Apparatus for applying ceramic coatings

• US 5,601,652 A
• Filed: 08/03/1989
• Issued: 02/11/1997
• Est. Priority Date: 08/03/1989
• Status: Expired due to Term

• Current Assignee: United Technologies Corporation (Raytheon Technologies Corporation d/b/a RTX)
• Original Assignee: United Technologies Corporation (Raytheon Technologies Corporation d/b/a RTX)
• Inventors: Mullin, Richard S., Riendeau, Leo A., Ulion, Nicholas E.
• Primary Examiner(s): Mai, Ngoclan
• Application Number:
  US07/389,216
• Time in Patent Office: 2,749 Days
• Field of Search: 118/719, 118/723, 118/726, 118/723 EB, 118/723 CB, 118/723 FE, 118/723 FI, 427/38, 427/42, 427/255.2, 427/255.1, 219/121.15, 219/121.16, 313/231.31, 315/111.21
• US Class Current: 118/723.0EB
• CPC Class Codes: C23C 14/0021 Reactive sputtering or evaporation
• CPC Class Codes: C23C 14/30 by electron bombardment
• CPC Class Codes: Y02T 50/60 Efficient propulsion technologies, e.g. for aircraft

Abstract

An apparatus for applying ceramic coatings using an electron beam-physical vapor deposition apparatus is described. The apparatus includes means for introducing the anionic constitutent of the ceramic into a coating chamber and means for confining the anionic constituent about the component to be coated during the coating process.

Claims

1. In an electron beam physical vapor deposition apparatus for applying a coating to the surface of a component, said apparatus comprising a coating chamber defining a first volume, means for supporting a ceramic target within said coating chamber, means for evacuating said coating chamber, and means for evaporating said target by impinging an electron beam onto said target within said coating chamber, the improvement which comprises an enclosure within said coating chamber, said enclosure chamber defining a second volume less than said first volume and including means for securing the component to be coated therewithin and over the ceramic target, said enclosure including an opening adjacent to the target for admitting into said enclosure evaporant produced by impingement of said electron beam upon said coating target, means for admitting anionic constituent of the ceramic into said enclosure, and means for venting such anionic constituent from said enclosure.

2. The apparatus of claim 1, wherein said means for admitting anionic constituent are in fluid communication with a source of such constituent located outside of said first chamber.

3. The apparatus of claim 2, wherein said securing means includes means for rotating the component about its axis.

4. The apparatus of claim 1, wherein said means for admitting anionic constituent into said enclosure has a plurality of outlet ends each located within the enclosure and intermediate said coating target and the component, and said ends are oriented at an angle to the horizontal, towards the centerline of the component.

5. Apparatus for applying a ceramic coating to the surface of a component comprising a coating chamber;

means for evacuating said chamber;

means for supporting a ceramic target within said chamber;

means for generating an electron beam and for impinging the beam onto the target to produce evaporant of the target;

an enclosure within said chamber comprising means for suspending the component within said enclosure and over the target, an opening adjacent to the target for admitting evaporant into said enclosure, means for admitting the anionic constituent of the ceramic into said enclosure and for venting such constituent from said enclosure, wherein the enclosure is slightly larger than the component therewithin, and is constructed and arranged to create a high partial pressure of anionic constituent around the component and to confine the anionic constituent and the evaporant around the component.

6. The apparatus of claim 5, wherein said means for suspending the component within said enclosure includes means for rotating the component about an axis.

7. The apparatus of claim 6, wherein said means for suspending the component includes means for translating the component about an axis.

8. The apparatus of claim 7, wherein said means for admitting anionic constituent has a plurality of outlet ends.

9. The apparatus of claim 8, wherein said outlet ends are closely spaced apertures oriented at an angle of about 45°

to the horizontal and towards the centerline of the component.

10. The apparatus of claim 9, wherein said apertures are arranged to flow anionic constituent into said enclosure in a direction substantially concurrent with the flow of evaporant into said enclosure.

11. The apparatus of claim 5, wherein said means for venting are constructed and arranged to direct anionic constituent from said enclosure in a direction which does not intersect or interfere with the electron beam generated by said beam means.