Method for interconnecting semiconductor chips in three dimensions, and component resulting therefrom

• US 5,637,536 A
• Filed: 04/13/1995
• Issued: 06/10/1997
• Est. Priority Date: 08/13/1993
• Status: Expired due to Term

• Current Assignee: Thomson-CSF
• Original Assignee: Thomson-CSF
• Inventors: Val, Christian
• Primary Examiner(s): PICARDAT, KEVIN M
• Application Number:
  US08/416,704
• Time in Patent Office: 789 Days
• Field of Search: 437/209, 437/208, 437/210, 437/211, 437/214, 437/215, 437/219, 437/220, 257/685, 257/686, 257/723, 257/724, 257/725, 257/726
• US Class Current: 438/686
• CPC Class Codes: H01L 2224/16 of an individual bump connector
• CPC Class Codes: H01L 2224/48091 Arched
• CPC Class Codes: H01L 2224/73265 Layer and wire connectors
• CPC Class Codes: H01L 2225/06517 Bump or bump-like direct electrical connections from device to substrate
• CPC Class Codes: H01L 2225/06551 Conductive connections on the side of the device
• CPC Class Codes: H01L 2225/06575 Auxiliary carrier between devices, the carrier having no electrical connection structure
• CPC Class Codes: H01L 2225/06579 TAB carriers; beam leads
• CPC Class Codes: H01L 2225/06582 Housing for the assembly, e.g. chip scale package [CSP]
• CPC Class Codes: H01L 25/0657 Stacked arrangements of devices
• CPC Class Codes: H01L 2924/00014 the subject-matter covered by the group, the symbol of which is combined with the symbol of this group, being disclosed without further technical details
• CPC Class Codes: H01L 2924/01046 Palladium [Pd]

Abstract

A method and component resulting from interconnecting wafers in three dimensions, where the wafers include chips and the chips include pads. Steps in the method include connecting leads to the pads; stacking the wafers; embedding the stack by a selectively removable material; treating faces of the stack in order to reveal the leads; forming connections on the faces of the stack for interconnecting the leads; and removing the selectively removable material.

Claims

1. Method for interconnecting wafers in three dimensions, the wafers comprising one or more semiconductor chips, the chips comprising pads for interconnecting them, the process being characterized by the fact that it comprises the following steps in succession:

connecting leads (F) to the pads (P_c) of the wafers;

stacking the wafers (P);

embedding the stack by means of a selectively removable material;

treating the faces of the stack in order to reveal the leads;

forming connections (C_x) on the faces of the stack, for interconnecting the leads;

removing the selectively removable material.

2. Method according to claim 1, characterized by the fact that, during the first step, each of the wafers (P) is arranged inside a frame of electrically insulating material, carrying conducting depositions;

that the leads (F) are connected between the pads (P_c) and the conducting depositions, and that, during the fourth step, the faces of the stack are treated so as to eliminate the frame.

3. Method according to claim 1, characterized by the fact that, during the first step, each of the wafers (P) is arranged on a plate of electrically insulating material, the plate carrying conducting depositions, and that the leads (F) are connected between the pads (P_c) and the conducting depositions.

4. Method according to claim 1, characterized by the fact that, during the first step, each of the wafers (P) is arranged inside a frame of electrically insulating material, the frame carrying conducting strips extending (F) beyond the frame so as to come above the pads (P_c) and being connected to the latter, and that, during the fourth step, the faces of the stack are treated so as to eliminate the frame.

5. Method according to claim 1, characterized by the fact that, during the first step, the pads (P_c) of each of the wafers are covered with bumps, that an electrically insulating substrate is arranged above the face of the wafer which carries the pads, that the substrate carries metallic depositions on its upper and lower faces, which depositions are linked to the bumps, and that, during the fourth step, the faces of the stack are treated so as to make the metallic depositions flush.

6. Method according to claim 5, characterized by the fact that each of the wafers (P) further comprises a second series of bumps made on that one of its faces which does not carry pads (P_c), and that the substrate assigned to the neighbouring wafer within the stack carries pads intended to be connected to the bumps of the second series.

7. Method according to claim 5, characterized by the fact that the substrates each comprise metallized half-holes made on their lateral faces, where the connections (C_x) of the stack are made and intended to be in contact with them.

8. Method according to claim 1, characterized by the fact that, during the fifth step, grooves are formed in the stack in accordance with the pattern of the connections (C_x), the grooves exposing the end of the leads.

9. Method according to claim 1, characterized by the fact that spacers are arranged between the wafers during stacking.

10. Method according to claim 1, characterized by the fact that it further comprises a step of coating the stack with an electrically insulating layer of a mineral material.

11. Method according to claim 6, characterized by the fact that the substrates each comprise metallized half-holes made on their lateral faces, where the connections of the stack are made and intended to be in contact with them.

12. Method according to claim 2, characterized by the fact that it further comprises a step of coating the stack with an electrically insulating layer of a mineral material.

13. Method according to claim 3, characterized by the fact that it further comprises a step of coating the stack with an electrically insulating layer of a mineral material.

14. Method according to claim 4, characterized by the fact that it further comprises a step of coating the stack with an electrically insulating layer of a mineral material.

15. Method according to claim 5, characterized by the fact that it further comprises a step of coating the stack with an electrically insulating layer of a mineral material.

16. Method according to claim 6, characterized by the fact that it further comprises a step of coating the stack with an electrically insulating layer of a mineral material.

17. Method according to claim 7, characterized by the fact that it further comprises a step of coating the stack with an electrically insulating layer of a mineral material.

18. Method according to claim 8, characterized by the fact that it further comprises a step of coating the stack with an electrically insulating layer of a mineral material.

19. Method according to claim 9, characterized by the fact that it further comprises a step of coating the stack with an electrically insulating layer of a mineral material.

20. A self-supporting component comprising:

a wafer stack comprising,

a first wafer comprising,

a first chip comprising a first pad, and

a first chip carrier configured to support said first chip, and

a second wafer disposed over said first wafer, comprising,

a second chip comprising a second pad, and

a second chip carrier configured to support said second chip, and wherein said wafer stack has a face surface;

a first lead connected to the first pad and extending to said face surface of said wafer stack;

a second lead connected to the second pad and extending to said face surface of said wafer stack; and

a connector arranged on the face surface of the wafer stack and interconnecting said first lead and second lead, said connector configured to structurally support said wafer stack, whereby said component is made self-supporting by said connection of said first lead and said second lead to said wafer stack and by said connector interconnecting said first and the second lead.

21. A self-supporting component comprising:

a wafer stack comprising,

a first wafer comprising,

a first chip comprising a first pad, and

a second wafer disposed over said first wafer, comprising,

a second chip comprising a second pad;

a first lead connected to the first pad and extending to said face surface of said wafer stack;

a second lead connected to the second pad and extending to said face surface of said wafer stack; and

a connector arranged on the face surface of the wafer stack and interconnecting said first lead and second lead, said connector configured to structurally support said wafer stack, whereby said component is made self-supporting by said connection of said first lead and said second lead to said wafer stack and by said connector interconnecting said first and the second lead.