Method for producing an abrasion resistant coated substrate product

• US 5,643,423 A
• Filed: 12/03/1993
• Issued: 07/01/1997
• Est. Priority Date: 09/27/1990
• Status: Expired due to Term

• Current Assignee: Morgan Chemical Products, Inc.
• Original Assignee: Monsanto Company (Bayer AG)
• Inventors: Kimock, Fred M., Knapp, Bradley J., Finke, Steven James
• Primary Examiner(s): PIANALTO, BERNARD D
• Application Number:
  US08/161,896
• Time in Patent Office: 1,306 Days
• Field of Search: 427/164, 427/166, 427/167, 427/249, 427/250, 427/255.7, 427/398.4, 427/299, 427/309, 427/294, 427/534, 204/192.34, 204/192.35, 204/192.36
• US Class Current: 204/192.35
• CPC Class Codes: B32B 17/06 comprising glass as the main or only constituent of a layer, next to another layer of a specific material
• CPC Class Codes: C03C 17/06 with metals C03C17/34, C03C17/44 take precedence
• CPC Class Codes: C03C 17/3417 all coatings being oxide coatings
• CPC Class Codes: C03C 17/3435 comprising a nitride, oxynitride, boronitride or carbonitride
• CPC Class Codes: C03C 17/3441 comprising carbon, a carbide or oxycarbide
• CPC Class Codes: C03C 17/3452 comprising a fluoride
• CPC Class Codes: C03C 17/347 comprising a sulfide or oxysulfide
• CPC Class Codes: C03C 17/3476 comprising a selenide or telluride
• CPC Class Codes: C03C 17/36 at least one coating being a metal
• CPC Class Codes: C03C 17/3613 Coatings of type glass/inorganic compound/metal/inorganic compound/metal/other
• CPC Class Codes: C03C 17/3618 Coatings of type glass/inorganic compound/other inorganic layers, at least one layer being metallic
• CPC Class Codes: C03C 17/3621 one layer at least containing a fluoride
• CPC Class Codes: C03C 17/3626 one layer at least containing a nitride, oxynitride, boronitride or carbonitride
• CPC Class Codes: C03C 17/3628 one layer at least containing a sulfide
• CPC Class Codes: C03C 17/3634 one layer at least containing carbon, a carbide or oxycarbide
• CPC Class Codes: C03C 17/3642 the multilayer coating containing a metal layer
• CPC Class Codes: C03C 2217/734 comprising an alternation of high and low refractive indexes
• CPC Class Codes: C03C 2217/78 Coatings specially designed to be durable, e.g. scratch-resistant
• CPC Class Codes: C23C 14/02 Pretreatment of the material to be coated C23C14/04 takes precedence
• CPC Class Codes: C23C 14/021 Cleaning or etching treatments
• CPC Class Codes: C23C 14/024 : Deposition of sublayers, e.g. to promote adhesion of the coating C23C14/027 takes precedence
• CPC Class Codes: C23C 14/025 : Metallic sublayers
• CPC Class Codes: C23C 14/06 : characterised by the coating material C23C14/0021 , C23C14/04 take precedence
• CPC Class Codes: C23C 14/0605 : Carbon
• CPC Class Codes: C23C 14/0629 : of zinc, cadmium or mercury
• CPC Class Codes: C23C 14/0635 : Carbides
• CPC Class Codes: C23C 14/0641 : Nitrides C23C14/0617 takes precedence
• CPC Class Codes: C23C 14/0647 : Boron nitride
• CPC Class Codes: C23C 14/0676 : Oxynitrides
• CPC Class Codes: C23C 14/08 : Oxides C23C14/10 takes precedence
• CPC Class Codes: C23C 14/081 : of aluminium, magnesium or beryllium
• CPC Class Codes: C23C 14/082 : of alkaline earth metals
• CPC Class Codes: C23C 14/083 : of refractory metals or yttrium
• CPC Class Codes: C23C 14/086 : of zinc, germanium, cadmium, indium, tin, thallium or bismuth
• CPC Class Codes: C23C 14/10 : Glass or silica
• CPC Class Codes: C23C 14/18 : on other inorganic substrates
• CPC Class Codes: C23C 16/0227 : by cleaning or etching
• CPC Class Codes: C23C 16/0272 : Deposition of sub-layers, e.g. to promote the adhesion of the main coating
• CPC Class Codes: C23C 16/0281 : of metallic sub-layers C23C16/029 takes precedence
• CPC Class Codes: C23C 16/26 : Deposition of carbon only
• CPC Class Codes: G02B 1/105 : Protective coatings
• CPC Class Codes: G02B 1/111 : using layers comprising organic materials
• CPC Class Codes: G02B 1/14 : Protective coatings, e.g. hard coatings
• CPC Class Codes: Y10S 427/103 : Diamond-like carbon coating, i.e. DLC
• CPC Class Codes: Y10S 428/913 : Material designed to be responsive to temperature, light, moisture
• CPC Class Codes: Y10T 428/24975 : No layer or component greater than 5 mils thick
• CPC Class Codes: Y10T 428/265 : 1 mil or less
• CPC Class Codes: Y10T 428/30 : Self-sustaining carbon mass or layer with impregnant or other layer

