Sprout inhibition compositions comprising chlorpropham and substituted naphthalenes and methods of using same

• US 5,622,912 A
• Filed: 05/24/1996
• Issued: 04/22/1997
• Est. Priority Date: 05/24/1996
• Status: Expired due to Term

• Current Assignee: Platte Chemical Company
• Original Assignee: Platte Chemical Company
• Inventors: Schafer, Ronald K., Riggle, Bruce D.
• Primary Examiner(s): CLARDY, S
• Application Number:
  US08/653,222
• Time in Patent Office: 333 Days
• Field of Search: 504/143, 504/304
• US Class Current: 504/143
• CPC Class Codes: A01N 2300/00 Combinations or mixtures of active ingredients covered by classes A01N27/00 - A01N65/48 with other active or formulation relevant ingredients, e.g. specific carrier materials or surfactants, covered by classes A01N25/00 - A01N65/48
• CPC Class Codes: A01N 27/00 Biocides, pest repellants or attractants, or plant growth regulators containing hydrocarbons
• CPC Class Codes: A01N 47/20 N-Aryl derivatives thereof

Abstract

Compositions which include a mixture of CIPC and at least one substituted naphthalene are disclosed. The compositions of the present invention are adapted for inhibiting sprout growth in tubers. When so used, the preferred substituted naphthalene in the compositions of the present invention are dimethylnaphthalene (DMN) and diisopropylnaphthalene (DIPN). A method of applying a CIPC/naphthalene mixture is also disclosed. In a preferred embodiment of the method, tubers to be placed in storage are treated with a composition of CIPC and a substituted naphthalene utilizing thermal fogging techniques, with the average effective residue of CIPC on the tubers of from approximately 21 ppm to 2.5 ppm. In the preferred embodiment, the weight ratio of average effective residue of CIPC to the substituted naphthalene is from approximately 1:1 to 1:4. In a most preferred embodiment, a composition including CIPC and either DIPN or DMN is applied to tubers utilizing thermal fogging techniques, to obtain an average effective residue on the outer surface of the tubers of approximately 14 ppm CIPC and 14 ppm of the DIPN or DMN.

Claims

1. A composition adapted for inhibiting sprout formation in tubers during storage, comprising:

CIPC (chlorpropham); and

a substituted naphthalene.

2. The composition of claim 1 wherein the substituted naphthalene is DIPN (diisopropylnaphthalene).

3. The composition of claim 1 wherein the substituted naphthalene is DMN (dimethylnaphthalene).

4. The composition of claim 1 wherein the substituted naphthalene is selected from the group consisting of DIPN, DMN and methyl naphthalene.

5. The composition of claim 1 wherein the weight ratio of CIPC to substituted naphthalene is from 1:

1 to 1;

4.

6. The composition of claim 2 wherein the weight ratio of CIPC to DIPN is from 1:

1 to 1;

4.

7. The composition of claim 3 wherein the weight ratio of CIPC to DMN is from 1:

1 to 1;

4.

8. The composition of claim 4 wherein the weight ratio of CIPC to the selected substituted naphthalene is from 1:

1 to 1;

4.

9. A method of inhibiting sprout formation in tubers during storage, comprising the steps of:

applying an effective amount of a composition comprising CIPC and a substituted naphthalene to the outer surface of the tubers to form a residue thereon; and

storing the tubers upon which the residue has been formed.

10. The method of claim 9 wherein the CIPC is present in the residue, on average, at from approximately 21 ppm to approximately 2.5 ppm.

11. The method of claim 9 wherein the substituted naphthalene includes DIPN.

12. A method of claim 11 wherein the CIPC is present in the residue at from approximately 21 ppm to approximately 2.5 ppm.

13. A method of claim 11 wherein the CIPC and DIPN are present in the residue in a weight ratio of from approximately 1:

1 to 1;

4.

14. A method of claim 12 wherein the CIPC and DIPN are present in the residue in a weight ratio of from approximately 1:

1 to 1;

4.

15. The method of claim 9 wherein the substituted naphthalene includes DMN.

16. A method of claim 15 wherein the CIPC is present in the residue, on average, at from approximately 21 ppm to approximately 2.5 ppm.

17. A method of claim 15 wherein the CIPC and DMN are present in the residue in a weight ratio of from approximately 1:

1 to 1;

4.

18. A method of claim 16 wherein the CIPC and DMN are present in the residue in a weight ratio of from approximately 1:

1 to 1;

4.

19. A method of inhibiting sprout formation in tubers during storage, comprising the steps of:

providing a composition comprising CIPC and a substituted naphthalene to form a sprout inhibiting composition;

applying an effective amount of the sprout inhibiting composition to the outer surface of the tubers to form treated potatoes; and

storing the treated tubers.

20. The method of claim 19 wherein the weight ratio of CIPC to substituted naphthalene in the composition is from approximately 1:

1 to 1;

4.

21. The method of claim 19 wherein the substituted naphthalene is selected from the group consisting of DIPN, DMN and methyl naphthalene.

22. The method of claim 21 wherein the weight ratio of CIPC to the selected substituted naphthalene in the composition is from approximately 1:

1 to 1;

4.

23. The method of claim 19 wherein the substituted naphthalene includes DIPN.

24. The method of claim 23 wherein the weight ratio of CIPC to DIPN in the composition is from approximately 1:

1 to 1;

4.

25. The method of claim 19 wherein the substituted naphthalene includes DMN.

26. The method of claim 25 wherein the weight ratio of CIPC to DMN in the composition is from approximately 1:

1 to 1;

4.

27. The method of claim 19 wherein the applying step further includes the step of dipping the tubers in the sprout inhibiting composition.

28. The method of claim 27 wherein the substituted naphthalene is selected from the group consisting of DIPN and DMN.

29. The method of claim 27 wherein the weight ratio of CIPC to substituted naphthalene in the composition is from approximately 1:

1 to 1;

4.

30. The method of claim 19 wherein the applying step further includes the steps of:

aerating the sprout inhibiting composition to form a sprout inhibiting aerosol; and

applying the sprout inhibiting aerosol to the tubers to form treated potatoes.

31. The method of claim 30 wherein the substituted naphthalene is selected from the group consisting of DIPN and DMN.

32. The method of claim 30 wherein the weight ratio of CIPC to substituted naphthalene in the composition is from approximately 1:

1 to 1;

4.

33. A method of inhibiting sprout formation on tubers during storage, comprising the steps of:

applying CIPC to the tubers in an amount effective to form a residue thereon and inhibit sprout formation therefrom;

applying a substituted naphthalene to the tubers in an amount effective to form a residue thereon and to inhibit sprout formation therefrom; and

storing the tubers for a period of time, wherein the CIPC and substituted naphthalene residues are both present for at least a portion of the period of time the tubers are stored.

34. The method of claim 33 wherein the substituted naphthalene includes DIPN.

35. The method of claim 34 wherein the CIPC and DIPN are applied to the tubers in a weight ratio of from approximately 1:

1 to 1;

4.

36. The method of claim 33 wherein the substituted naphthalene includes DMN.

37. The method of claim 36 wherein the CIPC and DMN are applied to the tubers in a weight ratio of from approximately 1:

1 to 1;

4.

38. The method of claim 33 wherein the substituted naphthalene is selected from the group consisting of DIPN, DMN and methyl naphthalene.

39. The method of claim 38 wherein the CIPC and the substituted naphthalene are applied to the tubers in a weight ratio of from approximately 1:

1 to 1;

4.

40. The method of claim 33 wherein the CIPC is applied and initially present in the residue, on average, at from approximately 21 ppm to approximately 2.5 ppm.