Hardware/software implementation for multipass E-beam mask writing
First Claim
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1. A multipass E-beam mask writing system with increased pattern fidelity comprising:
- a data storage device storing pattern drive code, the same pattern drive code being used for each pass of a multipass exposure to write a mask;
a shape processor accessing the pattern drive code stored in said data storage device and outputting a rectangle position, rectangle dimensions, subfield boundary, and a rectangle exposure control data to an output buffer;
a shape divider receiving said rectangle position, said rectangle dimensions and said subfield boundary data from said output buffer and moving a boundary location of adjacent subfields between exposure passes resulting in better subfield stitch; and
a shape generator receiving said rectangle exposure control data from said output buffer and shifting a boundary location of spots within said rectangles between said exposure passes resulting in a smoother edge of an exposed pattern.
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Abstract
A process smooths the edges of rectangles written by an E-beam lithography system to improve critical dimension (CD) control in these shapes in the preparation of X-ray masks. The CD tolerances of X-ray masks are improved without the usual postprocessing costs normally associated with multipass solutions, thereby saving time and money when multipass writing is used in X-ray lithography. Two enhancements are provided to an X-ray mask maker that allow use of the same E-beam drive code for each exposure of a multipass write operation.
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Citations
7 Claims
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1. A multipass E-beam mask writing system with increased pattern fidelity comprising:
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a data storage device storing pattern drive code, the same pattern drive code being used for each pass of a multipass exposure to write a mask; a shape processor accessing the pattern drive code stored in said data storage device and outputting a rectangle position, rectangle dimensions, subfield boundary, and a rectangle exposure control data to an output buffer; a shape divider receiving said rectangle position, said rectangle dimensions and said subfield boundary data from said output buffer and moving a boundary location of adjacent subfields between exposure passes resulting in better subfield stitch; and a shape generator receiving said rectangle exposure control data from said output buffer and shifting a boundary location of spots within said rectangles between said exposure passes resulting in a smoother edge of an exposed pattern. - View Dependent Claims (2, 3, 4, 5)
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6. A method of operating a multipass E-beam mask writing system with increased pattern fidelity comprising the steps of:
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storing a pattern drive code, the same pattern drive code being used for each pass of a multipass exposure to write a mask; accessing the pattern drive code and outputting rectangle position, a rectangle dimensions, a subfield boundary, and a rectangle exposure control data to an output buffer; receiving said rectangle position, said rectangle dimensions and said subfield boundary data from said output buffer and moving a boundary location of adjacent subfields between exposure passes; receiving said rectangle exposure control data and shifting a boundary location of spots within said rectangles between said exposure passes. - View Dependent Claims (7)
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Specification