Method for making planar optical waveguides

• US 5,613,995 A
• Filed: 10/25/1994
• Issued: 03/25/1997
• Est. Priority Date: 04/23/1993
• Status: Expired due to Term

• Current Assignee: Lucent Technologies, Inc. (Nokia Corporation)
• Original Assignee: Lucent Technologies, Inc. (Nokia Corporation)
• Inventors: Bhandarkar, Suhas D., MacChesney, John B.
• Primary Examiner(s): Simmons, David A.
• Assistant Examiner(s): HOFFMANN, JOHN M
• Application Number:
  US08/329,034
• Time in Patent Office: 882 Days
• Field of Search: 65/386, 65/430, 65/416, 65/427, 65/384, 385/129, 385/130, 385/132
• US Class Current: 65/384
• CPC Class Codes: G02B 2006/12038 Glass (SiO2 based materials)
• CPC Class Codes: G02B 2006/12061 Silicon
• CPC Class Codes: G02B 2006/12173 Masking
• CPC Class Codes: G02B 2006/12176 Etching
• CPC Class Codes: G02B 6/132 by deposition of thin films
• CPC Class Codes: G02B 6/136 by etching

Abstract

In accordance with the invention a planar waveguide device is fabricated by providing a substrate with an undercladding, depositing a particulate layer of core glass on the undercladding, consolidating the particulate layer by low temperature viscous sintering, patterning the consolidated layer to form an optical waveguide and applying an overcladding. The glass layers can be deposited quickly and economically by slurry dipping, centrifuging or electrophoresis. In a preferred embodiment the substrate is silicon, and the core glass is sodium-boro-silicate.

Claims

1. A method of making a planar optical waveguide device comprising the steps of

a) providing a silicon substrate having a coefficient of thermal expansion and a major surface;

b) forming on the major surface a layer of glass to act as an undercladding;

c) forming on said layer of glass a particulate layer of a glass comprising SiO₂ and boron, said particulate layer predominantly comprising glass particles having diameters less than about a micron;

d) consolidating the particulate layer by a heat treatment comprising low temperature viscous sintering at 950°

C. or less for a period in excess of eight hours and sufficient to produce an essentially bubble free consolidated particulate layer;

e) making an optical waveguide core from the consolidated particulate layer; and

f) forming on said optical waveguide core a layer of glass to act as an overcladding.

2. The method of claim 1 wherein said undercladding is formed on said major surface by a process that comprises forming a layer of glass particles on the major surface, and consolidating the layer of glass particles by viscous sintering.

3. The method of claim 1 wherein said particulate layer is formed on said undercladding by a process that comprises contacting the undercladding with a slurry containing said glass particles.

4. The method of claim 1 wherein said particulate layer is disposed over said undercladding by centrifuging.

5. The method of claim 1 wherein said particulate layer is disposed over said undercladding by electrophoresis.

6. The method of claim 1 wherein said overcladding is formed on said optical waveguide core by a process that comprises contacting the optical waveguide core with a slurry containing glass particulates.

7. Method of claim 1, wherein the substrate is single crystal silicon, the undercladding is high silica glass, the particulate layer consists of a sodium borosilicate glass, the overcladding comprises high silica glass, and the borosilicate glass has a coefficient of thermal expansion approximately the same as that of the single crystal silicon substrate.

8. Method according to claim 7, wherein the undercladding is selected to have a coefficient of thermal expansion approximately equal to or lower than that of the single crystal Si substrate.

9. Method according to claim 1, wherein each of the undercladding and overcladding comprises sodium borosilicate glass.