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Plasma processing apparatus

  • US 5,614,025 A
  • Filed: 12/07/1994
  • Issued: 03/25/1997
  • Est. Priority Date: 12/13/1993
  • Status: Expired due to Term
First Claim
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1. A plasma processing apparatus for processing an object with neutral particles produced from plasma, comprising:

  • a plasma generating chamber;

    a processing chamber accommodating the object to be processed;

    a dielectric path member facing said plasma generating chamber;

    a microwave generator for feeding a microwave to said dielectric path member;

    a first electrode member formed between said plasma generating chamber and said processing chamber and having a plurality of minute aperture;

    a second electrode member mounted on said dielectric path member within said plasma generating chamber and having a plurality of radiation ports for radiating the microwave therethrough; and

    a power source for applying a voltage to between said first electrode member and said second electrode member;

    whereby said plasma chamber produces plasma including ion particles between said first electrode member and said second electrode member, and said first electrode member converts said ion particles to said neutral particles.

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