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Exposure control apparatus and method

  • US 5,627,627 A
  • Filed: 09/29/1995
  • Issued: 05/06/1997
  • Est. Priority Date: 02/24/1993
  • Status: Expired due to Fees
First Claim
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1. A scanning exposure apparatus comprising:

  • an illumination system for illuminating a mask with light pulses;

    a projection optical system receiving light pulses from said mask and having an image field which is smaller than an exposure region on a photosensitive substrate, in which region an image of a pattern on said mask is to be formed by light pulses radiated from said projection optical system;

    a scanning system which synchronously scans said mask and said substrate relative to said projection optical system for scanning exposure;

    a measurement system which measures, during the scanning exposure, individual integrated light quantities radiated on each of a plurality of partial regions, respectively in said exposure region, within the image field to be irradiated with a next light pulse, based on intensities of light pulses radiated on said substrate; and

    an adjusting system which adjusts an intensity of said next light pulse based on the measured integrated light quantities.

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