Single-channel gas concentration measurement method and apparatus using a short-resonator Fabry-Perot interferometer

• US 5,646,729 A
• Filed: 12/18/1995
• Issued: 07/08/1997
• Est. Priority Date: 01/13/1993
• Status: Expired due to Term

• Current Assignee: Vaisala OY
• Original Assignee: Vaisala OY
• Inventors: Blomberg, Martti, Koskinen, Yrjo, Lehto, Ari, Torkkeli, Altti, Tammela, Simo, Orpana, Markku
• Primary Examiner(s): Gonzalez, Frank
• Assistant Examiner(s): VIERRA EISENBERG, JASON D
• Application Number:
  US08/573,759
• Time in Patent Office: 568 Days
• Field of Search: 356/352, 359/260, 359/578, 359/579
• US Class Current: 356/454
• CPC Class Codes: G01J 2003/1247 Tuning
• CPC Class Codes: G01J 3/26 using multiple reflection, e.g. Fabry-Perot interferometer, variable interference filters
• CPC Class Codes: G01N 21/31 Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry G01N21/72 takes precedence
• CPC Class Codes: G01N 21/3504 for analysing gases, e.g. multi-gas analysis
• CPC Class Codes: G02B 26/02 for controlling the intensity of light G02B26/004 takes precedence

Abstract

A single-channel gas concentration measurement method and apparatus. According to the method, a radiant source is employed to generate a measuring signal, the measuring signal is subsequently directed to a measurement object containing a gas mixture to be measured, the measuring signal is subsequently bandpass filtered using at least two passband wavelengths, and the filtered measuring signals are detected by a detector. According to the invention, the bandpass filtering step is implemented by a single electrostatically tunable, short-resonator Fabry-Perot interferometer.

Claims

1. A single-channel infrared gas concentration measurement method comprising the following steps:

generating a measuring signal by means of a radiant source;

directing the measuring signal to a measurement object containing a gas mixture to be measured;

bandpass filtering the measuring signal after being directed to the measurement object by implementing a single electrostatically tunable, short-resonator Fabry-Perot interferometer fabricated by surface micromachining techniques and having upper and lower resonator mirrors with a distance between said mirrors being equal to n μ

/2 where n is from 1 to 3, said interferometer further having an aperture integrally provided in an interferometer structure and located adjacent to a side of said lower mirror which is opposite said upper mirror, said aperture being filled with silicon substrate, said bandpass filtering using at least two passband wavelengths; and

detecting the measuring signal which has been filtered by means of a detector.

2. The method as defined in claim 1, wherein a concentration of carbon dioxide or carbon monoxide is measured.

3. The method as defined in claim 1, wherein the radiant source employed is an electrically modulatable radiant source.

4. The method as defined in claim 1, wherein such a Fabry-Perot interferometer is employed which is fabricated by surface micromachining techniques onto a silicon substrate so that one of said resonator mirrors is movable by means of a modulating electric field.

5. The method as defined in claim 1, wherein the measuring signal is subjected to filtering with a cut-off filter prior to detecting said measuring signal by the detector.

6. A single-channel infrared gas concentration measurement apparatus, comprising:

a measuring

a radiant source for generating a measuring signal;

a measurement object containing a gas mixture to be measured and through which said measuring signal is sent;

a variable bandpass filter for bandpass filtering of the measuring signal on at least two passband wavelengths, said bandpass filter being implemented by means of a single electrostatically tunable, short-resonator Fabry-Perot interferometer fabricated by surface micromachining techniques and having upper and lower resonator mirrors with a distance between said mirrors being equal to n λ

/2 where n is from 1 to 3, said interferometer further having an aperture integrally provided in an interferometer structure and located adjacent to a side of said lower mirror which is opposite said upper mirror, said aperture being filled with silicon substrate; and

a detector suited for detecting said filtered measuring signals.

7. The apparatus as defined in claim 6, wherein said radiant source is an electrically modulatable radiant source.

8. The apparatus as defined in claim 6, wherein said measurement apparatus incorporates a cut-off filter on a signal path prior to said detector.

9. An electrically tunable short-resonator Fabry-Perot interferometer fabricated by surface micromachining techniques for infrared gas concentration measurement, said interferometer comprising:

upper and lower essentially parallel, adjacently aligned, semi-transmissive mirrors spaced at a distance (d) which is designed proportional to a center wavelength (λ

) of the interferometer passband according to the formula;

space="preserve" listing-type="equation">d=nλ

/2,

where n is an integer from 1 to 3 indicating an interferometer order number, said lower mirror having first and second opposite sides, said upper mirror being located closest to said first side of said lower mirror;

control means for modulating the distance (d) between said resonator mirrors; and

an aperture integrally provided in an interferometer structure and located closest to said second side of said lower mirror, said aperture being filled with silicon substrate.

10. The interferometer as defined in claim 9, wherein the structure around said aperture is fabricated from metal.

11. The interferometer as defined in claim 9, wherein the structure around said aperture is a polycrystalline membrane.

12. The interferometer as defined in claim 9, wherein said interferometer incorporates an integrated absorbing element to prevent transmission of radiation at undesirable wavelengths through said interferometer.

13. The interferometer as defined in claim 12, wherein a thickness of said absorbing element is λ

/2.

14. The interferometer as defined in claim 9, wherein said interferometer incorporates holes at a rim of said upper mirror for etching away material from inside a resonator cavity.