Method for fabricating and using defect-free phase shifting masks

• US 5,582,939 A
• Filed: 07/10/1995
• Issued: 12/10/1996
• Est. Priority Date: 07/10/1995
• Status: Expired due to Term

• Current Assignee: Micron Technology, Inc.
• Original Assignee: Micron Technology, Inc.
• Inventors: Pierrat, Christophe
• Primary Examiner(s): Rosasco, S.
• Application Number:
  US08/500,481
• Time in Patent Office: 519 Days
• Field of Search: 430/5, 430/322, 430/323, 430/324, 156/646, 156/652
• US Class Current: 430/5
• CPC Class Codes: G03F 1/30 Alternating PSM, e.g. Levenson-Shibuya PSM; Preparation thereof

Abstract

A method for forming a defect-free phase shift mask includes forming a mask blank having a substrate, an etch stop layer, a phase shift layer and an opaque layer. The etch stop layer and phase shift layer are formed of chemically different materials to allow selective etching and end point detection. Initially the opaque layer is patterned and etched using a process such as e-beam lithography. Then the phase shift layer is patterned and etched using the etch stop layer as an end point. Bump defects formed in phase shift areas are then removed by exposing a resist layer to leave the phase shifters, or alternately just the defects, unprotected. During defect etching, the etch stop layer can again be used to endpoint the etch process. The etch stop layer can also be formed as a phase shift layer to permit removal of indentation defects using a process such as ion milling.

Claims

1. A method for forming a phase shift mask comprising:

providing a transparent substrate;

forming a first layer on the substrate;

forming a phase shift layer on the first layer out of a material that is chemically different than a material of the first layer;

forming a pattern of opaque light blockers on the phase shift layer;

etching the phase shift layer to form a pattern of phase shifters;

depositing a layer of resist on the phase shift layer and exposing and developing the resist to form a mask having openings aligned with the phase shifters; and

etching through the openings in the mask to the first layer to remove a bump defect on the phase shift layer.

2. The method as claimed in claim 1 and wherein the mask is exposed using a same mask pattern as used for etching the phase shift layer to form the phase shifters.

3. The method as claimed in claim 1 and wherein the first layer is a thin film having a thickness that is not selected to provide a desired phase shift for light passing there through.

4. The method as claimed in claim 1 and further comprising forming the first layer as a second phase shift layer and removing an indentation defect by removing the first layer subjacent to the indentation defect to the substrate.

5. The method as claimed in claim 1 and wherein the first layer and phase shift layer are formed with indexes of refraction and thicknesses to provide a combined phase shift of 2pπ

where p is an integer.

6. The method as claimed in claim 1 and wherein the first layer has a thickness of less than 500 Å

.

7. The method as claimed in claim 1 and wherein the first layer is formed of a fluoride and the phase shift layer is formed of an oxide.

8. The method as claimed in claim 7 and wherein the substrate is formed of quartz and the phase shift layer is formed of SiO₂ and the first layer is formed of a material selected from the group consisting of MgF₂, CaF₂, YF₃, and LaF₃.

9. The method as claimed in claim 1 and wherein the etching step for removing the defects is an anisotropic dry etch process.

10. The method as claimed in claim 9 and wherein the defect is etched to an endpoint of the first layer by detecting by-product species present in an etch plasma.

11. The method as claimed in claim 1 and wherein the layer of resist is exposed and developed to leave the phase shifters substantially exposed.

12. The method as claimed in claim 1 and wherein the layer of resist is exposed and developed to leave just the defect substantially exposed.

13. The method as claimed in claim 1 and further comprising using the mask to expose a second layer of resist formed on a semiconductor wafer.

14. The method as claimed in claim 1 and wherein the mask is selected from the group consisting of alternating aperture phase shift masks and rim phase shift masks.

