Device and manufacturing method for a ferroelectric memory

• US 5,621,681 A
• Filed: 03/22/1996
• Issued: 04/15/1997
• Est. Priority Date: 03/22/1995
• Status: Expired due to Term

• Current Assignee: Samsung Electronics Co. Ltd.
• Original Assignee: Samsung Electronics Co. Ltd.
• Inventors: Moon, Jong
• Primary Examiner(s): Nelms, David C.
• Assistant Examiner(s): LE, VU ANH
• Application Number:
  US08/620,209
• Time in Patent Office: 389 Days
• Field of Search: 365/145, 365/149, 257/295, 257/310, 257/768, 257/769, 257/915, 257/296
• US Class Current: 365/145
• CPC Class Codes: H01L 29/78391 the gate comprising a layer which is used for its ferroelectric properties
• CPC Class Codes: H10B 53/00 Ferroelectric RAM [FeRAM] devices comprising ferroelectric memory capacitors
• CPC Class Codes: Y10S 257/915 with titanium nitride portion or region

Abstract

A ferroelectric memory device of an MFIS FET structure using a yttrium oxide film as a buffer film and a manufacturing method of the memory device are provided. The MFIS FET includes a p-type silicon substrate, a field oxide film formed in a device isolation region of the silicon substrate, a gate yttrium oxide film formed on the surface of the silicon substrate, a gate ferroelectric film formed on the gate yttrium oxide film, a gate TiN electrode formed on the gate ferroelectric film, and an n-type source/drain region formed in the silicon substrate of both sides of the gate TiN electrode. In this way, single crystals of the gate yttrium oxide film are easily formed resulting in the formation of a good-quality ferroelectric film on the yttrium oxide film.

Claims

1. A ferroelectric memory device comprising:

a semiconductor substrate of a first conductive type;

a yttrium oxide (Y₂ O₃) gate film formed over the semiconductor substrate;

a ferroelectric gate film formed over the yttrium oxide film;

a gate electrode formed over the ferroelectric film; and

a source/drain region of a second conductive type different from the first conductive type, formed in said semiconductor substrate along sides of the gate electrode.

2. A ferroelectric memory device as claimed in claim 1, wherein the ferroelectric gate film comprises a material selected from the group consisting of PZT, PT, and Y1 family materials.

3. A ferroelectric memory device as claimed in claim 1, wherein the gate electrode comprises a material selected from the group consisting of a TiN film and a double-layered film of TiN and tungsten.

4. A ferroelectric memory device comprising:

a semiconductor substrate of a first conductivity type;

a gate comprising

a yttrium oxide gate film formed over the semiconductor substrate;

a ferroelectric gate film formed over the yttrium oxide film; and

a gate electrode formed over the gate ferroelectric film;

a spacer formed over the gate and covering sidewalls of the gate;

a first-concentration impurity region of a second conductive type different from the first conductive type, formed below the spacer; and

a second-concentration source/drain region of the second conductive formed in the semiconductor substrate along sides of the gate and connected to the first-concentration impurity region, wherein second concentration of the second-concentration source/drain region being higher than a first concentration of the first-concentration impurity region.

5. A ferroelectric memory device as claimed in claim 4, wherein the ferroelectric gate film comprises a material selected from the group consisting of PZT, PT, and Y1 family materials.

6. A ferroelectric memory device as claimed in claim 4, wherein said gate electrode comprises a material selected from the group consisting of a TiN film and a double-layered film of a TiN and tungsten.

7. A ferroelectric memory device as claimed in claim 4, wherein the spacer comprises a material selected from the group consisting of SiO₂, Si₃ N₄, Y₂ O₃, and SiON.