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Method of plasma-activated reactive deposition of electrically conducting multicomponent material from a gas phase

  • US 5,618,395 A
  • Filed: 05/02/1996
  • Issued: 04/08/1997
  • Est. Priority Date: 10/11/1989
  • Status: Expired due to Fees
First Claim
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1. A substrate carrying a precursor layer for a multicomponent material layer, said precursor layer comprising a plurality of parallel sub-layers one deposited on top of the other, each sub-layer comprising a plurality of adjacent regions which regions each comprise a single component material of the multicomponent material, the distribution of the single component materials in the various sub-layers being such that in a cross section normal to said substrate the adjacent regions of each two adjacent sub-layers comprise different single component materials.

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