Immersion type projection exposure apparatus

• US 5,610,683 A
• Filed: 06/05/1995
• Issued: 03/11/1997
• Est. Priority Date: 11/27/1992
• Status: Expired due to Fees

• Current Assignee: Canon Kabushiki Kaisha (Canon Inc.)
• Original Assignee: Canon Kabushiki Kaisha (Canon Inc.)
• Inventors: Takahashi, Kazuo
• Primary Examiner(s): Braun, Fred L.
• Application Number:
  US08/464,062
• Time in Patent Office: 645 Days
• Field of Search: 355/30, 355/53, 355/125, 355/75
• US Class Current: 355/53
• CPC Class Codes: G03F 7/70341 Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply chemical composition of immersion liquids G03F7/2041
• CPC Class Codes: G03F 7/707 Chucks, e.g. chucking or un-chucking operations or structural details
• CPC Class Codes: G03F 7/7075 Handling workpieces outside exposure position, e.g. SMIF box
• CPC Class Codes: G03F 7/70858 Environment aspects, e.g. pressure of beam-path gas, temperature pollution aspects G03F7/70916
• CPC Class Codes: G03F 7/70866 of mask or workpiece
• CPC Class Codes: G03F 7/70875 Temperature, e.g. temperature control of masks or workpieces via control of stage temperature
• CPC Class Codes: G03F 7/70891 Temperature

Abstract

A projection exposure apparatus includes an illuminating device for illuminating a pattern of an original, a holder for holding a substrate, and a projection system for projecting an image of the pattern of the original onto the substrate. The projection system includes a projection optical system and a plane optical element spaced from the projection optical system and disposed opposite to the surface of the substrate. Also provided is a casing having a filled interspace formed between the optical element and the substrate, with the optical element providing an upper cover of the casing.

Claims

1. A projection exposure apparatus, comprising:

illumination means for illuminating a pattern of an original;

holding means for holding a substrate;

a projection system for projecting an image of the pattern of the original onto the substrate held by said holding means, said projection system including a projection optical system and a plane optical element spaced from said projection optical system and disposed opposite to the surface of the substrate; and

a casing having a filled interspace formed between said optical element and the substrate, wherein said optical element provides an upper cover of said casing, and a portion of an outer wall of said casing is covered by a heat insulating material.

2. An apparatus according to claim 1, further comprising

an alignment measuring system for detecting the positional relationship between the substrate and the image projected by said projection optical system with respect to a horizontal direction, a focus position detecting system for detecting the positional relationship between the substrate and the focus position of said projection optical system with respect to a vertical direction, and tilt means for moving and/or tilting said holding means in X, Y and/or θ

direction on the basis of the detection through said alignment measuring system and said focus position detecting system so as to bring a pattern on the substrate into coincidence with the projected image.

3. An apparatus according to claim 2, wherein said alignment measuring system includes a measurement reference mirror, wherein at least two adjoining faces on an outer wall of said casing extend perpendicularly to each other, and wherein said at least two faces extend substantially perpendicularly to the surface of the substrate, with said reference mirror being provided by said at least two faces.

4. An apparatus according to claim 2, wherein said optical element is detachable from said casing.

5. An apparatus according to claim 2, wherein said casing is openable and closable so as to allow loading and unloading of the substrate into and out of an interior of said casing.

6. An apparatus according to claim 1, further comprising

conveying means for loading and unloading said casing onto and from said holding means.

7. An apparatus according to claim 6, further comprising means for filling the interspace in said casing with liquid when said casing is held on said holding means.

8. An apparatus according to claim 6, further comprising means for filling the interspace in said casing with liquid when said spacing is at a position spaced from said holding means.

9. An apparatus according to claim 8, wherein the injection of the liquid into the interspace and the exposure operation are done at independent timings.

