Inductively coupled plasma generating devices

• US 5,619,103 A
• Filed: 06/07/1995
• Issued: 04/08/1997
• Est. Priority Date: 11/02/1993
• Status: Expired due to Fees

• Current Assignee: Wisconsin Alumni Research Foundation (University of Wisconsin System)
• Original Assignee: Wisconsin Alumni Research Foundation (University of Wisconsin System)
• Inventors: Li, Guifang, Tobin, Jeffrey A.
• Primary Examiner(s): Pascal, Robert
• Assistant Examiner(s): Philogene, Haissa
• Application Number:
  US08/486,917
• Time in Patent Office: 671 Days
• Field of Search: 315/111.21, 315/111.41, 315/111.51, 315/248, 219/121.52, 219/121.43, 156/345, 156/643, 204/298.08
• US Class Current: 315/111.21
• CPC Class Codes: H01J 37/321 the radio frequency energy being inductively coupled to the plasma
• CPC Class Codes: H01J 65/048 the field being produced by using an excitation coil

Abstract

A broad area plasma lighting device in which a sealed gas envelope placed adjacent to a planar inductive coupling structure generates visible light. Representative planar inductive coupling structures include a planar spiral coil and a parallel conductor coupling structure. According to the invention, a parallel conductor coupling structure has two basic forms: separate parallel conductors each driven by its own generator/tuning circuit, or single conductor such as a flattened helix or series of square coils driven by one generator/tuning circuit. In addition, a plasma generating device having one or more parallel conductor inductive coupling structures is described. The resulting plasma generator can be used in such applications as plasma processing and inductive plasma lighting.

Claims

1. An inductive coupling device comprising a first inductive coupling structure, wherein the first inductive coupling structure comprises a plurality of separate conductors including a first and a second conductor, wherein the first conductor runs approximately parallel to the second conductor and within a first plane approximately parallel to a coupling plane, wherein the coupling device further comprises a second inductive coupling structure having a plurality of separate conductors including a first and a second conductor, wherein the first and second conductors of said second inductive coupling structure lie within a second plane approximately parallel to the coupling plane.

2. The inductive coupling device according to claim 1 wherein the conductors of the second inductive coupling structure are woven through the conductors of the first inductive coupling structure.

3. The inductive coupling device according to claim 1 wherein the coupling device further comprises an impedance matching circuit electrically connected to the conductors of the first and second inductive coupling structures.

4. A method of varying a field profile used to generate a plasma within a gas, the method comprising the steps of:

providing a planar conductor inductive coupling structure having a first and a second conducting path;

determining a desired field profile to be generated in an adjacent gas; and

positioning the first conducting path relative to the second conducting path so as to obtain the desired field profile.

5. The method according to claim 4 wherein the step of positioning comprises the step of spacing the first and second conducting paths within a coupling plane to achieve the desired field profile.

6. The method according to claim 4 wherein the step of positioning comprises the steps of:

placing the first and second conducting paths at a desired spacing within a plane; and

moving the second conducting path in a direction orthogonal to the plane to achieve the desired field profile.