Abstract

The coated substrate product finds particular application in eyeglass and sunglass lenses, architectural glass, analytical instrument windows, automotive windshields and laser bar code scanners for use in retail stores and supermarkets. The product has greatly improved wear resistance for severe abrasive environments and comprises a substantially optically transparent substrate, a chemically vapor deposited first interlayer bonded to the substrate and a chemically vapor deposited outer layer of substantially optically transparent diamond-like carbon bonded to the interlayer and away from the substrate.

Claims

1. A chemical vapor deposition method for producing an abrasion wear resistant coated substrate product comprising:

chemically de-greasing the surface of a parent substrate which is substantially optically transparent to light in the visible region of 350 to approximately 750 nanometers and which comprises a material selected from the group consisting of an amorphous material, a single crystal, polycrystalline materials, ceramic materials and mixtures thereof to remove hydrocarbon contamination;

placing said substrate into a chemical vapor deposition reactor vacuum chamber and evacuating the air from said chamber;

sputter-etching the surface of said substrate with energetic gas ions to remove traces of residual hydrocarbon and to preferentially reduce the concentration of alkali metal atoms and alkali metal oxides at the substrate surface;

chemically vapor depositing at least one composite layer having a thickness in the range of about 1 μ

m to about 20 μ

m by chemically vapor depositing during a first cycle a substantially optically transparent first interlayer at least 1 μ

m up to 20 μ

m, thick onto said substrate;

chemically vapor depositing during said first cycle a substantially optically transparent diamond-like carbon outer layer which is transparent to light in the visible region of 350 to approximately 750 nanometers and having a thickness of at least 50 Å

thick onto said coated substrate;

said first interlayer comprising a substantially optical transparent material devoid of alkali metal atoms and fluorine, which first interlayer is transparent to light in the visible region of 350 to approximately 750 nanometers and is selected from the group consisting of silicon nitride, titanium nitride, tantalum nitride, hafnium nitride, zirconium nitride, boron nitride, yttrium oxide, germanium oxide, hafnium oxide, silicon oxide, silicon dioxide, tantalum oxide, titanium oxide, zirconium oxide, silicon carbide, germanium carbide, mixtures thereof, and chemically bonded combinations thereof to form a strong chemical bond to said substrate and a strong chemical bond to said diamond-like carbon outer layer;

cooling said coated substrate by extinguishing said deposition process and passing an inert gas over said substrate until the temperature of said substrate has reached substantially room temperature during said cool-down step; and

recovering a coated substrate product exhibiting greatly improved wear resistance for severe abrasive environments.

2. The method of claim 1 wherein the thickness of said first interlayer and said diamond-like carbon outer layer are selected to maximize the reflection of light.

3. The method of claim 1 wherein the thickness of said diamond-like carbon layer corresponds to integer multiples of quarter wavelength optical thickness.

4. The method of claim 1 wherein the thickness of said first interlayer and said diamond-like carbon layer corresponds to integer multiples of quarter wavelength optical thickness.

