Plasma etching reactor with surface protection means against erosion of walls
First Claim
1. An apparatus for protecting the interior walls of a plasma processing chamber, said interior walls being at an electrical potential, comprising:
- a removable, flexible shield comprising electrically conductive material, said shield having a first surface resiliently engaging the contours of the interior walls;
an electrically conductive area defined on a second surface of said shield; and
at least one electrically conductive member distinct from the shield engaging said conductive area to electrically couple said shield to an electrical potential substantially matching the electrical potential of the interior walls of the chamber.
1 Assignment
0 Petitions
Accused Products
Abstract
A thin flexible removeable shield made of electrically conducting material presses against the interior walls of an apertured processing chamber to protect the processing chamber walls from erosion from the reactive plasma gases. The shield and walls are electrically interconnected with a sleeve-like conductive insert overlapping a surface portion of the shield and passing through the shield and lining a chamber aperture, with the insert also insuring the positioning of the insert against the wall. The remaining exposed surface of the shield has a protective anodization. A conductive connector preferably also connects the insert to another interior chamber structure at the same electrical potential as the chamber walls.
158 Citations
29 Claims
-
1. An apparatus for protecting the interior walls of a plasma processing chamber, said interior walls being at an electrical potential, comprising:
-
a removable, flexible shield comprising electrically conductive material, said shield having a first surface resiliently engaging the contours of the interior walls; an electrically conductive area defined on a second surface of said shield; and at least one electrically conductive member distinct from the shield engaging said conductive area to electrically couple said shield to an electrical potential substantially matching the electrical potential of the interior walls of the chamber. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12)
-
-
13. An apparatus for protecting the interior walls of a plasma processing reactor chamber, said processing chamber having within the processing chamber a structure comprising an electrical coupling assembly at an electrical potential substantially matching the electrical potential of the interior walls, said apparatus comprising:
-
a removable, flexible shield comprised of electrically conductive material and having a first surface that presses against the contours of the interior walls, said shield including at least one electrically conductive area facing the interior of the processing chamber; at least one removable electrically conductive insert, wherein each electrically conductive area of the flexible shield is pressed against by a separate insert so as to hold the shield in place against the interior walls thereby electrically coupling said insert to said shield, each insert including an extension electrically coupled to said electrical coupling assembly of said processing chamber, so that each insert, said shield, and said walls are maintained at a substantially matching electrical potential so as to avoid plasma arcing. - View Dependent Claims (14)
-
-
15. A method of protecting the interior walls of a plasma processing reactor chamber, comprising the steps of:
-
placing a removable, electrically conductive, flexible shield of a diameter larger than the diameter of the interior walls within the plasma processing chamber; rotating the shield so that it is aligned with the contours of the interior walls; interlocking the shield against the chamber via an electrically conductive insert that is attached against the shield; attaching a first end of an electrically conductive member to said insert to form a first end of an electrically conductive path; and attaching a second end of said electrically conductive member to an electrically grounded area of the plasma processing chamber so as to form an electrically conductive path between the shield and the electrically grounded area of the plasma processing chamber.
-
-
16. A chamber liner assembly for a plasma processing chamber having an arcuate interior wall, said wall defining at least one aperture, said assembly comprising;
-
a thin, resilient band of conductive material sized for insertion over and about at least a substantial portion of the area of said arcuate wall, said band adapted upon insertion to press against said wall in resilient contact thereto and to define an aperture generally matching said chamber aperture; an insert defining a sleeve portion of an outside configuration matching the shape of said chamber aperture, and a flanged portion at one end of said sleeve portion adapted to overlap and engage a portion of said band; and a protective layer upon areas of the surface of said band exposed to the processes within the chamber; said band being insertable into said chamber so as to align said apertures, said insert being insertable into said chamber wall through said apertures to interlock said band, chamber wall and insert and maintain the position of said band against said wall, while providing a positive electrical connection between said band and chamber wall to maintain both at the same electrical potential, thereby to minimize arcing and protect said chamber wall during plasma processing, said band and insert being capable of disassembly and replacement as desired. - View Dependent Claims (17, 18, 19, 20, 21, 22, 23, 24, 25)
-
-
26. An assembly for protecting the interior walls of a plasma processing chamber which defines a recess, said assembly comprising:
-
a removable, flexible shield comprised of electrically conductive material, said shield pressing against the contours of the interior walls, said shield including an electrically conductive area facing the interior of the processing chamber, said shield defining an aperture adjacent said conductive area; and at least one removable electrically conductive insert engaging said electrically conductive area of the flexible shield and the interior walls via said aperture and recess to hold said shield in place against the interior walls, and to electrically couple said shield, insert and walls and maintain the same at a substantially matching electrical potential, so as to prevent plasma arcing stemming from use of said shield. - View Dependent Claims (27, 28, 29)
-
Specification