Alignment of a shadow frame and large flat substrates on a heated support

• US 5,611,865 A
• Filed: 02/14/1996
• Issued: 03/18/1997
• Est. Priority Date: 01/28/1993
• Status: Expired due to Term

• Current Assignee: Applied Materials Incorporated
• Original Assignee: Applied Materials Incorporated
• Inventors: White, John M., Berkstresser, David E., Petersen, Carl T.
• Primary Examiner(s): BUEKER, RICHARD R
• Application Number:
  US08/605,581
• Time in Patent Office: 398 Days
• Field of Search: 118/725, 118/728, 118/729, 156/345, 269/56, 204/298.15
• US Class Current: 118/725
• CPC Class Codes: C23C 16/042 using masks
• CPC Class Codes: C23C 16/4585 Devices at or outside the perimeter of the substrate support, e.g. clamping rings, shrouds

Abstract

Centering pins mounted to a susceptor in a vacuum chamber align a glass substrate with respect to the susceptor on which it is supported, and with respect to a shadow frame which overlies the periphery of the substrate and protects the edge and underside of the substrate from undesired processing.

Shaped pins loosely mounted in openings in the susceptor so that the pins extend above the upper surface of the susceptor support the centered glass substrate during the transporting stages, but recess into the heated susceptor during processing.

Claims

1. A substrate processing system comprising:

a) a processing chamber for processing a substrate inserted therein upon a blade horizontally movable into a processing area of said chamber;

b) a vertically movable centering support;

c) a plurality of centering members attached to said support and extending vertically therefrom, each said centering member having

i) an inner vertically extending side, and

ii) a centering feature disposed on a top of said centering member and having an inner inclined surface extending inwardly and downwardly to said vertically extending side; and

d) a substrate support vertically movable with respect to said centering support for supporting said substrate centered by said centering features.

2. A substrate processing system according to claim 1 wherein each said centering feature further comprises an outer inclined surface extending downward and outwardly from said inner inclined surface;

and

wherein said system further comprises a frame having an inwardly extending lip engageable with a periphery of said substrate and having at least one inclined surface extending downwardly and outwardly from said lip, and slidingly engaging said outer inclined surface of said centering feature.

3. A substrate processing system according to claim 1 further comprising a plurality of support members vertically slidable in said substrate support, having lower ends engageable with said centering support, and having a length such that, when their lower ends engage said centering support, upper support surfaces thereof receive and support said substrate centered by said centering features.

4. A substrate process system according to claim 3 wherein said support members have heads wherein said upper support surfaces are larger than the diameter of the lower ends thereof and wherein said substrate support member has recesses to receive said heads without protruding therefrom.