5. The method of claim 1 wherein said composite layer comprises said first interlayer toward said substrate, a second interlayer which is transparent to light in the visible region of 350 to approximately 750 nanometers disposed immediately adjacent to said first interlayer and away from said substrate of a substantially optically transparent material devoid of alkali metal atoms and fluorine and capable of forming a strong chemical bond to said first interlayer and a strong chemical bond to diamond-like carbon, and said diamond-like carbon outer layer disposed immediately adjacent to said second interlayer and away from said substrate.

6. The method of claim 5 wherein said second interlayer comprises a substantially optically transparent metallic material capable of reflecting visible light selected from the group consisting of silicon, germanium, hafnium, molybdenum, tungsten, yttrium, tantalum, titanium and zirconium.

7. The method of claim 6 wherein the thickness of said first interlayer is in the range of about 5 Å

to about 20 μ

m and the thickness of said second interlayer is in the range of about 10 Å

to about 1000 Å

.

8. The method of claim 5 wherein said second interlayer comprises a substantially optically transparent metallic material capable of reflecting visible light selected from the group consisting of vanadium, niobium, chromium, manganese, rhenium, technetium, iron, cobalt, iridium, rhodium, nickel, palladium, platinum, copper, silver, gold, zinc, ruthenium, indium, aluminum, tin, osmium, thallium, lead, antimony, bismuth and polonium.

9. The method of claim 8 wherein the thickness of said first interlayer is in the range of about 5 Å

to about 20 μ

m and the thickness of said second interlayer is in the range of about 10 Å

to about 1000 Å

.

10. The method of claim 8 including a third interlayer disposed between said second interlayer and said diamond-like carbon outer layer of a substantially optically transparent material which third interlayer is transparent to light in the visible region of 350 to approximately 750 nanometers and is devoid of alkali metal atoms and fluorine to form a strong chemical bond with said second interlayer and said diamond-like carbon outer layer.

11. The method of claim 10 wherein said third interlayer comprises a substantially optically transparent material selected from the group consisting of silicon nitride, titanium nitride, tantalum nitride, hafnium nitride, zirconium nitride, boron nitride, yttrium oxide, germanium oxide, hafnium, oxide, silicon oxide, silicon dioxide, tantalum oxide, titanium oxide, zirconium oxide, silicon carbide, germanium carbide, mixtures thereof, and chemically bonded combinations thereof.

12. The method of claim 11 wherein the thickness of said first interlayer, said third interlayer and said diamond-like carbon outer layer are selected to minimize the reflection of light.

13. The method of claim 11 wherein the thickness of at least one of said composite layers, said third interlayer and said diamond-like carbon outer layer is selected to maximize the reflection of light.

14. The method of claim 11 wherein the thickness of said third interlayer and said diamond-like carbon outer layer corresponds to integer multiples of quarter wavelength optical thickness.

15. The method of claim 11 wherein the thickness of said first interlayer, said third interlayer and said diamond-like carbon outer layer corresponds to integer multiples of quarter wavelength optical thickness.

16. The method of claim 10 wherein said composite layer includes a chemically vapor deposited fourth interlayer disposed between said second interlayer and said diamond-like carbon outer layer of a substantially optically transparent material devoid of alkali metal atoms and fluorine to form a strong chemical bond to said second interlayer and said diamond-like carbon outer layer.

17. The method of claim 16 wherein said first interlayer and said second interlayer comprise a substantially optically transparent material selected from the group consisting of silicon nitride, titanium nitride, tantalum nitride, hafnium nitride, zirconium nitride, boron nitride, yttrium oxide, germanium oxide, hafnium oxide, silicon oxide, silicon dioxide, tantalum oxide, titanium oxide, zirconium oxide, silicon carbide, germanium carbide, aluminum oxide, cerium oxide, tin oxide, thorium oxide, lithium oxide, sodium oxide, potassium oxide, rubidium oxide, cesium oxide, francium oxide, beryllium oxide, magnesium oxide, calcium oxide, strontium oxide, barium oxide, radium oxide, barium fluoride, cerium fluoride, magnesium fluoride, thorium fluoride, calcium fluoride, neodymium fluoride, lead fluoride, sodium fluoride, lithium fluoride, zinc selenide, zinc sulfide, mixtures thereof and chemically bonded combinations thereof.

