 wherein said chamber body includes a vacuum exhaust channel connected on one end to a vacuum pump and connected on another end, when said lid portion and said chamber body are closed together, to said vacuum exhaust system.

11. A vacuum processing chamber according to claim 1 wherein said lid portion is hingedly attached to said chamber body to thereby close with and open from said chamber body.

12. A vacuum processing chamber according to claim 10 further comprising a single O-ring seal mounted between said lid portion and said chamber body.

13. A method of processing a substrate in a vacuum chamber comprising

a) closing a lid having a source of processing gas therein against a chamber body including a substrate support and a substrate mounted thereon opposite said source to form a processing region;

b) passing said processing gas into said processing region,

c) at least partially reacting said gas and said substrate to form a processing residue; and

d) exhausting said processing residue upward into said lid.

14. A method according to claim 13 wherein said exhausting step includes providing a plenum chamber in said lid connected to a restricted passage between said processing region and said lid and drawing said processing residue through said restricted passage.

15. A method according to claim 14 wherein said closing step forms said restricted passage between said lid and said chamber body.

16. A method according to claim 14 wherein said exhausting step further comprises drawing said processing residue from said plenum chamber through an exhaust channel formed in said chamber.

17. A processing chamber comprising

a) a chamber body accommodating a substrate therein and having a wall with an aperture therethrough;

and

b) a lid removably and sealingly closing said aperture and including a pathway at a central part of said lid for the injection of processing gas into said chamber body and at least one exhaust channel substantially surrounding a periphery of said lid for exhausting said processing gas from said chamber body.

18. A chamber according to claim 17 further comprising at least one hinge by which said lid pivots on said chamber body.

19. A chamber according to claim 17 wherein said substrate is supported in said chamber body in a horizontal orientation and wherein said lid is disposed over said substrate when said lid is sealed to said chamber body.

20. A chamber according to claim 18 wherein said pathway comprises a gas dispersion plate fixed to said lid, wherein said dispersion plate includes a plurality of openings directed towards and distributed over substantially the whole area of said substrate.