Apparatus for fluid delivery in chemical vapor deposition systems

• US 5,620,524 A
• Filed: 02/27/1995
• Issued: 04/15/1997
• Est. Priority Date: 02/27/1995
• Status: Expired due to Fees

• Current Assignee: Ipprime, Inc.
• Original Assignee: James L. White Jr
• Inventors: Fan, Chiko, Pearson, Anthony, White, James L. Jr., Chen, J. James
• Primary Examiner(s): Breneman, R. Bruce
• Assistant Examiner(s): LUND, JEFFRIE ROBERT
• Application Number:
  US08/395,613
• Time in Patent Office: 778 Days
• Field of Search: 417/3, 417/4, 417/5, 417/18, 417/20, 417/22, 417/45, 417/326, 417/415, 417/540, 92/86, 92/87, 118/715, 118/726
• US Class Current: 118/726
• CPC Class Codes: B01J 4/00 Feed or outlet devices; Feed or outlet control devices feed or outlet devices for pressure vessels B01J3/02 ; feeding of particles into and evacuation of particles out of the reactor B01J8/0015
• CPC Class Codes: C23C 16/4481 by evaporation using carrier gas in contact with the source material C23C16/4486 takes precedence

Abstract

Described herein is an apparatus and method for delivering fluid components for semiconductor processes such as chemical vapor deposition (CVD) and chemical etch processes. Any prescribed mixture of separate fluid reagents can be delivered with extreme accuracy and precision using the apparatus we describe here. The unique embodiment of a precision fluid pumping system utilizing internal pressure and temperature transducers, capacity volume and restrictive elements that comprise a continuous pulse-free system for use in CVD applications. This system has superior performance characteristics in the areas of: accuracy, precision, repeatability of the fluid mixture delivery and continuous repeatable delivery without intermittent pulsation. We describe a novel fluid pump whose design is integrated using a closed loop feedback system composed of temperature and pressure sensors. This allows the entire system to perform to in either an isobaric-isothermal mode or an isocratic-isothermal mode. The construction of this system is separated into three principle areas (Fluid Pump Hardware), (Fluid phase change hardware) and (Control algorithms), the complete embodiment constitutes a novel invention in the field of chemical delivery as pertaining to the fabrication of semiconductor devices.

Claims

1. A step gradient positive displacement dual plunger system for continuous and pulse-free delivery of reagents for semiconductor processing, said system comprising:

a plurality of reagent sources;

a buffer gas source;

a primary liquid delivery chamber and a secondary liquid delivery chamber;

wherein said primary and secondary liquid chamber are comprised of a high pressure chamber with an inlet and an outlet, a plunger connected to a motor assembly, fluoropolymer high pressure seals, and a washing chamber;

said motor assembly comprising a ball screw spindle, a counter rotating shaft and bearing, a direct or gear drive motor with an attached optical encoder that provides closed loop motion control;

said plurality of reagent sources and said buffer gas source are connected by solenoid valves to a manifold, said manifold is connected to the inlet of said primary liquid delivery chamber via a solenoid valve;

a pressure transducer is connected to the outlet of said primary liquid delivery chamber via a check valve, and the inlet of said secondary liquid delivery chamber;

a device to minimize the pressure pulsation associated with the plunger operation;

wherein said device comprise a capillary tube before and in series with a volume element, said volume element is connected in series to another capillary tube, and a heating or cooling means for heating or cooling the reagents in the volume elements;

a heating gas mixing block comprising a reagent inlet, a buffer gas inlet, a heating means for heating the heating gas mixing block, and an outlet to a reaction chamber;

wherein said reagent is flashed vaporized and mixed with a buffer gas; and

the outlet of said secondary liquid delivery chamber is connected before and in series with said device via said capillary tubing, said device is connected before and in series with the reagent inlet of said heating gas mixing block via said capillary tubing.

2. The system as claimed in claim 1, wherein said capillary tubing is manufactured of a material compatible to said reagent.

3. The system as claimed in claim 2, wherein said capillary tubing is formed of fused silica, stainless steel, polymer or titanium tubing.

4. The system as claimed in claim 1, wherein said volume element is manufactured of a material compatible to said reagent.

5. The system as claimed in claim 4, wherein said volume element is formed of stainless steel, polymer or titanium tubing.

6. A continuous gradient positive displacement dual plunger system for continuous and pulse-free delivery of reagents for semiconductor processing, said system comprising;

a plurality of reagent supply means for supplying a liquid reagent to a heating gas mixing block;

wherein said reagent supply means comprises;

a reagent source;

a buffer gas source;

a primary liquid delivery chamber and secondary liquid delivery chambers;

wherein said primary and secondary liquid delivery chambers are comprised of a high pressure chamber with an inlet and an outlet, a plunger connected to a motor assembly, fluoropolymer high pressure seals, and a washing chamber;

said motor assembly comprising a ball screw spindle, a counter rotating shaft and bearing, a direct or gear drive motor with an attached optical encoder that provides closed loop motion control;

said reagent source and said buffer gas source are connected by solenoid valves to a manifold, said manifold is connected to the inlet of said primary liquid delivery chamber via a solenoid valve;

a pressure transducer is connected to the outlet of said primary liquid delivery chamber via a check valve, and the inlet of said secondary liquid delivery chamber;

a device to minimize the pressure pulsation associated with the plunger operation;

wherein said device comprises a capillary tube before and in series with a volume element, said volume element is connected in series to another capillary tube, and a heating or cooling means for heating or cooling the reagents in the volume element;

the outlet of said secondary liquid delivery chamber is connected before and in series with said device via said capillary tubing, said device is connected before and in series with the reagent inlet of said heating gas mixing block via said capillary tubing; and

a heating gas mixing block comprising a plurality of reagent inlets, a buffer gas inlet, a heating means for heating the heating gas mixing block, and an outlet to a reaction chamber;

wherein said reagents are flashed vaporized and mixed with a buffer gas.