18. The method of claim 16 wherein said fourth interlayer comprises a substantially optically transparent material selected from the group consisting of silicon nitride, titanium nitride, tantalum nitride, hafnium nitride, zirconium nitride, boron nitride, yttrium oxide, germanium oxide, hafnium oxide, silicon oxide, silicon dioxide, tantalum oxide, titanium oxide, zirconium oxide, silicon carbide, germanium carbide, mixtures thereof and chemically bonded combinations thereof.

19. The method of claim 18 wherein the thicknesses of said first and second interlayers are in the range of about 5 Å

to about 1 μ

m and the thickness of said fourth interlayer is in the range of about 1 μ

m to about 20 μ

m.

20. The method of claim 16 wherein the thickness of said first interlayer said second interlayer, said fourth interlayer and said diamond-like carbon outer layer are selected to minimize the reflection of light.

21. The method of claim 16 wherein the thickness of said first interlayer, said second interlayer, said fourth interlayer, and said diamond-like carbon outer layer are selected to maximize the reflection of light.

22. The method of claim 16 wherein the thickness of said second interlayer, said fourth interlayer and said diamond-like carbon layer corresponds to integer multiples of quarter wavelength optical thickness.

23. The method of claim 16 wherein the thickness of said first interlayer, said second interlayer, said fourth interlayer and said diamond-like carbon layer corresponds to integer multiples of quarter wavelength optical thickness.

24. The method of claim 5 wherein said first interlayer further comprises a substantially optically transparent material selected from the group consisting of aluminum oxide, cerium oxide, tin oxide, thorium oxide, lithium oxide, sodium oxide, potassium oxide, rubidium oxide, cesium oxide, francium oxide, beryllium oxide, magnesium oxide, calcium oxide, strontium oxide, barium oxide, radium oxide, barium fluoride, cerium fluoride, magnesium fluoride, thorium fluoride, calcium fluoride, neodymium fluoride, lead fluoride, sodium fluoride, lithium fluoride, zinc selenide, zinc sulfide, mixtures thereof and chemically bonded combinations thereof.

25. The method of claim 5 wherein said second interlayer comprises a substantially optically transparent material selected from the group consisting of silicon nitride, titanium nitride, tantalum nitride, hafnium nitride, zirconium nitride, boron nitride, yttrium oxide, germanium oxide, hafnium oxide, silicon oxide, silicon dioxide, tantalum oxide, titanium oxide, zirconium oxide, silicon carbide, germanium carbide, mixtures thereof and chemically bonded combinations thereof.

26. The method of claim 25 wherein the thickness of said first interlayer is in the range of about 5 Å

to about 1 μ

m and the thickness of said second interlayer is in the range of about 1μ

m to about 20 μ

m.

27. The method of claim 26 wherein said first interlayer comprises silicon dioxide and said second interlayer comprises a chemically bonded combination of silicon oxide and silicon nitride.

28. The method of claim 21 wherein the thickness of said diamond-like carbon outer layer is at least 50 Å

thick.

29. The method of claim 25 wherein the thickness of said first layer, said second interlayer and said diamond-like carbon outer layer are selected to minimize the reflection of light.

30. The method of claim 25 wherein the thickness of said first interlayer, said second interlayer and said diamond-like carbon outer layer are selected to maximize the reflection of light.

31. The method of claim 25 wherein the thickness of said second interlayer and said diamond-like carbon outer layer corresponds to integer multiples of quarter wavelength optical thickness.

32. The method of claim 25 wherein the thickness of said first interlayer, said second interlayer and said diamond-like carbon layer corresponds to integer multiples of quarter wavelength optical thickness.

