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Hardware/software implementation for multipass E-beam mask writing

  • US 5,621,216 A
  • Filed: 04/26/1996
  • Issued: 04/15/1997
  • Est. Priority Date: 04/26/1996
  • Status: Expired due to Fees
First Claim
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1. A multipass E-beam mask writing system with increased pattern fidelity comprising:

  • a data storage device storing pattern drive code, the same pattern drive code being used for each pass of a multipass exposure to write a mask;

    a shape processor accessing the pattern drive code stored in said data storage device and outputting a rectangle position, rectangle dimensions, subfield boundary, and a rectangle exposure control data to an output buffer;

    a shape divider receiving said rectangle position, said rectangle dimensions and said subfield boundary data from said output buffer and moving a boundary location of adjacent subfields between exposure passes resulting in better subfield stitch; and

    a shape generator receiving said rectangle exposure control data from said output buffer and shifting a boundary location of spots within said rectangles between said exposure passes resulting in a smoother edge of an exposed pattern.

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