Low-strain laser structures with group III nitride active layers
First Claim
1. A separate-confinement heterostructure laser comprising:
- an indium gallium nitride active layer;
upper and lower waveguide layers on said active layer formed from the group consisting of AlGaN, InGaN, and AlInGaN; and
upper and lower cladding layers on said respective upper and lower waveguide layers and formed of AlGaN.
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Accused Products
Abstract
A Group III nitride laser structure is disclosed with an active layer that includes at least one layer of a Group III nitride or an alloy of silicon carbide with a Group III nitride, a silicon carbide substrate, and a buffer layer between the active layer and the silicon carbide substrate. The buffer layer is selected from the group consisting of gallium nitride, aluminum nitride, indium nitride, ternary Group III nitrides having the formula Ax B1-x N, where A and B are Group III elements and where x is zero, one, or a fraction between zero and one, and alloys of silicon carbide with such ternary Group III nitrides. In preferred embodiments, the laser structure includes a strain-minimizing contact layer above the active layer that has a lattice constant substantially the same as the buffer layer.
264 Citations
35 Claims
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1. A separate-confinement heterostructure laser comprising:
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an indium gallium nitride active layer; upper and lower waveguide layers on said active layer formed from the group consisting of AlGaN, InGaN, and AlInGaN; and upper and lower cladding layers on said respective upper and lower waveguide layers and formed of AlGaN. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21)
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22. A separate-confinement heterostructure laser comprising:
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an aluminum indium gallium nitride active layer; upper and lower waveguide layers on said active layer formed from the group consisting of AlGaN, InGaN, and AlInGaN; and upper and lower cladding layers on said respective upper and lower waveguide layers and formed of AlGaN. - View Dependent Claims (23)
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24. A group III nitride laser structure comprising:
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an active layer that includes at least one layer of a Group III nitride; a silicon carbide substrate; and a coupling structure between said active layer and said substrate, said coupling layer including at least one graded layer of silicon carbide and a group III nitride in which the graded layer is silicon carbide at the interface with said substrate, and the graded layer is the group III nitride at the interface with said active layer. - View Dependent Claims (25, 26, 27, 28, 29, 30)
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31. A group III nitride laser structure comprising:
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an active layer that includes at least one layer of a Group III nitride; a silicon carbide substrate; a buffer layer between said active layer and said silicon carbide substrate, said buffer layer being selected from the group consisting of gallium nitride, aluminum nitride, indium nitride, ternary Group III nitrides having the formula Ax B1-x N, where A and B are Group III elements and where x is zero, one, or a fraction between zero and one, and alloys of silicon carbide with such ternary Group III nitrides; and a strain-minimizing contact layer above said active layer that has a lattice constant substantially the same as said buffer layer. - View Dependent Claims (32, 33, 34, 35)
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Specification