Semiconductor integrated circuit including opposed substrates of different semiconductor materials and method of manufacturing the semiconductor integrated circuit
First Claim
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1. A semiconductor integrated circuit comprising:
- a first semiconductor substrate having a top surface;
a first semiconductor element on the top surface of said first semiconductor substrate;
a first electrode on said first semiconductor element;
a second semiconductor substrate made of a material different from said first semiconductor substrate, having a bottom surface, and arranged with the bottom surface opposite the top surface of said first semiconductor substrate;
a second semiconductor element on the bottom surface of said second semiconductor substrate;
a second electrode on said second semiconductor element;
a solid electrically insulating film disposed between and contacting both the top surface of said first semiconductor substrate and the bottom surface opposite said second semiconductor substrate; and
an electrical conductor extending through said insulating film from and connecting the first electrode to the.
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Abstract
An insulating film having a through hole aligned with an electrode on a first semiconductor element is formed on a first semiconductor substrate and a metal is disposed in the through hole. A second semiconductor element on a second semiconductor substrate is placed on the insulating film in such a way that an electrode of the second semiconductor element contacts the metal. Thus, a plurality of transistors having different performance characteristics and functions can be easily disposed adjacent to each other for improved integration.
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Citations
13 Claims
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1. A semiconductor integrated circuit comprising:
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a first semiconductor substrate having a top surface; a first semiconductor element on the top surface of said first semiconductor substrate; a first electrode on said first semiconductor element; a second semiconductor substrate made of a material different from said first semiconductor substrate, having a bottom surface, and arranged with the bottom surface opposite the top surface of said first semiconductor substrate; a second semiconductor element on the bottom surface of said second semiconductor substrate; a second electrode on said second semiconductor element; a solid electrically insulating film disposed between and contacting both the top surface of said first semiconductor substrate and the bottom surface opposite said second semiconductor substrate; and an electrical conductor extending through said insulating film from and connecting the first electrode to the. - View Dependent Claims (2, 3, 7, 8)
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4. A method of manufacturing a semiconductor integrated circuit comprising:
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forming a first semiconductor element on a first surface of a first semiconductor substrate; forming a second semiconductor element on a first surface of a second semiconductor substrate made of a material different from the first semiconductor substrate; forming a first electrode on said first semiconductor element; forming a second electrode on said second semiconductor element; forming a solid electrically insulating film on and in contact with the first surface of said first semiconductor substrate and said first electrode; forming a through hole in said insulating film at a position aligned with said first electrode; filling the through hole with an electrically conductive material contacting said first electrode; and placing said second semiconductor substrate on and in contact with said insulating film so that said second electrode contacts said electrically conductive material. - View Dependent Claims (5, 6, 9, 10, 11, 12, 13)
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Specification