10. An apparatus according to claim 6, wherein the substrate forms a bottom of said casing.

11. An apparatus according to claim 10, wherein the substrate is detachable from said casing.

12. An apparatus according to claim 1,

wherein said holding means includes a portion for directly supporting the substrate, with said portion being separated from said holding means, and wherein said portion provides a bottom for said casing while a remaining portion of said holding means holds said casing.

13. An apparatus according to claim 12, wherein said casing has a member operable as a reference in respect to the positioning on another portion of said holding means.

14. An apparatus according to claim 12, wherein said holding means includes a passageway for holding the substrate through vacuum attraction and an openable/closable shutter for preventing flow of liquid into the passageway.

15. An apparatus according to claim 1,

wherein said casing is arranged to provide one of a positive pressure and a negative pressure in the interspace.

16. An apparatus according to claim 1,

wherein a portion of said casing is made of a low thermal expansion material.

17. An apparatus according to claim 1,

wherein said casing includes pipe means with a valve for injecting and discharging a liquid into and out of the interspace.

18. An apparatus according to claim 1,

wherein said casing has a reference mark used for placing said casing on said holding means.

29. An apparatus according to claim 1, further comprising

means for providing at least one of an electric connection, a pneumatic communication and a vacuum communication to said casing.

19. A projection exposure apparatus, comprising:

illumination means for illuminating a pattern of an original;

holding means for holding a substrate;

a projection system for projecting an image of the pattern of the original onto the substrate held by said holding means, said projection system including a projection optical system and a plane optical element spaced from said projection optical system and disposed opposite to the surface of the substrate;

a casing having a filled interspace formed between said optical element and the substrate opposed to each other, wherein said optical element provides an upper cover of said casing; and

a pressure gauge for detecting the pressure of a filling liquid disposed in the interspace.

20. An apparatus according to claim 19, further comprising

pressure control means for controlling the pressure of a filling liquid disposed in the interspace.

21. An apparatus according to claim 19, further comprising

a vacuum pump for providing a negative pressure of a filling liquid filling the interspace.

22. An apparatus according to claim 19, further comprising

a thermometer for measuring the temperature of a filling liquid filling the interspace.

23. An apparatus according to claim 19, further comprising

temperature controlling means for controlling the temperature of a filling liquid filling the interspace.

24. A projection exposure apparatus, comprising:

illumination means for illuminating a pattern of an original;

holding means for holding a substrate;

a projection system for projecting an image of the pattern of the original onto the substrate held by said holding means, said projection system including a projection optical system and a plane optical element spaced from said projection optical system and disposed opposite to the surface of the substrate;

a casing having a filled interspace between said optical element and the substrate, wherein said optical element provides an upper cover of said casing; and

ultrasonic vibration means for vibrating a filling liquid filling the interspace with ultrasonic vibrations.

25. An apparatus according to claim 24, further comprising

a pump for injecting and discharging a filling liquid into and out of the interspace.

26. An apparatus according to claim 25, further comprising filtering means coupled to said pump for filtering the liquid.

27. A projection exposure apparatus, comprising:

illumination means for illuminating a pattern of an original;

holding means for holding a substrate;

a projection system for projecting an image of the pattern of the original onto the substrate held by said holding means, said projection system including a projection optical system and a plane optical element spaced from said projection optical system and disposed opposite to the surface of the substrate;

a casing having a filled interspace formed between said optical element and the substrate, wherein said optical element provides an upper cover of said casing; and

attitude control means for tilting or holding said casing upright, wherein during injection of a filling liquid into the interspace said casing is tiled or held upright so that the liquid is injected thereinto from below.

28. A projection exposure apparatus, comprising:

illumination means for illuminating a pattern of an original;

holding means for holding a substrate;

a projection system for projecting an image of the pattern of the original onto the substrate held by said holding means, said projection system including a projection optical system and a plane optical element spaced from said projection optical system and disposed opposite to the surface of the substrate;

a casing having a filled interspace formed between said optical element and the substrate, wherein said optical element provides an upper cover of said casing; and

means for measuring the refractive index of a filling material filling the interspace.