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Single substrate vacuum processing apparatus having improved exhaust system

  • US 5,582,866 A
  • Filed: 04/14/1994
  • Issued: 12/10/1996
  • Est. Priority Date: 01/28/1993
  • Status: Expired due to Term
First Claim
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1. A vacuum processing chamber comprisinga) a lid portion having a gas dispersion plate and a vacuum exhaust system therein;

  • b) a chamber body comprising a support for a substrate to be processed; and

    c) a processing region formed between said gas dispersion plate and said support when said lid portion is closed against said chamber body.

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