Plasma CVD method of producing a gradient layer

• US 5,643,638 A
• Filed: 12/13/1995
• Issued: 07/01/1997
• Est. Priority Date: 12/20/1994
• Status: Expired due to Term

• Current Assignee: Schott AG (Carl-Zeiss-Stiftung)
• Original Assignee: Schott Glaswerke
• Inventors: Otto, Jurgen, Segner, Johannes, Paquet, Volker
• Primary Examiner(s): King, Roy V.
• Application Number:
  US08/571,476
• Time in Patent Office: 566 Days
• Field of Search: 427/569, 427/575, 427/576, 427/578, 427/579
• US Class Current: 427/569
• CPC Class Codes: C08J 7/123 Treatment by wave energy or particle radiation C08J7/18 takes precedence
• CPC Class Codes: C23C 16/029 Graded interfaces
• CPC Class Codes: C23C 16/401 containing silicon
• CPC Class Codes: C23C 16/515 using pulsed discharges
• CPC Class Codes: C23C 16/52 Controlling or regulating the coating process C23C16/45557, C23C16/279 take precedence
• CPC Class Codes: G02B 1/14 Protective coatings, e.g. hard coatings

Abstract

The invention relates to a plasma CVD method for producing a gradient layer wherein the layer gradient is produced in the direction of layer growth by changing at least one plasma power parameter during the coating process. According to the invention, thin gradient layers are generated with high precision by supplying the plasma power in a pulsed manner and adjusting the layer gradient by changing the plasma power parameters of pulse amplitude, pulse duration and/or pulse interval.

Claims

1. A plasma CVD method for producing a layer wherein a layer composition or structure gradient is generated in the direction of layer growth by changing at least one of plasma power parameters during the coating process, the method comprising the steps of:

supplying a plasma power as a power pulse train in a plasma pulse CVD method wherein the pulse train has the parameters of pulse amplitude, pulse width and pulse interval; and

,

generating said layer gradient of said layer by changing at least one of said pulse amplitude, pulse width and pulse interval.

2. The plasma CVD method of claim 1, wherein said layer gradient is in the layer composition.

3. The plasma CVD method of claim 2, wherein said gradient in said layer is defined by a transition from organic to inorganic.

4. The plasma CVD method of claim 1, wherein said gradient is a gradient in the structure of said layer.

5. The plasma CVD method of claim 1, wherein said layer gradient is varied so as to provide a gradient of at least one of the following characteristics:

hardness, wattability, refractive index, absorption, porosity, crystal structure, module of elasticity and electrical conductivity.

6. The plasma CVD method of claim 1, comprising the further steps of:

using a coating gas having layer-forming substances; and

,

changing said plasma parameters during the coating process to vary the portions of said layer-forming substances relative to each other in the deposited layer.

7. The plasma CVD method of claim 1, comprising the further step of depositing a coating from a coating gas which contains at least one metal-organic layer-forming substance to produce a scratch-protective layer for plastic spectacle lenses.

8. The plasma CVD method of claim 7, wherein said metal-organic layer forming substance is hexamethylsiloxane (HMDSO).

9. The plasma CVD method of claim 8, comprising the further step of adding to said coating gas oxygen, nitrogen and/or a gas which releases oxygen and/or nitrogen in the plasma.

10. The plasma CVD method of claim 9, the method comprising the further step of exciting said plasma by means of microwave radiation.

11. The plasma CVD method of claim 10, wherein the excitation frequency of said microwave radiation is 2.45 GHz.

12. The plasma CVD method of claim 7, wherein said gradient of said layer is generated by changing the pulse width during the coating process.

13. The plasma CVD method of claim 12, wherein said pulse width is varied between 0.1 and 0.2 msec.

14. The plasma CVD method of claim 7, wherein the composition of said coating gas is changed during the coating process.