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Testing of semiconductor devices

  • US 5,623,215 A
  • Filed: 05/08/1996
  • Issued: 04/22/1997
  • Est. Priority Date: 12/10/1993
  • Status: Expired due to Fees
First Claim
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1. A method of testing a semiconductor device, comprising the steps of:

  • during a first period, applying a thermal stress test electrical signal to the semiconductor device tending to heat it towards destruction;

    truncating the thermal stress test electrical signal at a predetermined truncation time tT selected to substantially thermally stress the semiconductor device but avoid permanent damage to it if well made as designed;

    during a cooling period beginning at the truncation time tT, applying a measuring waveform to the semiconductor (i) for inducing a time-changing, temperature-dependent parameter signal indicating the semiconductor'"'"'s instantaneous temperature at successive times (t1, t2, t3, . . . ) shortly after the truncation time tT, and (ii) for sampling the parameter signal to obtain parameter samples (p(t1), p(t2), p(t3), . . . ) at such successive times;

    extrapolating backwards in time from the parameter samples (p(t1), p(t2), p(t3), . . . ) to obtain the value of an estimated parameter signal p(tT) at the truncation time tT ;

    generating a "passed" signal only if the estimated parameter signal p(tT) indicates a semiconductor device temperature less than a predetermined no-pass temperature indicating incipient failure of the semiconductor device.

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