Method for forming low refractive index film comprising silicon dioxide

• US 5,605,609 A
• Filed: 10/17/1994
• Issued: 02/25/1997
• Est. Priority Date: 03/03/1988
• Status: Expired due to Term

• Current Assignee: Asahi Glass Company, Limited (AGC, Inc.)
• Original Assignee: Asahi Glass Company, Limited (AGC, Inc.)
• Inventors: Matsumoto, Kiyoshi, Suzuki, Koichi, Oyama, Takuji, Mitsui, Akira, Ebisawa, Junichi, Ando, Eiichi
• Primary Examiner(s): NGUYEN, NAM X
• Application Number:
  US08/323,579
• Time in Patent Office: 862 Days
• Field of Search: 204/192.15, 204/192.22, 204/192.21, 204/192.23, 204/192.26, 204/192.27, 204/192.28, 106/286.1, 106/286.4, 106/287.34, 501/54, 423/326
• US Class Current: 204/192.23
• CPC Class Codes: B32B 17/10174 Coatings of a metallic or dielectric material on a constituent layer of glass or polymer
• CPC Class Codes: B32B 27/06 as the main or only constituent of a layer, which is next to another layer of the same or of a different material next to a layer of a particular substance B32B9/045; next to a bituminous or tarry layer B32B11/046; next to a water setting substance layer B32B13/12; next to a metal layer B32B15/08; next to a glass layer B32B17/10; next to a layer formed of natural mineral fibres or particles B32B19/045; next to a wood layer B32B21/08; next to a cellulosic plastic layer B32B23/08; next to a natural or synthetic rubber layer B32B25/08
• CPC Class Codes: C03C 17/23 Oxides C03C17/02 takes precedence
• CPC Class Codes: C03C 17/245 by deposition from the vapour phase
• CPC Class Codes: C03C 17/25 by deposition from the liquid phase
• CPC Class Codes: C03C 17/3417 all coatings being oxide coatings
• CPC Class Codes: C03C 17/3435 comprising a nitride, oxynitride, boronitride or carbonitride
• CPC Class Codes: C03C 17/3482 comprising silicon, hydrogenated silicon or a silicide
• CPC Class Codes: C03C 17/3488 comprising a boride or phosphide
• CPC Class Codes: C03C 17/36 at least one coating being a metal
• CPC Class Codes: C03C 17/3605 Coatings of the type glass/metal/inorganic compound
• CPC Class Codes: C03C 17/3613 Coatings of type glass/inorganic compound/metal/inorganic compound/metal/other
• CPC Class Codes: C03C 17/3618 Coatings of type glass/inorganic compound/other inorganic layers, at least one layer being metallic
• CPC Class Codes: C03C 17/3639 Multilayers containing at least two functional metal layers
• CPC Class Codes: C03C 17/3644 the metal being silver
• CPC Class Codes: C03C 17/3652 the coating stack containing at least one sacrificial layer to protect the metal from oxidation
• CPC Class Codes: C03C 17/3657 the multilayer coating having optical properties
• CPC Class Codes: C03C 17/3681 the multilayer coating being used in glazing, e.g. windows or windscreens
• CPC Class Codes: C03C 17/38 at least one coating being a coating of an organic material
• CPC Class Codes: C03C 17/42 at least one coating of an organic material and at least one non-metal coating
• CPC Class Codes: C03C 2217/213 : SiO2
• CPC Class Codes: C03C 2217/229 : Non-specific enumeration
• CPC Class Codes: C03C 2217/23 : Mixtures
• CPC Class Codes: C03C 2217/242 : with rare earth metals
• CPC Class Codes: C03C 2217/732 : made of a single layer
• CPC Class Codes: C03C 2218/11 : from solutions or suspensions
• CPC Class Codes: C03C 2218/15 : from the vapour phase
• CPC Class Codes: C03C 2218/154 : by sputtering
• CPC Class Codes: C23C 14/08 : Oxides C23C14/10 takes precedence
• CPC Class Codes: C23C 14/10 : Glass or silica
• CPC Class Codes: C23C 14/3407 : Cathode assembly for sputtering apparatus, e.g. Target
• CPC Class Codes: C23C 14/3414 : Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
• CPC Class Codes: G02B 1/10 : Optical coatings produced by application to, or surface treatment of, optical elements G02B1/08 takes precedence
• CPC Class Codes: G02B 1/105 : Protective coatings
• CPC Class Codes: G02B 1/116 : including electrically conducting layers
• CPC Class Codes: G02B 1/14 : Protective coatings, e.g. hard coatings
• CPC Class Codes: G02F 1/133337 : Layers preventing ion diffusion, e.g. by ion absorption
• CPC Class Codes: G02F 1/133502 : Antiglare, refractive index matching layers
• CPC Class Codes: H01J 37/3426 : Material
• CPC Class Codes: H01J 37/3435 : Target holders (includes backing plates and endblocks)
• CPC Class Codes: H01J 37/3491 : Manufacturing of targets
• CPC Class Codes: Y02T 10/90 : Energy harvesting concepts as power supply for auxiliaries' energy consumption, e.g. photovoltaic sun-roof

Abstract

The present invention relates to a film comprising silicon dioxide as the main component, which contains Zr, etc., and a method for forming it by reactive DC sputtering. It makes it possible to form reflection preventive films, alkali barrier films and various multi-layered films such as multi-layered films for anti-iridescent glass, which contain said film comprising silicon dioxide as the main component, by a physical vapor deposition method without breaking a vacuum.

Claims

1. A method for forming a low refractive index film comprising silicon dioxide as the main component, by a DC sputtering method in an oxygen-containing atmosphere by means of a target comprising Si as the main component, which target contains Zr in an amount of from 4 to 35 atoms relative to from 65 to 96 atoms of Si.