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Plasma CVD method of producing a gradient layer

  • US 5,643,638 A
  • Filed: 12/13/1995
  • Issued: 07/01/1997
  • Est. Priority Date: 12/20/1994
  • Status: Expired due to Term
First Claim
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1. A plasma CVD method for producing a layer wherein a layer composition or structure gradient is generated in the direction of layer growth by changing at least one of plasma power parameters during the coating process, the method comprising the steps of:

  • supplying a plasma power as a power pulse train in a plasma pulse CVD method wherein the pulse train has the parameters of pulse amplitude, pulse width and pulse interval; and

    ,generating said layer gradient of said layer by changing at least one of said pulse amplitude, pulse width and pulse interval.

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