Optical waveguide with diffraction grating and method of forming the same

• US 5,604,829 A
• Filed: 04/17/1995
• Issued: 02/18/1997
• Est. Priority Date: 04/17/1995
• Status: Expired due to Term

• Current Assignee: Hughes Electronics Corporation (Rtx Corporation)
• Original Assignee: Hughes Aircraft Company (Rtx Corporation)
• Inventors: Bruesselbach, Hans
• Primary Examiner(s): Bovernick, Rodney B.
• Assistant Examiner(s): Sanghavi, Hemang
• Application Number:
  US08/423,070
• Time in Patent Office: 673 Days
• Field of Search: 385/28, 385/37, 385/33, 385/10, 385/123, 359/566, 359/569, 359/573
• US Class Current: 385/37
• CPC Class Codes: G02B 6/02138 based on illuminating a phase mask

Abstract

A method for forming an index grating in an optical waveguide, such as an optical fiber, with precise control over the grating'"'"'s period, cross-sectional shape and length. A single writing beam is passed through an optical grating mask, such as a phase mask. A photosensitive waveguide is spaced from the optical grating by a distance that corresponds to an integer fraction of the Talbot self-imaging distance, so that the optical grating (or a desired transformation of it) is imaged in the waveguide core. The grating image has substantially the same cross-sectional shape, period and length as the portion of the optical grating that is illuminated by the writing beam. Thus, an index grating that substantially replicates the cross-sectional shape, period and length of the optical grating mask, which preferably has a substantially square-wave shaped cross-section, is written in the waveguide core. The substantially square-wave shaped cross-section results in higher reflectivity per unit length than prior waveguide gratings with sinusoidal cross-sections. As a result, a high order waveguide index grating may be formed over a waveguide length that is shorter than would previously be required. Alternatively, a low order grating may be formed that has higher reflectivity than a low order sinusoidal grating.

Claims

1. A method of forming a high-order diffraction grating in a photosensitive optical waveguide for reflecting a first optical beam at a design wavelength and at other wavelengths, comprising the steps of:

generating a second optical beam having a wavelength that corresponds to a wavelength to which said waveguide is photosensitive,

passing said second beam through an optical phase grating with a non-sinusoidal cross-sectional shape, said grating having a period that is more than twice the design wavelength, and that is an integer multiple of the design wavelength,

directing said second optical beam to said photosensitive waveguide,

spacing said waveguide from said phase grating by a distance that corresponds to an integer fraction of the Talbot self-imaging distance so that said optical grating is imaged in said waveguide as alternating light and dark regions that have substantially the same period and cross-sectional shape as said phase grating, said alternating light and dark regions establishing a refractive index grating in said waveguide with substantially the same period and cross-sectional shape as said phase grating.

2. The method of claim 1, wherein said phase grating has a substantially square-wave shaped cross-section so that the cross-section of the alternating light and dark regions in said waveguide is substantially square-wave shaped.

3. The method of claim 2, wherein said design wavelength is approximately 1.6 microns and said phase grating has a period of approximately 10 microns.

4. The method of claim 1, wherein said waveguide is spaced from said phase grating by an amount approximately equal to ##EQU3## where Λ

is the period of said phase grating and λ

is the wavelength of said second optical beam.

5. The method of claim 1, wherein said second optical beam is directed to a photosensitive optical fiber that is single-mode with respect the wavelength of said first beam.

6. The method of claim 5, wherein said index grating is established at a core of said fiber.