Reduced residue hard surface cleaner

• US 5,585,342 A
• Filed: 03/24/1995
• Issued: 12/17/1996
• Est. Priority Date: 03/24/1995
• Status: Expired due to Term

• Current Assignee: Clorox Company
• Original Assignee: Clorox Company
• Inventors: Garabedian, Aram Jr., Julian, Jennifer C., Choy, Clement K., Robinson, Gary L.
• Primary Examiner(s): Harriman, Erin M.
• Application Number:
  US08/410,470
• Time in Patent Office: 634 Days
• Field of Search: 252/547, 252/153, 252/158, 252/DIG. 10
• US Class Current: 510/433
• CPC Class Codes: C11D 1/75 Amino oxides
• CPC Class Codes: C11D 3/044 Hydroxides or bases
• CPC Class Codes: C11D 3/10 Carbonates ; Bicarbonates
• CPC Class Codes: C11D 3/201 linear
• CPC Class Codes: C11D 3/2068 Ethers

Abstract

The invention provides an aqueous, hard surface cleaner with significantly improved residue removal and substantially reduced filming/streaking, said cleaner comprising:

(a) an effective amount of at least one organic solvent with a vapor pressure of at least 0.001 mm Hg at 25° C., and mixtures of such solvents;

(b) an effective amount of at least one semi-polar nonionic surfactant, said surfactant having the structure: ##STR1## wherein R¹ is C_5-20 alkyl, R² and R³ are both C_1-4 alkyl, ##STR2## or --(CH₂)_p --OH, although R² and R³ do not have to be equal, and n is 1-5, and p is 1-6;

(c) an effective amount of a buffering system which comprises a nitrogenous buffer which will result in a pH of greater than 6.5; and

(d) the remainder as substantially all water.

Claims

1. An aqueous, hard surface cleaner with significantly improved residue removal and substantially reduced filming/streaking, said cleaner comprising:

(a) about 1-50% of at least one organic solvent with a vapor pressure of at least 0.001 mm Hg at 25°

C., and mixtures of such solvents;

(b) about 0.001-2% of at least one semi-polar nonionic surfactant, said surfactant having the structure;

##STR13## wherein R¹ is C_5-20 alkyl, R² and R³ are both C_1-4 alkyl, ##STR14## or --(CH₂)_p --OH, although R² and R³ do not have to be equal, and n is 1-5, and p is 1-6, wherein the total amount of semi-polar nonionic surfactant and any optional surfactants does not exceed 2%;

(c) about 0.01-2% of a buffering system which comprises ammonium or alkaline earth carbamate; and

(d) the remainder as substantially all water.

2. The hard surface cleaner of claim 1 wherein said solvent is an alkanol which is selected from the group consisting of methanol, ethanol, n-propanol, isopropanol, butanol, pentanol, hexanol, their various positional isomers, and mixtures of the foregoing.

3. The hard surface cleaner of claim 1 wherein said solvent is an alkylene glycol ether which is selected from the group consisting of ethylene glycol monobutyl ether, ethylene glycol monopropyl ether, propylene glycol monopropyl ether, propylene glycol monobutyl ether, and mixtures thereof.

4. The hard surface cleaner of claim 3 wherein said solvent is ethylene glycol monobutyl ether.

5. The hard surface cleaner of claim 3 wherein said solvent is propylene glycol n-butyl ether.

6. The hard surface cleaner of claim 3 wherein said solvent is propylene glycol t-butyl ether.

7. The hard surface cleaner of claim 1 wherein said surfactant further comprises a mixture of the semi-polar nonionic surfactant and an anionic cosurfactant.

8. The hard surface cleaner of claim 1 wherein said buffer further includes an ammonium hydroxide or ammonia.