Efficient chemistry for selective modification and metallization of substrates

• US 5,648,201 A
• Filed: 12/16/1992
• Issued: 07/15/1997
• Est. Priority Date: 04/25/1991
• Status: Expired due to Fees

• Current Assignee: The United States of America As Represented By The Secretary of Agriculture
• Original Assignee: The United States of America As Represented By The Secretary of Agriculture
• Inventors: Peek, Brian M., Koloski, Timothy S., Dressick, Walter J., Calvert, Jeffrey M., Dulcey, Charles S.
• Primary Examiner(s): Lesmes, George F.
• Assistant Examiner(s): Codd, Bernard P.
• Application Number:
  US07/991,680
• Time in Patent Office: 1,672 Days
• Field of Search: 430/424, 430/324, 430/270, 430/315, 430/296, 430/311, 430/967, 430/270.1, 427/304, 427/98, 427/305, 427/437
• US Class Current: 430/324
• CPC Class Codes: B82Y 30/00 Nanotechnology for materials or surface science, e.g. nanocomposites
• CPC Class Codes: C23C 18/1608 from pretreatment step, i.e. selective pre-treatment
• CPC Class Codes: C23C 18/1612 through irradiation means
• CPC Class Codes: C23C 18/182 Radiation, e.g. UV, laser
• CPC Class Codes: C23C 18/1844 with use of organic or inorganic compounds other than metals, first
• CPC Class Codes: C23C 18/1868 Radiation, e.g. UV, laser
• CPC Class Codes: C23C 18/1893 with use of organic or inorganic compounds other than metals, first
• CPC Class Codes: C23C 18/204 Radiation, e.g. UV, laser
• CPC Class Codes: C23C 18/2086 with use of organic or inorganic compounds other than metals, first
• CPC Class Codes: C23C 18/30 Activating or accelerating or sensitising with palladium or other noble metal
• CPC Class Codes: C23C 18/31 Coating with metals
• CPC Class Codes: G03F 7/165 Monolayers, e.g. Langmuir-Blodgett
• CPC Class Codes: H05K 3/185 by making a catalytic pattern by photo-imaging
• CPC Class Codes: Y10S 430/168 X-ray exposure process

Abstract

A process for efficient modification and metallization of substrates includes the steps of providing a substrate with highly photoefficient chemical functional groups on at least a portion of this substrate, exposing the substrate to actinic radiation to transform, deactivate, or remove these chemical functional groups, to modify their chemical reactivity, and carrying out further chemical reaction steps on these modified chemical functional groups.

Claims

1. A process for modifying a substrate, comprising the steps of:

a) providing a substrate having benzyl halide or benzyl pseudohalide groups on at least a portion of the substrate, and

b) contacting the benzyl halide or benzyl pseudohalide functionalized substrate with a nucleophilic reagent with the general formula N-R, wherein N is a nucleophilic group and R is a group capable of imparting to the substrate a selected functionality,

wherein, prior to said step of contacting said substrate with said nucleophilic reagent, at least a portion of said substrate is exposed to sufficient actinic radiation to liberate a selected amount of halide or pseudohalide from said benzyl halide or said benzyl pseudohalide groups, to modify the reactivity of said substrate to said nucleophilic reagent, wherein said amount of actinic radiation is not more than about 100 mJ/cm².

2. The process of claim 1, wherein said actinic radiation is visible light, ultraviolet light, X-rays, γ

-rays, electron beams, or ion beams.

3. The process of claim 1, wherein the dose of said actinic radiation is less than a dose of actinic radiation sufficient to convert essentially all of said benzyl halide or benzyl pseudohalide groups on said surface to their photoproducts.

4. The process of claim 1, wherein said actinic radiation is patterned.

5. A process for modifying a substrate, comprising the steps of:

a) providing a substrate having benzyl halide or benzyl pseudohalide groups on at least a portion of the substrate, and

b) contacting the benzyl halide or benzyl pseudohalide functionalized substrate with a nucleophilic reagent with the general formula N-R, wherein N is a nucleophilic group and R is a group capable of imparting to the substrate a selected functionality, wherein said functional group R comprises a ligating moiety that is capable of binding an electroless metallization catalyst,

c) contacting the ligand-modified substrate with an electroless metallization catalyst, and

d) contacting the catalyzed substrate with an electroless metallization plating solution, whereby a metal film is deposited on the substrate,

wherein, prior to said step of contacting said substrate with said nucleophilic reagent, at least a portion of said substrate is exposed to sufficient actinic radiation to liberate a selected amount of halide or pseudohalide from said benzyl halide or said benzyl pseudohalide groups, to modify the reactivity of said substrate to said nucleophilic reagent, wherein said amount of actinic radiation is not more than about 100 mJ/cm².

6. The process of claim 5, wherein said actinic radiation is visible light, ultraviolet light, X-rays, γ

-rays, electron beams, or ion beams.

7. The process of claim 5, wherein said actinic radiation is patterned.