33. The method of claim 25 wherein said composite layer comprises two different and separately deposited interlayers in place of said second interlayer and said diamond-like carbon outerlayer disposed immediately adjacent to the plurality of said interlayers and wherein each of said plurality of interlayers comprises a substantially optically transparent material selected from the group consisting of silicon nitride, titanium nitride, tantalum nitride, hafnium nitride, zirconium nitride, boron nitride, yttrium oxide, germanium oxide, hafnium oxide, silicon oxide, silicon dioxide, tantalum oxide, titanium oxide, zirconium oxide, silicon carbide, germanium carbide, mixtures thereof and chemically bonded combinations thereof.

34. The method of claim 5 wherein said first interlayer further comprises a substantially optically transparent material selected from the group consisting of aluminum oxide, silicon oxide, silicon dioxide, silicon nitride, mixtures thereof and chemically bonded combinations thereof, and said second interlayer comprises substantially optically transparent silicon oxy-nitride.

35. The method of claim 34 wherein the substrate is a bar code scanner window.

36. The method of claim 34 wherein said first interlayer is about 10 Å

to 1 μ

m thick.

37. The method of claim 34 wherein said second interlayer is about 1 μ

m to 20 μ

m thick.

38. The method of claim 37 wherein said first interlayer is aluminum oxide.

39. The method of claim 37 wherein said first interlayer is silicon dioxide.

40. The method of claim 37 wherein said first interlayer is silicon oxy-nitride and the atomic concentration of nitrogen in said second interlayer is greater than the atomic concentration of nitrogen in said first interlayer.

41. A chemical vapor deposition method for producing an abrasion wear resistant coated substrate product comprising:

chemically de-greasing the surface of a parent substrate which is substantially optically transparent to light in the visible region of 350 to approximately 750 nanometers and which comprises a material selected from the group consisting of an amorphous material, a single crystal, polycrystalline materials, ceramic materials and mixtures thereof to remove hydrocarbon contamination;

placing said substrate into a chemical vapor deposition reactor vacuum chamber and evacuating the air from said chamber;

sputter-etching the surface of said substrate with energetic gas ions to remove traces of residual hydrocarbon and to preferentially reduce the concentration of alkali metal atoms and alkali metal oxides at the substrate surface;

chemically vapor depositing a composite layer comprising a first composite having a thickness in the range of about 1 μ

m to about 20 μ

m and at least one second composite layer by chemically vapor depositing onto said substrate a first interlayer of a substantially optically transparent material to form a strong chemical bond to said substrate which first interlayer is transparent to light in the visible region of 350 to approximately 750 nanometers and which is selected from the group consisting of silicon nitride, titanium nitride, tantalum nitride, hafnium nitride, zirconium nitride, boron nitride, yttrium oxide, germanium oxide, hafnium oxide, silicon oxide, silicon dioxide, tantalum oxide, titanium oxide, zirconium oxide, silicon carbide, germanium carbide, aluminum oxide, cerium oxide, tin oxide, thorium oxide, lithium oxide, sodium oxide, potassium oxide, rubidium oxide, cesium oxide, francium oxide, beryllium oxide, magnesium oxide, calcium oxide, strontium oxide, barium oxide, radium oxide, barium fluoride, cerium fluoride, magnesium fluoride, thorium fluoride, calcium fluoride, neodymium fluoride, lead fluoride, sodium fluoride, lithium fluoride, zinc selenide, zinc sulfide, mixtures thereof, and chemically bonded combinations thereof;

chemically vapor depositing a second interlayer onto and immediately adjacent to said first interlayer and away from said substrate of a substantially optically transparent material devoid of alkali metal atoms and fluorine to form a strong chemical bond to said first interlayer and a strong chemical bond to diamond-like carbon;

chemically vapor depositing a substantially optically transparent first diamond-like carbon layer which is transparent to light in the visible region of 350 to approximately 750 nanometers and having a thickness of at least 200 Å

thick onto said coated substrate;

chemically vapor depositing onto and immediately adjacent to said first diamond-like carbon layer a third interlayer of a substantially optically transparent material devoid of alkali metal atoms and fluorine to form a strong chemical bond to diamond-like carbon;

chemically vapor depositing a second substantially optically transparent diamond-like carbon layer onto said third interlayer;

cooling said coated substrate by extinguishing said deposition process and passing an inert gas over said substrate until the temperature of said substrate has reached substantially room temperature during said cool-down step; and

recovering a coated substrate product exhibiting greatly improved wear resistance for severe abrasive environments.

