Plasma processing apparatus
First Claim
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1. A plasma processing apparatus for processing an object with neutral particles produced from plasma, comprising:
- a plasma generating chamber;
a processing chamber accommodating the object to be processed;
a dielectric path member facing said plasma generating chamber;
a microwave generator for feeding a microwave to said dielectric path member;
a first electrode member formed between said plasma generating chamber and said processing chamber and having a plurality of minute aperture;
a second electrode member mounted on said dielectric path member within said plasma generating chamber and having a plurality of radiation ports for radiating the microwave therethrough; and
a power source for applying a voltage to between said first electrode member and said second electrode member;
whereby said plasma chamber produces plasma including ion particles between said first electrode member and said second electrode member, and said first electrode member converts said ion particles to said neutral particles.
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Abstract
A plasma processing apparatus for processing wafers or similar objects with neutral particles produced from plasma. A microwave is introduced into the apparatus via a dielectric path, or waveguide, having a broad radiation area. The microwave, therefore, generates uniform and dense plasma over a broad area. Neutral particles are produced from the plasma by two electrodes. As a result, an object is processed at a high speed by a beam of uniformly distributed neutral particles.
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Citations
1 Claim
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1. A plasma processing apparatus for processing an object with neutral particles produced from plasma, comprising:
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a plasma generating chamber; a processing chamber accommodating the object to be processed; a dielectric path member facing said plasma generating chamber; a microwave generator for feeding a microwave to said dielectric path member; a first electrode member formed between said plasma generating chamber and said processing chamber and having a plurality of minute aperture; a second electrode member mounted on said dielectric path member within said plasma generating chamber and having a plurality of radiation ports for radiating the microwave therethrough; and a power source for applying a voltage to between said first electrode member and said second electrode member; whereby said plasma chamber produces plasma including ion particles between said first electrode member and said second electrode member, and said first electrode member converts said ion particles to said neutral particles.
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Specification
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Current AssigneeRenesas Electronics Corporation
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Original AssigneeNEC Corporation
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InventorsAkimoto, Takeshi
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Primary Examiner(s)Breneman, R. Bruce
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Assistant Examiner(s)CHANG, JONI YUK YING
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Application NumberUS08/351,517Time in Patent Office839 DaysField of Search118/723 E, 118/723 MW, 118/723 MP, 118/723 ME, 156/345, 204/298.38US Class Current118/723.0MPCPC Class CodesH01J 37/32192 Microwave generated dischar...H01J 37/32211 Means for coupling power to...H01J 37/32697 Electrostatic control
