Electron beam apparatus

• US 5,598,002 A
• Filed: 03/28/1996
• Issued: 01/28/1997
• Est. Priority Date: 08/26/1993
• Status: Expired due to Term

• Current Assignee: Hitachi, Ltd.
• Original Assignee: Hitachi, Ltd.
• Inventors: Sasada, Katsuhiro, Maeda, Tatsuya, Otaka, Tadashi, Todokoro, Hideo
• Primary Examiner(s): Berman, Jack I.
• Assistant Examiner(s): Nguyen, Kiet T.
• Application Number:
  US08/632,664
• Time in Patent Office: 306 Days
• Field of Search: 250/310, 250/306, 250/396 R, 359/363, 359/387
• US Class Current: 250/310
• CPC Class Codes: H01J 2237/216 Automatic focusing methods
• CPC Class Codes: H01J 2237/2482 Optical means
• CPC Class Codes: H01J 37/21 Means for adjusting the focus

Abstract

An electron beam apparatus focusses an electron beam onto a specimen by means of an objective magnetic lens. In order to detect changes in the height of the specimen, a laser light beam from a laser source is incident on the specimen and the reflected laser beam is detected by a light detector. Any change in the height of the specimen changes the path of the laser beam to the detector. Therefore, by monitoring the detector, the focussing of the electron beam on the specimen can be controlled by varying the current to an excitation coil of the objective magnetic lens or by moving the specimen via a mounting stage. At least one of the pole pieces of the objective lens is on the opposite side of the path of the laser beam to the source of the electron beam, so that the objective magnetic lens may be close to the specimen, permitting a short focal length. Thus, the laser beam may pass between the pole pieces. An optical microscope may also be provided to permit the specimen to be viewed. The viewing path of the optical microscope extends through an opening in one or both of the pole pieces of the objective magnetic lens.

Claims

1. An electron beam apparatus having a mounting stage for supporting a specimen, an electron source for generating an electron beam to be incident on said specimen, an objective magnetic lens for focussing said electron beam on said specimen, a light source for generating a light beam, and a light detector for detecting said light beam, an optical path for said light beam being defined from said light source to said light detector via said specimen;

wherein said objective magnetic lens comprises first and second magnetic poles for generating a magnetic field of said objective magnetic lens therebetween, said first and second magnetic poles being respectively arranged on opposite sides of said optical path, said optical path being at least partially delimited between the complete extent of said first and second magnetic poles.

2. An electron beam apparatus according to claim 1, further including an isolation wall having windows therein extending between said first and second pole pieces, and said optical path extends through said windows.

3. An electron beam apparatus according to claim 2, wherein said windows are lenses.

4. An electron beam apparatus according to claim 1, wherein the one of said first and second magnetic poles which is closest to said specimen is a substantially flat plate.

5. An electron beam apparatus according to claim 1, further including an optical microscope for viewing said specimen via a viewing path from said optical microscope to said specimen, and a magnetic path member for connecting said first and second magnetic poles;

said viewing path extending through said magnetic path member.

6. An electron beam apparatus according to claim 5, wherein said magnetic path member has a plurality of apertures therein, said plurality of apertures being arranged symmetrically about said electron beam, and said viewing path extends through one of said plurality of apertures.

7. An electron beam apparatus according to claim 1, further including control means for controlling the magnetic field of said objective magnetic lens in response to the detection of said light beam by said light detector.

8. An electron beam apparatus according to claim 1, wherein said mounting stage is moveable, and said electron beam apparatus further includes control means for controlling the movement of said mounting stage in response to the detection of said light beam by said light detector.

9. An electron beam apparatus according to claim 1, wherein one of said first and second magnetic poles includes one aperture through which both said electron beam and said optical path passes.

10. An electron beam apparatus having a mounting stage for supporting a specimen, an electron source for generating an electron beam to be incident on a first side of said specimen, said specimen having a second side opposite said first side, an objective magnetic lens for focussing said electron beam on said specimen, a light source for generating a light beam, and a light detector for detecting said light beam, an optical path for said light beam being defined from said light source to said light detector via said specimen, said optical path having a first side facing toward said electron source and a second side opposite said first side and facing away from said electron source;

wherein said objective magnetic lens comprises first and second magnetic poles for generating a magnetic field of said objective magnetic lens therebetween, said first and second magnetic poles being arranged on the second side of said optical path facing away from said electron source, and at least one of said first and second magnetic poles being arranged on said second side of said specimen.

11. An electron beam apparatus according to claim 10, wherein said first and second magnetic poles are arranged on said second side of said specimen.