Showerhead for uniform distribution of process gas

• US 5,614,026 A
• Filed: 03/29/1996
• Issued: 03/25/1997
• Est. Priority Date: 03/29/1996
• Status: Expired due to Term

• Current Assignee: Lam Research Corporation
• Original Assignee: Lam Research Corporation
• Inventors: Williams, Norman
• Primary Examiner(s): Breneman, R. Bruce
• Assistant Examiner(s): CHANG, JONI YUK YING
• Application Number:
  US08/623,867
• Time in Patent Office: 361 Days
• Field of Search: 118/723 ME, 118/723 MR, 118/723 MA, 118/723 ER, 118/723 IR, 118/723 MP, 427/575, 156/345, 156/643.1, 204/298.33, 204/298.07, 204/298.38, 134/1.1
• US Class Current: 118/723.0ME
• CPC Class Codes: C23C 16/4412 Details relating to the exhausts, e.g. pumps, filters, scrubbers, particle traps
• CPC Class Codes: C23C 16/455 characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
• CPC Class Codes: C23C 16/45565 Shower nozzles
• CPC Class Codes: H01J 2237/3342 Resist stripping
• CPC Class Codes: H01J 37/32357 Generation remote from the workpiece, e.g. down-stream
• CPC Class Codes: H01J 37/3244 Gas supply means
• CPC Class Codes: H01L 21/67017 Apparatus for fluid treatment H01L21/67126, H01L21/6715 take precedence

Abstract

A showerhead includes a plurality of gas inlets for supplying process gas to a semiconductor substrate surface, and a plurality of gas outlets for removing gas and volatile byproducts produced as a result of reaction of the process gas with the substrate surface. Each gas inlet is concentrically positioned within a respective gas outlet. The showerhead improves the utilization of process gas species at the substrate surface by providing gas flow in a direction perpendicular to the substrate surface and avoiding flow of the process gas or volatile byproducts laterally across the substrate surface. The showerhead is useful for uniform stripping of a mask of organic material by direct contact of the incoming reactive gas with the substrate surface and immediate removal of the process gas and volatile byproducts through the concentrically arranged gas outlets.

Claims

1. An apparatus for uniformly distributing process gas over a substrate surface comprising:

a gas supply conduit supplying process gas to be energized into a plasma state;

a plasma generator in fluid communication with the gas supply conduit, the plasma generator energizing process gas supplied from the gas supply conduit into a plasma state;

a gas delivery conduit in fluid communication with the plasma generator, the gas delivery conduit carrying the process gas energized in the plasma generator;

a process chamber wherein a substrate is processed, the process chamber including a first region in fluid communication with the gas delivery conduit, a second region wherein the substrate is processed, a third region in fluid communication with the second region and through which gas and volatile byproducts are removed from the second region, and a showerhead separating the first and second regions, the process gas supplied from the gas delivery conduit passing into the first region, through the showerhead and into the second region for processing the substrate;

the showerhead including gas inlets and gas outlets, the gas inlets supplying the process gas from the first region to the second region, the gas outlets withdrawing gas and volatile byproducts from the second region to the third region; and

an exhaust conduit in fluid communication with the third region, the gas and volatile byproducts being withdrawn from the process chamber through the exhaust conduit.

2. The apparatus of claim 1, wherein each of the gas inlets is concentrically positioned within a respective one of the gas outlets.

3. The apparatus of claim 1, wherein the gas inlets and gas outlets are circular, the gas outlets being larger in diameter than the gas inlets.

4. The apparatus of claim 1, wherein the gas inlets comprise tubes extending from a plate separating the first region from the second region.

5. The apparatus of claim 1, wherein the plasma generator comprises a microwave source which energizes the process gas into the plasma state.

6. The apparatus of claim 1, wherein the showerhead comprises an electrically insulating material.

7. The apparatus of claim 4, wherein the showerhead includes a bottom plate separating the second region from the third region, the gas outlets comprising openings in the bottom plate and the tubes extending into the openings.

8. The apparatus of claim 1, wherein the process chamber includes a substrate support on which the substrate is supported in the second region.

9. The apparatus of claim 1, wherein the gas delivery conduit includes a gas delivery port opening into a central portion of the first region, the first region including a gas deflection member facing the gas delivery port, the gas deflection member deflecting process gas supplied through the gas delivery conduit such that the process gas is prevented from flowing directly from the gas delivery port through the showerhead gas inlets located in the central portion of the first region.

10. The apparatus of claim 8, wherein the process chamber includes a pin lift mechanism having lift pins which raise and lower the substrate off of and onto the substrate support and/or the substrate support includes a heater which maintains the substrate at a desired temperature.

11. The apparatus of claim 1, wherein the plasma generator is located a distance away from the process chamber sufficient to allow ions to recombine with electrons in the excited gas and such that the process gas contacting the surface of the substrate is essentially free of electrically charged particles which would damage the substrate.

