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Method and apparatus for chemical-mechanical polishing using pneumatic pressure applied to the backside of a substrate

  • US 5,635,083 A
  • Filed: 06/06/1995
  • Issued: 06/03/1997
  • Est. Priority Date: 08/06/1993
  • Status: Expired due to Term
First Claim
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1. A method of polishing a substrate comprising the steps of:

  • placing a substrate on a polishing pad;

    moving said polishing pad;

    pressing said substrate against said moving polishing pad with a carrier, wherein said carrier presses said substrate against said moving polishing pad with a pneumatic pressure applied directly to a portion of the backside of said substrate; and

    pressing a lip seal against the outer edge of the backside of said substrate and against said carrier with said pneumatic pressure to form a leak tight seal between said substrate and said carrier.

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