15. A method for forming a phase shifting mask comprising:

providing a transparent substrate;

forming an etch stop layer and a phase shift layer on the substrate;

depositing, exposing, and developing a first layer of resist to form a first mask for etching the phase shift layer to an endpoint of the etch stop layer to form phase shifters;

depositing a second layer of resist over the phase shifters;

exposing and developing the second layer of resist to form a second mask with openings aligned with the phase shifters; and

removing bump defects on the phase shifters by etching through the openings in the second mask to an endpoint of the etch stop layer.

16. The method as claimed in claim 15 and wherein the etch stop layer and the phase shift layer are each formed with a thickness and index of refraction to provide a phase shift of π

or odd multiple thereof, and a combined phase shift of 2pπ

where p is an integer.

17. The method as claimed in claim 16 and further comprising removing indentation defects from the mask by removing the phase shift layer and the etch stop layer in an area surrounding the indentation defect to the substrate.

18. The method as claimed in claim 17 and wherein the substrate is formed of quartz, the phase shift layer is formed of SiO₂ and the etch stop layer is formed of a material selected from the group consisting of MgF₂, CaF₂, YF₃, LaF₃.

19. The method as claimed in claim 15 and wherein the mask is a chromeless phase shift mask.

20. The method as claimed in claim 15 and further comprising forming an opaque layer on the phase shift layer and patterning the opaque layer to form opaque light blockers.

21. The method as claimed in claim 20 and wherein the opaque layer and phase shift layer are patterned to form an alternating aperture phase shifting mask.

22. The method as claimed in claim 20 and wherein the opaque layer and phase shift layer are patterned to form a rim phase shifting mask.

23. A method for forming a phase shift mask comprising:

providing a transparent substrate;

forming an etch stop layer on the substrate out of a first material;

forming a phase shift layer on the etch stop layer out of a second material that is chemically different than the first material;

patterning the opaque layer by exposing and developing a first layer of resist to form a first mask for etching the opaque layer to form opaque light blockers;

patterning the phase shift layer by exposing and developing a second layer of resist to form a second mask for etching the opaque layer to the etch stop layer to form phase shifters;

removing bump defects on the phase shifters by exposing and developing a third layer of resist using a same pattern as the second mask to form a third mask for etching the bump defects.

24. The method as claimed in claim 23 and wherein etching the bump defects is performed anisotropically to avoid undercutting the phase shifters.

25. The method as claimed in claim 23 and wherein the phase shift layer is formed of SiO₂ and the etch stop layer is formed of a material selected from the group consisting of MgF₂, CaF₂, YF₃, LaF₃.

26. The method as claimed in claim 23 and wherein the substrate is formed of a material selected from the group consisting of quartz and Al₂ O₃.

27. The method as claimed in claim 23 and wherein the first and second layers of resist are exposed using electron beam lithography.

28. The method as claimed in claim 27 and wherein the third layer of resist is exposed using a mask repair tool.

29. The method as claimed in claim 23 and further comprising removing an indentation defect from the mask by removing the phase shift layer and the etch stop layer in an area surrounding the indentation defect to the substrate.

30. The method as claimed in claim 23 and wherein the etch stop layer and phase shift layer are formed with indexes of refraction and thicknesses to provide a combined phase shift of 2pπ

where p is an integer.

31. The method as claimed in claim 23 and further comprising using the mask to pattern a semiconductor wafer coated with a fourth layer of resist.

32. A method for forming a phase shift mask comprising:

providing a transparent substrate;

forming an etch stop layer and a phase shift layer on the substrate;

forming a pattern of opaque light blockers on the phase shift layer;

etching the phase shift layer to the etch stop layer to form a pattern of phase shifters;

locating bump defects on the phase shifters;

depositing a layer of resist on the phase shift layer;

exposing and developing the resist to form a mask having openings aligned with the defects; and

etching through the openings in the mask to the etch stop layer to remove the defects.

33. The method as claimed in claim 32 and wherein exposing the resist is with an e-beam mask writer.

34. The method as claimed in claim 32 and wherein exposing the resist is with a mask writing tool.

35. The method as claimed in claim 32 and wherein locating the defects is with a scanning electron microscope.