UV/EB curable butyl copolymers for lithographic and corrosion-resistant coating applications
First Claim
Patent Images
1. A method for making a lithographic image on a surface, comprising the steps of:
- (a) coating at least a portion of a surface of an article with a composition comprising a random copolymer of an isoolefin of 4 to 7 carbon atoms and para-alkylstyrene comonomer, said isoolefin comprising 10 to 99.5 weight % of said copolymer and said para-alkylstyrene comprising 0.5 to 90 weight % of said copolymer, wherein about 0.5 to 55 weight % of said copolymer comprises para-alkylstyrene monomers having a photoinitiator substituted on the pendent alkyl group, said copolymer having a substantially homogenous compositional distribution;
(b) selectively exposing said surface to gamma, UV, thereby forming a crosslinked latent electron beam, visible, or microwave radiation to crosslink the copolymer lithographic image,(c) removing the uncrosslinked copolymer to develop the lithographic image.
0 Assignments
0 Petitions
Accused Products
Abstract
A lithographic coating and method of framing a lithographic image are disclosed. The method comprises coating at least a portion of a surface of an article with a radiation-crosslinkable polymer, and exposing the coated surface to a pattern of radiation to crosslink the polymer in a lithographic image. The functionalized polymer is a copolymer of an isoolefin of 4 to 7 carbon atoms and para-alkylstyrene, wherein the para-alkylstyrene is functionalized with a radiation reactive group at the para-alkyl group of the para-alkylstyrene.
15 Citations
8 Claims
-
1. A method for making a lithographic image on a surface, comprising the steps of:
-
(a) coating at least a portion of a surface of an article with a composition comprising a random copolymer of an isoolefin of 4 to 7 carbon atoms and para-alkylstyrene comonomer, said isoolefin comprising 10 to 99.5 weight % of said copolymer and said para-alkylstyrene comprising 0.5 to 90 weight % of said copolymer, wherein about 0.5 to 55 weight % of said copolymer comprises para-alkylstyrene monomers having a photoinitiator substituted on the pendent alkyl group, said copolymer having a substantially homogenous compositional distribution; (b) selectively exposing said surface to gamma, UV, thereby forming a crosslinked latent electron beam, visible, or microwave radiation to crosslink the copolymer lithographic image, (c) removing the uncrosslinked copolymer to develop the lithographic image. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8)
-
Specification