42. The method of claim 41 wherein said second interlayer and said third interlayer comprise a substantially optically transparent material selected from the group consisting of silicon nitride, titanium nitride, tantalum nitride, hafnium nitride, zirconium nitride, boron nitride, germanium oxide, hafnium oxide, silicon oxide, silicon dioxide, tantalum oxide, titanium oxide, yttrium oxide, zirconium oxide, silicon carbide, germanium carbide, mixtures thereof, and chemically bonded combinations thereof.

43. The method of claim 41 wherein the thickness of said second interlayer is in the range of about 1 μ

m to about 20 μ

m.

44. The method of claim 43 wherein the first interlayer comprises silicon dioxide and said second interlayer comprises a chemically bonded combination of silicon oxide and silicon nitride.

45. The method of claim 41 wherein said first composite layer comprises at least one pair of separately deposited said second interlayers.

46. The method of claim 41 wherein the thickness of said first interlayer, said second interlayer and said third interlayer is at least 2 μ

m thick.

47. The method of claim 41 wherein the thickness of said first diamond-like carbon layer and said second diamond-like carbon layer is at least 50 Å

thick.

48. The method of claim 41 wherein the thickness of at least one of said first interlayer, said second interlayer, said third interlayer, said first diamond-like carbon layer and said second diamond-like carbon layer is selected to minimize the reflection of light.

49. The method of claim 41 wherein the thickness of at least one of said first interlayer, said second interlayer, said third interlayer, said first diamond-like carbon layer and said second diamond-like carbon layer is selected to maximize the reflection of light.

50. The method of claim 41 wherein the thickness of said second interlayer, said third interlayer, said first diamond-like carbon layer and said second diamond-like carbon layer corresponds to integer multiples of quarter wavelength optical thickness.

51. The method of claim 41 wherein the thickness of said first interlayer, said second interlayer, said third interlayer, said first diamond-like carbon layer and said second diamond-like carbon layer corresponds to integer multiples of quarter wavelength optical thickness.

52. The method of claim 44 wherein said third interlayer comprises a substantially optically transparent material selected from the group consisting of silicon nitride, titanium nitride, tantalum nitride, hafnium nitride, zirconium nitride, boron nitride, germanium oxide, hafnium oxide, silicon oxide, silicon dioxide, tantalum oxide, titanium oxide, yttrium oxide, zirconium oxide, silicon carbide, germanium carbide, mixtures thereof, and chemically bonded combinations thereof.

53. The method of claim 52 wherein said second interlayer comprises a substantially optically transparent metallic material capable of reflecting visible light selected from the group consisting of silicon, germanium, hafnium, molybdenum, tungsten, yttrium, tantalum, titanium and zirconium.

54. The method of claim 52 wherein the thickness of said first interlayer is in the range of about 5 Å

to about 20 μ

m and the thickness of said second interlayer is in the range of about 10 Å

to about 1000 Å

.

55. The method of claim 52 wherein said second interlayer comprises a substantially optically transparent metallic material capable of reflecting visible light selected from the group consisting of vanadium, niobium, chromium, manganese, rhenium, technetium, iron, cobalt, iridium, rhodium, nickel, palladium, platinum, copper, silver, gold, zinc, ruthenium, indium, aluminum, tin, osmium, thallium, lead, antimony, bismuth and polonium.

56. The method of claim 55 wherein the thickness of said first interlayer is in the range of about 5 Å

to about 20 μ

m and the thickness of said second interlayer is in the range of about 10 Å

to about 1000 Å

.

57. The method of claim 55 including a fourth interlayer disposed between said second interlayer and said first diamond-like carbon layer of a substantially optically transparent material devoid of alkali metal atoms and fluorine to form a strong chemical bond with said second interlayer and said first diamond-like carbon layer.

