Radio-frequency plasma source
First Claim
1. A plasma source comprising a discharge chamber (1) bounded by a base wall (5) and by a lateral wall (3), a system (7) for the admission of gas into said discharge chamber, a system of electrodes (13, 15) which are associated with said discharge chamber (1) and which are connected to a radio-frequency generator (17), and which apply an oscillating electric field within the discharge chamber and means (9, 11) for generating a static magnetic field in said discharge chamber,characterized in that:
- coaxially with said discharge chamber (1) there are disposed a first and a second electrode (15;
13;
13X), at least one of which has an annular extent and is disposed in an intermediate position along the axial extent of the discharge chamber, said two electrodes (15;
13;
13X) being connected to two poles of the radio-frequency generator;
and in that the means (9,
11) for generating the static magnetic field generate a magnetic field (B0) approximately parallel to the axis (A--A) of the discharge chamber, with an average intensity in the discharge chamber for which the corresponding electron cyclotron frequency fc satisfies the condition f<
fc<
7f where f is the frequency of the electric field.
3 Assignments
0 Petitions
Accused Products
Abstract
A plasma source is described, comprising a discharge chamber (1) bounded by a base wall (5) and by a lateral wall (3), a system (7) for the admission of gas into said discharge chamber, a system of electrodes (13, 15) which are associated with said discharge chamber (1) and which are connected to a radio-frequency generator (17), and which apply an oscillating electric field within the discharge chamber, and means (9, 11) for generating a static magnetic field in said discharge chamber. Coaxially with said discharge chamber (1) there are disposed a first and a second electrode (15; 13; 13X), at least one of which has an annular extent and is disposed in an intermediate position along the axial extent of the discharge chamber, said two electrodes (15; 13; 13X) being connected to two poles of the radio-frequency generator.
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Citations
8 Claims
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1. A plasma source comprising a discharge chamber (1) bounded by a base wall (5) and by a lateral wall (3), a system (7) for the admission of gas into said discharge chamber, a system of electrodes (13, 15) which are associated with said discharge chamber (1) and which are connected to a radio-frequency generator (17), and which apply an oscillating electric field within the discharge chamber and means (9, 11) for generating a static magnetic field in said discharge chamber,
characterized in that: -
coaxially with said discharge chamber (1) there are disposed a first and a second electrode (15;
13;
13X), at least one of which has an annular extent and is disposed in an intermediate position along the axial extent of the discharge chamber, said two electrodes (15;
13;
13X) being connected to two poles of the radio-frequency generator;and in that the means (9,
11) for generating the static magnetic field generate a magnetic field (B0) approximately parallel to the axis (A--A) of the discharge chamber, with an average intensity in the discharge chamber for which the corresponding electron cyclotron frequency fc satisfies the condition f<
fc<
7f where f is the frequency of the electric field. - View Dependent Claims (2, 3, 4, 5, 6)
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7. Method for the generation of plasma in a discharge chamber (1) comprising a base wall (5) and a lateral wall (3), in which in said chamber there is generated a static magnetic field (B0) and there is disposed a system of electrodes (13, 15) which apply a radio-frequency electric field (Erf) within the discharge chamber (1),
characterized by: -
disposing a first electrode (13) and a second electrode (15) coaxially with said chamber (1), at least one of said electrodes being of annular extent; and by generating a static magnetic field (B0) approximately parallel to the axis (A--A) of the discharge chamber, the magnetic field exhibiting an average intensity in the discharge chamber for which the corresponding electron cyclotron frequency fc satisfies the condition f<
fc<
7f where f is the frequency of the electric field. - View Dependent Claims (8)
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Specification