×

Plasma processing apparatus

  • US 5,645,644 A
  • Filed: 10/20/1995
  • Issued: 07/08/1997
  • Est. Priority Date: 10/20/1995
  • Status: Expired due to Term
First Claim
Patent Images

1. A plasma processing apparatus comprising:

  • means of supplying a microwave;

    a reaction chamber having a microwave lead-in opening, with a sample stage being disposed inside said chamber;

    a microwave window for introducing the microwave provided by said microwave supply means into said reaction chamber through said microwave lead-in opening; and

    a supporting member having beams for supporting said microwave window.

View all claims
  • 2 Assignments
Timeline View
Assignment View
    ×
    ×