Iridium oxide film for electrochromic device
First Claim
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1. A method of producing a nitrogen-containing iridium oxide film on a surface of a substrate, comprising:
- a. providing a substrate and iridium metal target in close association within a vacuum chamber;
b. sputtering the iridium metal target; and
c. contacting said sputtered iridium with a gas mixture comprising oxygen and a nitrogen-containing gas, thereby to deposit a nitrogen-containing iridium oxide film on the surface of the substrate facing the target.
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Abstract
A method of depositing a nitrogen-containing electrochromic iridium oxide film by sputtering iridium in an atmosphere comprising oxygen and nitrogen is disclosed for use in producing a transparent electrochromic article. The article includes electroconductive films, e.g., ITO, on two substrates, one of which has a superimposed electrochromic film, e.g., tungsten oxide, and the other of which has superimposed the iridium oxide film of the invention. An ion conductive layer between the electrochromic films completes the article.
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14 Claims
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1. A method of producing a nitrogen-containing iridium oxide film on a surface of a substrate, comprising:
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a. providing a substrate and iridium metal target in close association within a vacuum chamber; b. sputtering the iridium metal target; and c. contacting said sputtered iridium with a gas mixture comprising oxygen and a nitrogen-containing gas, thereby to deposit a nitrogen-containing iridium oxide film on the surface of the substrate facing the target. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14)
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Specification