12. In an apparatus for uniformly distributing process gas over a substrate surface comprising a gas supply conduit supplying process gas to be energized into a plasma state, a plasma generator in fluid communication with the gas supply conduit, the plasma generator energizing the process gas supplied from the gas supply conduit into a plasma state, a gas delivery conduit in fluid communication with the plasma generator, the gas delivery conduit carrying the process gas energized in the plasma generator, a process chamber wherein a substrate is processed, the process chamber including a first region in fluid communication with the gas delivery conduit, a second region wherein the substrate is processed, and a showerhead separating the first and second regions, the process gas supplied from the gas delivery conduit passing into the first region, through the showerhead and into the second region for processing the substrate, the improvement comprising:

the showerhead being a removable showerhead having a third region in fluid communication with the second region and through which gas and volatile byproducts are removed from the second region, the showerhead including gas inlets and gas outlets, the gas inlets supplying the process gas from the first region to the second region and the gas outlets withdrawing gas and volatile byproducts from the second region to the third region.

13. The showerhead of claim 12, wherein each of the gas inlets is concentrically positioned within a respective one of the gas outlets.

14. The showerhead of claim 12, wherein the gas inlets and gas outlets are circular, the gas outlets being larger in diameter than the gas inlets.

15. The showerhead of claim 12, wherein the gas inlets comprise tubes extending from a plate separating the first region from the second region.

16. The showerhead of claim 12, wherein the showerhead comprises an electrically insulating material.

17. The showerhead of claim 15, wherein the showerhead includes a bottom plate separating the second region from the third region, the gas outlets comprising openings in the bottom plate and the tubes extending into the openings.

18. A method of processing a substrate in an apparatus which uniformly distributes process gas over a surface of the substrate, the method comprising steps of:

supplying process gas to be energized into a plasma state to a plasma generator;

energizing the process gas into a plasma gas state in the plasma generator;

withdrawing excited process gas from the plasma generator through a gas delivery conduit in fluid communication with the plasma generator;

processing a substrate in a process chamber including a first region in fluid communication with the gas delivery conduit, a second region wherein the substrate is processed, a third region in fluid communication with the second region and through which gas and volatile byproducts are removed from the second region, and a showerhead separating the first and second regions, the showerhead including gas inlets and gas outlets, the gas inlets supplying the process gas from the first region to the second region, the gas outlets withdrawing gas and volatile byproducts from the second region to the third region, the substrate being processed by flowing the process gas supplied from the gas delivery conduit into the first region, through the gas inlets into the second region and contacting the surface of the substrate with the process gas; and

withdrawing the gas and volatile byproducts from the process chamber through an exhaust conduit in fluid communication with the third region.

19. The method of claim 18, wherein the plasma generator is located a distance away from the process chamber sufficient to allow ions to recombine with electrons in the excited gas and such that the process gas contacting the surface of the substrate is essentially free of electrically charged particles which would damage the substrate.

20. The method of claim 18, wherein the substrate includes a mask of an organic material and the mask is stripped during the step of processing the substrate.

21. The method of claim 18, wherein each of the gas inlets is concentrically positioned within and surrounded by a respective one of the gas outlets, the process gas being supplied to the second region through the gas inlets and flowing directly into contact with the surface of the substrate, gas and volatile byproducts produced by reaction of the process gas and the surface of the substrate flowing directly away from the surface of the substrate and being removed from the second region through the gas outlets without substantial flow of the gas and volatile byproducts laterally across the surface of the substrate.

22. The method of claim 21, wherein the gas inlets and gas outlets are circular and the gas outlets are larger in diameter than the gas inlets, the process gas being separated into portions of process gas, each portion of process gas flowing into the second region through a respective one of the gas inlets and after reacting with the surface of the substrate flowing through a respective one of the gas outlets surrounding the respective gas inlet.

23. The method of claim 21, wherein the gas inlets comprise tubes extending from a plate separating the first region from the second region, the process gas flowing through the tubes into the second region.

24. The method of claim 21, wherein the plasma generator comprises a microwave source, the plasma gas being generated by the microwave source.

25. The method of claim 21, wherein the showerhead comprises an electrically insulating material, the showerhead being non-electrically powered during the step of processing the substrate.

26. The method of claim 23, wherein the showerhead includes a bottom plate separating the second region from the third region, the gas outlets comprising openings in the bottom plate and the tubes extending into the openings, the process gas entering the second region through the tubes and the gas and volatile byproducts produced as a result of reacting the process gas with the surface of the substrate being removed from the second region through the openings.

27. The method of claim 21, wherein the process chamber includes a substrate support on which the substrate is supported in the second region, the substrate support being larger than the substrate, the second region being within a space defined by a sidewall extending between the substrate support and the showerhead, the method including maintaining the second region at a pressure below 10 torr by applying a vacuum source to the gas outlets.

28. The method of claim 27, wherein the substrate support comprises an electrostatic chuck, the substrate being clamped to the electrostatic chuck by applying a voltage to the electrostatic chuck during the step of processing the substrate.

29. The method of claim 21, wherein the process chamber includes a pin lift mechanism having lift pins, the method including transferring a single substrate into the second region, placing the substrate onto the lift pins, and placing the substrate onto the substrate support by lowering the lift pins.

30. The method of claim 27, wherein the substrate support includes a heater, the method including maintaining the substrate at a desired temperature by heating the substrate support with the heater.