58. The method of claim 57 wherein said fourth interlayer comprises a substantially optically transparent material selected from the group consisting of silicon nitride, titanium nitride, tantalum nitride, hafnium nitride, zirconium nitride, boron nitride, yttrium oxide, germanium oxide, hafnium oxide, silicon oxide, silicon dioxide, tantalum oxide, titanium oxide, zirconium oxide, silicon carbide, germanium carbide, mixtures thereof, and chemically bonded combinations thereof.

59. The method of claim 57 wherein the thickness of at least one of said first interlayer, said fourth interlayer, said third interlayer, said first diamond-like carbon layer and said second diamond-like carbon layer is selected to maximize the reflection of light.

60. The method of claim 57 wherein the thickness of at least one of said first interlayer, said fourth interlayer, said third interlayer, said first diamond-like carbon layer and said second diamond-like carbon layer is selected to maximize the reflection of light.

61. The method of claim 57 wherein the thickness of said fourth interlayer, said third interlayer, said first diamond-like carbon layer and said second diamond-like carbon layer corresponds to integer multiples of quarter wavelength optical thickness.

62. The method of claim 57 wherein the thickness of said first interlayer, said fourth interlayer, said third interlayer, said first diamond-like carbon layer and said second diamond-like carbon layer corresponds to integer multiples of quarter wavelength optical thickness.

63. The method of claim 41 wherein said first composite layer includes a fifth interlayer disposed between said second interlayer and said first diamond-like carbon layer of a substantially optically transparent material devoid of alkali metal atoms and fluorine to form a strong chemical bond with said second interlayer and said diamond-like carbon outer layer.

64. The method of claim 63 wherein said third interlayer and said fifth interlayer comprise a substantially optically transparent material selected from the group consisting of silicon nitride, titanium nitride, tantalum nitride, hafnium nitride, zirconium nitride, boron nitride, yttrium oxide, germanium oxide, hafnium oxide, silicon oxide, silicon dioxide, tantalum oxide, titanium oxide, zirconium oxide, silicon carbide, germanium carbide, mixtures thereof, and chemically bonded combinations thereof.

65. The method of claim 64 wherein the thickness of said first and second interlayers are at least about 5 Å

and less than 20 μ

m and the thickness of said fifth interlayer is at least about 1 μ

m and less than 20 μ

m.

66. The method of claim 63 wherein said second interlayer comprises a substantially optically transparent material selected from the group consisting of silicon nitride, titanium nitride, tantalum nitride, hafnium nitride, zirconium nitride, boron nitride, yttrium oxide, germanium oxide, hafnium oxide, silicon oxide, silicon dioxide, tantalum oxide, titanium oxide, zirconium oxide, silicon carbide, germanium carbide, aluminum oxide, cerium oxide, tin oxide, thorium oxide, lithium oxide, sodium oxide, potassium oxide, rubidium oxide, cesium oxide, francium oxide, beryllium oxide, magnesium oxide, calcium oxide, strontium oxide, barium oxide, radium oxide, barium fluoride, cerium fluoride, magnesium fluoride, thorium fluoride, calcium fluoride, neodymium fluoride, lead fluoride, sodium fluoride, lithium fluoride, zinc selenide, zinc sulfide, mixtures thereof, and chemically bonded combinations thereof.

67. The method of claim 63 wherein the thickness of at least one of said first interlayer, said second interlayer, said fifth interlayer, said first diamond-like carbon layer, said third interlayer and said second diamond-like carbon layer is selected to minimize the reflection of light.

68. The method of claim 63 wherein the thickness of at least one of said first interlayer, said second interlayer, said fifth interlayer, said first diamond-like carbon layer, said third interlayer and said second diamond-like carbon layer is selected to maximize the reflection of light.

69. The method of claim 63 wherein the thickness of said second interlayer, said third interlayer, said fifth interlayer, said first diamond-like carbon layer and said second diamond-like carbon layer corresponds to integer multiples of quarter wavelength optical thickness.

70. The method of claim 63 wherein the thickness of said first interlayer, said second interlayer, said third interlayer, said fifth interlayer, said first diamond-like layer and said second diamond-like carbon layer corresponds to integer multiples of quarter wavelength optical thickness.